Karsten Schneider

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Methods for etching a dielectric barrier layer with high selectivity
- Patent number 7,977,245
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Ying Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-density plasma etching of carbon-based low-k materials in a in...
- Patent number 6,284,149
- Issue date Sep 4, 2001
- Applied Materials, Inc.
- Zongyu Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR ETCHING A BOTTOM ANTI-REFLECTIVE COATING LAYER IN DUAL...
- Publication number 20070224825
- Publication date Sep 27, 2007
- Ying Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for etching a bottom anti-reflective coating layer in dual...
- Publication number 20070224827
- Publication date Sep 27, 2007
- Ying Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for etching a dielectric barrier layer with high selectivity
- Publication number 20070224807
- Publication date Sep 27, 2007
- APPLIED MATERIALS, INC.
- Ying Xiao
- H01 - BASIC ELECTRIC ELEMENTS