Kathleen R. Early

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical feature doubling process
- Patent number 6,534,243
- Issue date Mar 18, 2003
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Memory cell structure for elimination of oxynitride (ONO) etch resi...
- Patent number 6,455,888
- Issue date Sep 24, 2002
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Sidewall formation for sidewall patterning of sub 100 nm structures
- Patent number 6,423,475
- Issue date Jul 23, 2002
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bilayer anti-reflective coating and etch hard mask
- Patent number 6,352,930
- Issue date Mar 5, 2002
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating thinner resist coating that also has fewer pinh...
- Patent number 6,350,559
- Issue date Feb 26, 2002
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxygen implant self-aligned, floating gate and isolation structure
- Patent number 6,316,804
- Issue date Nov 13, 2001
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall formation for sidewall patterning of sub 100 nm structures
- Patent number 6,291,137
- Issue date Sep 18, 2001
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for wafer alignment which mitigates effects of re...
- Patent number 6,269,322
- Issue date Jul 31, 2001
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bilayer anti-reflective coating and etch hard mask
- Patent number 6,232,002
- Issue date May 15, 2001
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch resi...
- Patent number 6,221,768
- Issue date Apr 24, 2001
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified sidewall formation for sidewall patterning of sub 100 nm...
- Patent number 6,214,737
- Issue date Apr 10, 2001
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic mask repair using a scanning tunneling microscope
- Patent number 6,197,455
- Issue date Mar 6, 2001
- Advanced Micro Devices, Inc.
- Sanjay K. Yedur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Doubled-sided wafer scrubbing for improved photolithography
- Patent number 6,136,510
- Issue date Oct 24, 2000
- Advanced Micro Devices, Inc.
- Tho Le La
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography mask blank and manufacturing method...
- Patent number 6,117,597
- Issue date Sep 12, 2000
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Elimination of oxynitride (ONO) etch residue and polysilicon string...
- Patent number 6,110,833
- Issue date Aug 29, 2000
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Vertical parallel plate capacitor
- Patent number 6,094,335
- Issue date Jul 25, 2000
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen implant self-aligned, floating gate and isolation structure
- Patent number 6,066,530
- Issue date May 23, 2000
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elimination of oxynitride (ONO) etch residue and polysilicon string...
- Patent number 6,043,120
- Issue date Mar 28, 2000
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elimination of oxynitride (ONO) etch residue and polysilicon string...
- Patent number 6,030,868
- Issue date Feb 29, 2000
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography mask blank and manufacturing method...
- Patent number 5,978,441
- Issue date Nov 2, 1999
- Advanced Micro Devices, Inc.
- Kathleen R. Early
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch resi...
- Patent number 5,939,750
- Issue date Aug 17, 1999
- Advanced Micro Devices
- Kathleen R. Early
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside wafer polishing for improved photolithography
- Patent number 5,780,204
- Issue date Jul 14, 1998
- Advanced Micro Devices, Inc.
- Tho Le La
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kathleen R. Early

Person

Patents Grantslast 30 patents

Chemical feature doubling process

Memory cell structure for elimination of oxynitride (ONO) etch resi...

Sidewall formation for sidewall patterning of sub 100 nm structures

Bilayer anti-reflective coating and etch hard mask

Method for creating thinner resist coating that also has fewer pinh...

Oxygen implant self-aligned, floating gate and isolation structure

Sidewall formation for sidewall patterning of sub 100 nm structures

System and method for wafer alignment which mitigates effects of re...

Bilayer anti-reflective coating and etch hard mask

Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch resi...

Simplified sidewall formation for sidewall patterning of sub 100 nm...

Lithographic mask repair using a scanning tunneling microscope

Doubled-sided wafer scrubbing for improved photolithography

Extreme ultraviolet lithography mask blank and manufacturing method...

Elimination of oxynitride (ONO) etch residue and polysilicon string...

Vertical parallel plate capacitor

Oxygen implant self-aligned, floating gate and isolation structure

Elimination of oxynitride (ONO) etch residue and polysilicon string...

Elimination of oxynitride (ONO) etch residue and polysilicon string...

Extreme ultraviolet lithography mask blank and manufacturing method...

Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch resi...

Backside wafer polishing for improved photolithography