Katherina Babich

Person

Chappaqua, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lateral heterojunction bipolar transistors with asymmetric junctions
- Patent number 11,094,805
- Issue date Aug 17, 2021
- GLOBALFOUNDRIES U.S. INC.
- Alexander Derrickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned single diffusion break for fully depleted silicon-on-i...
- Patent number 10,580,684
- Issue date Mar 3, 2020
- GLOBALFOUNDRIES Inc.
- Jin Wallner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 9,472,402
- Issue date Oct 18, 2016
- GLOBALFOUNDRIES Inc.
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective nanotube growth inside vias using an ion beam
- Patent number 9,099,537
- Issue date Aug 4, 2015
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 9,059,000
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve nucleation of materials on graphene and carbon na...
- Patent number 8,895,352
- Issue date Nov 25, 2014
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve nucleation of materials on graphene and carbon na...
- Patent number 8,816,333
- Issue date Aug 26, 2014
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned borderless contacts for high density electronic and me...
- Patent number 8,754,530
- Issue date Jun 17, 2014
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,609,322
- Issue date Dec 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Filling narrow openings using ion beam etch
- Patent number 8,497,212
- Issue date Jul 30, 2013
- GLOBALFOUNDRIES Inc.
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a lithographic structure using antireflective mat...
- Patent number 8,293,454
- Issue date Oct 23, 2012
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask forming and implanting methods using implant stopping layer
- Patent number 7,998,871
- Issue date Aug 16, 2011
- International Business Machines Corporation
- Katherina Babich
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,968,270
- Issue date Jun 28, 2011
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for tuning epitaxial growth by interfacial doping and struct...
- Patent number 7,790,593
- Issue date Sep 7, 2010
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,736,833
- Issue date Jun 15, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,709,177
- Issue date May 4, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask forming and implanting methods using implant stopping layer an...
- Patent number 7,651,947
- Issue date Jan 26, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,648,820
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving post-develop photoresist profile on a deposited...
- Patent number 7,611,758
- Issue date Nov 3, 2009
- Tokyo Electron Limited
- Noriaki Fukiage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Techniques for patterning features in semiconductor devices
- Patent number 7,545,041
- Issue date Jun 9, 2009
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 7,497,959
- Issue date Mar 3, 2009
- International Business Machines Corporation
- Deok-kee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of making a semiconductor device using multiple antireflect...
- Patent number 7,485,573
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,361,444
- Issue date Apr 22, 2008
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for tuning epitaxial growth by interfacial doping and struct...
- Patent number 7,329,596
- Issue date Feb 12, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective composition and process of making a lithographic str...
- Patent number 7,326,442
- Issue date Feb 5, 2008
- International Business Machines Corporation
- Katherina E. Babich
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic antireflective hardmask compositions and uses thereof
- Patent number 7,223,517
- Issue date May 29, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water and aqueous base soluble antireflective coating/hardmask mate...
- Patent number 7,175,966
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Katherina E Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,172,849
- Issue date Feb 6, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer interconnect structure containing air gaps and method fo...
- Patent number 7,098,476
- Issue date Aug 29, 2006
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch selectivity enhancement for tunable etch resistant anti-reflec...
- Patent number 7,077,903
- Issue date Jul 18, 2006
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LATERAL HETEROJUNCTION BIPOLAR TRANSISTORS WITH ASYMMETRIC JUNCTIONS
- Publication number 20210226044
- Publication date Jul 22, 2021
- GLOBALFOUNDRIES U.S. Inc.
- Alexander Derrickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED SINGLE DIFFUSION BREAK FOR FULLY DEPLETED SILICON-ON-I...
- Publication number 20190318955
- Publication date Oct 17, 2019
- GLOBALFOUNDRIES INC.
- Jin WALLNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Structures for Protecting One Area While Processing Ano...
- Publication number 20150004802
- Publication date Jan 1, 2015
- International Business Machines Corporation
- Deok-kee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS USING TAILORED CHAMFERE...
- Publication number 20130224944
- Publication date Aug 29, 2013
- GLOBALFOUNDRIES INC.
- Puneet Khanna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20130017486
- Publication date Jan 17, 2013
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
THIN BODY SILICON-ON-INSULATOR TRANSISTOR WITH BORDERLESS SELF-ALIG...
- Publication number 20120299101
- Publication date Nov 29, 2012
- International Business Machines Corporation
- KATHERINA E. BABICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE EPITAXIAL GROWTH BY INCUBATION TIME ENGINEERING
- Publication number 20120295417
- Publication date Nov 22, 2012
- International Business Machines Corporation
- Thomas N. Adam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to Improve Nucleation of Materials on Graphene and Carbon Na...
- Publication number 20120235119
- Publication date Sep 20, 2012
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Filling Narrow Openings Using Ion Beam Etch
- Publication number 20120217590
- Publication date Aug 30, 2012
- GLOBALFOUNDRIES INC.
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-TEMPERATURE ABSORBER FILM AND METHOD OF FABRICATION
- Publication number 20110254138
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NANOTUBE GROWTH INSIDE VIAS USING AN ION BEAM
- Publication number 20110048930
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to Improve Nucleation of Materials on Graphene and Carbon Na...
- Publication number 20100301336
- Publication date Dec 2, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED BORDERLESS CONTACTS FOR HIGH DENSITY ELECTRONIC AND ME...
- Publication number 20100038723
- Publication date Feb 18, 2010
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN BODY SILICON-ON-INSULATOR TRANSISTOR WITH BORDERLESS SELF-ALIG...
- Publication number 20100038715
- Publication date Feb 18, 2010
- International Business Machines Corporation
- KATHERINA E. BABICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...
- Publication number 20090061355
- Publication date Mar 5, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FORMING AND IMPLANTING METHODS USING IMPLANT STOPPING LAYER
- Publication number 20090004869
- Publication date Jan 1, 2009
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...
- Publication number 20080311508
- Publication date Dec 18, 2008
- INTERNATION BUSINESS MACHINES CORPORATION
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK HAVING IMPLANT STOPPING LAYER
- Publication number 20080286545
- Publication date Nov 20, 2008
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and structures for protecting one area while processing ano...
- Publication number 20080261128
- Publication date Oct 23, 2008
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for Patterning Features in Semiconductor Devices
- Publication number 20080187731
- Publication date Aug 7, 2008
- International Business Machines Corporation
- Scott D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...
- Publication number 20080153270
- Publication date Jun 26, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124649
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124650
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...
- Publication number 20080093640
- Publication date Apr 24, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FORMING AND IMPLANTING METHODS USING IMPLANT STOPPING LAYER AN...
- Publication number 20070275563
- Publication date Nov 29, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of making a semiconductor device using multiple antireflect...
- Publication number 20070196748
- Publication date Aug 23, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Hardmask and Uses Thereof
- Publication number 20070105363
- Publication date May 10, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for tuning epitaxial growth by interfacial doping and struct...
- Publication number 20070090487
- Publication date Apr 26, 2007
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process of making a lithographic structure using antireflective mat...
- Publication number 20070015082
- Publication date Jan 18, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective composition and process of making a lithographic str...
- Publication number 20070015083
- Publication date Jan 18, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Katherina Babich

