Katsuhiko Komori

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming apparatus, film forming method and heat insulating member
- Patent number 10,570,508
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 9,984,875
- Issue date May 29, 2018
- Tokyo Electron Limited
- Kazuya Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and control apparatus
- Patent number 9,798,317
- Issue date Oct 24, 2017
- Tokyo Electron Limited
- Yuichi Takenaga
- G05 - CONTROLLING REGULATING
Information Patent Grant
Heat treatment system, heat treatment method, and program
- Patent number 9,799,577
- Issue date Oct 24, 2017
- Tokyo Electron Limited
- Yuichi Takenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon film forming method, thin film forming method and cross-sec...
- Patent number 9,758,865
- Issue date Sep 12, 2017
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon film
- Patent number 9,558,940
- Issue date Jan 31, 2017
- Tokyo Electron Limited
- Katsuhiko Komori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming silicon film
- Patent number 9,490,139
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Katsuhiko Komori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trench filling method and processing apparatus
- Patent number 9,384,974
- Issue date Jul 5, 2016
- Tokyo Electron Limited
- Daisuke Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming silicon film
- Patent number 9,318,328
- Issue date Apr 19, 2016
- Tokyo Electron Limited
- Katsuhiko Komori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method and film deposition apparatus
- Patent number 9,005,459
- Issue date Apr 14, 2015
- Tokyo Electron Limited
- Akinobu Kakimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 8,945,339
- Issue date Feb 3, 2015
- Tokyo Electron Limited
- Akinobu Kakimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical CVD apparatus for forming silicon-germanium film
- Patent number 7,648,895
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,273,818
- Issue date Sep 25, 2007
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER
- Publication number 20180179625
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Satoshi TAKAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20170243742
- Publication date Aug 24, 2017
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT SYSTEM, HEAT TREATMENT METHOD, AND PROGRAM
- Publication number 20170133285
- Publication date May 11, 2017
- TOKYO ELECTRON LIMITED
- Yuichi Takenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical Heat Treatment Apparatus
- Publication number 20160289833
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Mitsuhiro OKADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Crystallizing Group IV Semiconductor, and Film Forming A...
- Publication number 20160244892
- Publication date Aug 25, 2016
- TOKYO ELECTRON LIMITED
- Kazuya TAKAHASHI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON FILM
- Publication number 20150037975
- Publication date Feb 5, 2015
- TOKYO ELECTRON LIMITED
- Katsuhiko KOMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...
- Publication number 20150037970
- Publication date Feb 5, 2015
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND CONTROL APPARATUS
- Publication number 20150011091
- Publication date Jan 8, 2015
- TOKYO ELECTRON LIMITED
- Yuichi Takenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH FILLING METHOD AND PROCESSING APPARATUS
- Publication number 20140349468
- Publication date Nov 27, 2014
- TOKYO ELECTRON LIMITED
- Daisuke SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON FILM
- Publication number 20140199824
- Publication date Jul 17, 2014
- TOKYO ELECTRON LIMITED
- Katsuhiko KOMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SILICON FILM
- Publication number 20130323915
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- Katsuhiko KOMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS
- Publication number 20120267340
- Publication date Oct 25, 2012
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS
- Publication number 20120103518
- Publication date May 3, 2012
- TOKYO ELECTRON LIMITED
- Akinobu KAKIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM
- Publication number 20090104760
- Publication date Apr 23, 2009
- TOKYO ELECTON LIMITED
- Masaki KUROKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vertical CVD apparatus for forming silicon-germanium film
- Publication number 20050181586
- Publication date Aug 18, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050170617
- Publication date Aug 4, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Katsuhiko Komori

Person

Patents Grantslast 30 patents

Film forming apparatus, film forming method and heat insulating member

Film forming method

Substrate processing method and control apparatus

Heat treatment system, heat treatment method, and program

Silicon film forming method, thin film forming method and cross-sec...

Method and apparatus for forming silicon film

Method and apparatus for forming silicon film

Trench filling method and processing apparatus

Method and apparatus for forming silicon film

Film deposition method and film deposition apparatus

Film formation apparatus

Vertical CVD apparatus for forming silicon-germanium film

Film formation method and apparatus for semiconductor process

Patents Applicationslast 30 patents

FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER

FILM FORMING METHOD

HEAT TREATMENT SYSTEM, HEAT TREATMENT METHOD, AND PROGRAM

Vertical Heat Treatment Apparatus

Method for Crystallizing Group IV Semiconductor, and Film Forming A...

METHOD AND APPARATUS FOR FORMING SILICON FILM

Silicon Film Forming Method, Thin Film Forming Method and Cross-Sec...

SUBSTRATE PROCESSING METHOD AND CONTROL APPARATUS

TRENCH FILLING METHOD AND PROCESSING APPARATUS

METHOD AND APPARATUS FOR FORMING SILICON FILM

METHOD AND APPARATUS FOR FORMING SILICON FILM

FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS

FILM FORMATION APPARATUS

VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM

Vertical CVD apparatus for forming silicon-germanium film

Film formation method and apparatus for semiconductor process