Katsumasa KAWASAKI

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for delivering a plurality of waveform signals...
- Patent number 11,694,876
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching semiconductor structures
- Patent number 11,164,723
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching semiconductor structures
- Patent number 10,930,471
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) pulsing impedance tuning with multiplier mode
- Patent number 10,854,427
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart RF pulsing tuning using variable frequency generators
- Patent number 10,790,126
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching semiconductor structures
- Patent number 10,593,518
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power delivery regulation for processing substrates
- Patent number 10,468,233
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart RF pulsing tuning using variable frequency generators
- Patent number 10,424,467
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart multi-level RF pulsing methods
- Patent number 9,872,373
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- Daisuke Shimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF power delivery with approximated saw tooth wave pulsing
- Patent number 9,788,405
- Issue date Oct 10, 2017
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulse reflection reduction for processing substrates
- Patent number 9,754,767
- Issue date Sep 5, 2017
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power delivery regulation for processing substrates
- Patent number 9,741,539
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic impedance tuning with RF dual level pulsing
- Patent number 9,614,524
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Katsumasa Kawasaki
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Methods for etching materials using synchronized RF pulses
- Patent number 9,269,587
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronized radio frequency pulsing for plasma etching
- Patent number 8,962,488
- Issue date Feb 24, 2015
- Applied Materials, Inc.
- Bryan Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Synchronized radio frequency pulsing for plasma etching
- Patent number 8,404,598
- Issue date Mar 26, 2013
- Applied Materials, Inc.
- Bryan Liao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR DELIVERING A PLURALITY OF WAVEFORM SIGNALS...
- Publication number 20230298856
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DELIVERING A PLURALITY OF WAVEFORM SIGNALS...
- Publication number 20230178336
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- James ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220130642
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20210142987
- Publication date May 13, 2021
- Applied Materials, Inc.
- DAISUKE SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20200294771
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- DAISUKE SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) PULSING IMPEDANCE TUNING WITH MULTIPLIER MODE
- Publication number 20200075290
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- KATSUMASA KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART RF PULSING TUNING USING VARIABLE FREQUENCY GENERATORS
- Publication number 20190362941
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART RF PULSING TUNING USING VARIABLE FREQUENCY GENERATORS
- Publication number 20180261430
- Publication date Sep 13, 2018
- KATSUMASA KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF POWER DELIVERY REGULATION FOR PROCESSING SUBSTRATES
- Publication number 20170358428
- Publication date Dec 14, 2017
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF PULSE REFLECTION REDUCTION FOR PROCESSING SUBSTRATES
- Publication number 20170103873
- Publication date Apr 13, 2017
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF POWER DELIVERY REGULATION FOR PROCESSING SUBSTRATES
- Publication number 20170098527
- Publication date Apr 6, 2017
- Applied Materials, Inc.
- Katsumasa KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF POWER DELIVERY WITH APPROXIMATED SAW TOOTH WAVE PULSING
- Publication number 20170099722
- Publication date Apr 6, 2017
- Applied Materials, Inc.
- KATSUMASA KAWASAKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS FOR ETCHING MATERIALS USING SYNCHRONIZED RF PULSES
- Publication number 20150072530
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...
- Publication number 20140342570
- Publication date Nov 20, 2014
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZED RADIO FREQUENCY PULSING FOR PLASMA ETCHING
- Publication number 20130213935
- Publication date Aug 22, 2013
- Applied Materials, Inc.
- BRYAN LIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING
- Publication number 20120000888
- Publication date Jan 5, 2012
- Applied Materials, Inc.
- KATSUMASA KAWASAKI
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
SYNCHRONIZED RADIO FREQUENCY PULSING FOR PLASMA ETCHING
- Publication number 20110031216
- Publication date Feb 10, 2011
- Applied Materials, Inc.
- BRYAN LIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Katsumasa KAWASAKI

Person

Patents Grantslast 30 patents

Apparatus and method for delivering a plurality of waveform signals...

Methods and apparatus for etching semiconductor structures

Methods and apparatus for etching semiconductor structures

Radio frequency (RF) pulsing impedance tuning with multiplier mode

Smart RF pulsing tuning using variable frequency generators

Methods and apparatus for etching semiconductor structures

RF power delivery regulation for processing substrates

Smart RF pulsing tuning using variable frequency generators

Smart multi-level RF pulsing methods

RF power delivery with approximated saw tooth wave pulsing

RF pulse reflection reduction for processing substrates

RF power delivery regulation for processing substrates

Automatic impedance tuning with RF dual level pulsing

Methods for etching materials using synchronized RF pulses

Synchronized radio frequency pulsing for plasma etching

Synchronized radio frequency pulsing for plasma etching

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR DELIVERING A PLURALITY OF WAVEFORM SIGNALS...

APPARATUS AND METHOD FOR DELIVERING A PLURALITY OF WAVEFORM SIGNALS...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES

METHODS AND APPARATUS FOR ETCHING SEMICONDUCTOR STRUCTURES

RADIO FREQUENCY (RF) PULSING IMPEDANCE TUNING WITH MULTIPLIER MODE

SMART RF PULSING TUNING USING VARIABLE FREQUENCY GENERATORS

SMART RF PULSING TUNING USING VARIABLE FREQUENCY GENERATORS

RF POWER DELIVERY REGULATION FOR PROCESSING SUBSTRATES

RF PULSE REFLECTION REDUCTION FOR PROCESSING SUBSTRATES

RF POWER DELIVERY REGULATION FOR PROCESSING SUBSTRATES

RF POWER DELIVERY WITH APPROXIMATED SAW TOOTH WAVE PULSING

METHODS FOR ETCHING MATERIALS USING SYNCHRONIZED RF PULSES

ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...

SYNCHRONIZED RADIO FREQUENCY PULSING FOR PLASMA ETCHING

METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING

SYNCHRONIZED RADIO FREQUENCY PULSING FOR PLASMA ETCHING