Person

Patents Grantslast 30 patents

Lateral heterojunction bipolar transistors with asymmetric junctions

Self-aligned single diffusion break for fully depleted silicon-on-i...

Methods and structures for protecting one area while processing ano...

Selective nanotube growth inside vias using an ion beam

Methods and structures for protecting one area while processing ano...

Method to improve nucleation of materials on graphene and carbon na...

Method to improve nucleation of materials on graphene and carbon na...

Self-aligned borderless contacts for high density electronic and me...

Process of making a lithographic structure using antireflective mat...

Filling narrow openings using ion beam etch

Process of making a lithographic structure using antireflective mat...

Mask forming and implanting methods using implant stopping layer

Process of making a semiconductor device using multiple antireflect...

Method for tuning epitaxial growth by interfacial doping and struct...

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

Mask forming and implanting methods using implant stopping layer an...

Antireflective hardmask and uses thereof

Method of improving post-develop photoresist profile on a deposited...

Techniques for patterning features in semiconductor devices

Methods and structures for protecting one area while processing ano...

Process of making a semiconductor device using multiple antireflect...

Multilayered resist systems using tuned polymer films as underlayer...

Method for tuning epitaxial growth by interfacial doping and struct...

Antireflective composition and process of making a lithographic str...

Lithographic antireflective hardmask compositions and uses thereof

Water and aqueous base soluble antireflective coating/hardmask mate...

Antireflective hardmask and uses thereof

Multilayer interconnect structure containing air gaps and method fo...

Etch selectivity enhancement for tunable etch resistant anti-reflec...

Patents Applicationslast 30 patents

LATERAL HETEROJUNCTION BIPOLAR TRANSISTORS WITH ASYMMETRIC JUNCTIONS

SELF-ALIGNED SINGLE DIFFUSION BREAK FOR FULLY DEPLETED SILICON-ON-I...

Methods and Structures for Protecting One Area While Processing Ano...

METHODS FOR FABRICATING INTEGRATED CIRCUITS USING TAILORED CHAMFERE...

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

THIN BODY SILICON-ON-INSULATOR TRANSISTOR WITH BORDERLESS SELF-ALIG...

SELECTIVE EPITAXIAL GROWTH BY INCUBATION TIME ENGINEERING

Method to Improve Nucleation of Materials on Graphene and Carbon Na...

Filling Narrow Openings Using Ion Beam Etch

LOW-TEMPERATURE ABSORBER FILM AND METHOD OF FABRICATION

SELECTIVE NANOTUBE GROWTH INSIDE VIAS USING AN ION BEAM

Method to Improve Nucleation of Materials on Graphene and Carbon Na...

SELF-ALIGNED BORDERLESS CONTACTS FOR HIGH DENSITY ELECTRONIC AND ME...

THIN BODY SILICON-ON-INSULATOR TRANSISTOR WITH BORDERLESS SELF-ALIG...

PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MAT...

MASK FORMING AND IMPLANTING METHODS USING IMPLANT STOPPING LAYER

PROCESS OF MAKING A SEMICONDUCTOR DEVICE USING MULTIPLE ANTIREFLECT...

MASK HAVING IMPLANT STOPPING LAYER

Methods and structures for protecting one area while processing ano...

Techniques for Patterning Features in Semiconductor Devices

METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...

MASK FORMING AND IMPLANTING METHODS USING IMPLANT STOPPING LAYER AN...

Process of making a semiconductor device using multiple antireflect...

Antireflective Hardmask and Uses Thereof

Method for tuning epitaxial growth by interfacial doping and struct...

Process of making a lithographic structure using antireflective mat...

Antireflective composition and process of making a lithographic str...