Karl R. Umstadter

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Livermore, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Advanced debris mitigation of EUV light source
- Patent number 9,268,031
- Issue date Feb 23, 2016
- KLA-Tencor Corporation
- Karl R. Umstadter
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for cleaning objects in a chamber of an optic...
- Patent number 9,156,068
- Issue date Oct 13, 2015
- KLA-Tencor Corporation
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Grant
System and method of simultaneously fueling and mitigating debris f...
- Patent number 9,155,180
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Karl R. Umstadter
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiplexing EUV sources in reticle inspection
- Patent number 8,917,432
- Issue date Dec 23, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR CLEANING OBJECTS IN A CHAMBER OF AN OPTIC...
- Publication number 20140374619
- Publication date Dec 25, 2014
- Leonard E. Klebanoff
- B08 - CLEANING
Information Patent Application
APPARATUS, SYSTEM, AND METHOD FOR SEPARATING GASES AND MITIGATING D...
- Publication number 20140166051
- Publication date Jun 19, 2014
- KLA-Tencor Corporation
- Karl R. Umstadter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE USING PHOTOELECTRONS FOR IN-SITU BEAM POWER AND S...
- Publication number 20140158894
- Publication date Jun 12, 2014
- KLA-Tencor Corporation
- Li Wang
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL COMPONENT WITH BLOCKING SURFACE AND METHOD THEREOF
- Publication number 20140158914
- Publication date Jun 12, 2014
- Leonard E. Klebanoff
- G02 - OPTICS
Information Patent Application
MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION
- Publication number 20140036333
- Publication date Feb 6, 2014
- KLA-Tencor Corporation
- Daniel Wack
- G02 - OPTICS
Information Patent Application
ADVANCED DEBRIS MITIGATION OF EUV LIGHT SOURCE
- Publication number 20130313423
- Publication date Nov 28, 2013
- KLA-Tencor Corporation
- Karl R. Umstadter
- B08 - CLEANING