KATSUMI INOMATA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Stack, method for treating substrate material, temporary fixing com...
- Patent number 10,086,583
- Issue date Oct 2, 2018
- JSR Corporation
- Torahiko Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate treating method, temporary fixing composition and semicon...
- Patent number 8,889,557
- Issue date Nov 18, 2014
- JSR Corporation
- Torahiko Yamaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive insulating resin composition and cured prod...
- Patent number 7,371,500
- Issue date May 13, 2008
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming bump on electrode pad with use of double-layered...
- Patent number 7,265,044
- Issue date Sep 4, 2007
- JSR Corporation
- Masaru Ohta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Two-layer film and method of forming pattern with the same
- Patent number 7,247,420
- Issue date Jul 24, 2007
- JSR Corporation
- Masaru Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positively photosensitive insulating resin composition and cured ob...
- Patent number 7,214,454
- Issue date May 8, 2007
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming photosensitive dielectric material, and tra...
- Patent number 7,015,256
- Issue date Mar 21, 2006
- JSR Corporation
- Nobuyuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,171,750
- Issue date Jan 9, 2001
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,048,659
- Issue date Apr 11, 2000
- JSR Corporation
- Masaaki Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,007,961
- Issue date Dec 28, 1999
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 5,958,645
- Issue date Sep 28, 1999
- Japan Synthetic Rubber Co., Ltd.
- Kouichi Hirose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,798,201
- Issue date Aug 25, 1998
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,707,558
- Issue date Jan 13, 1998
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition containing quinone diazide es...
- Patent number 5,672,459
- Issue date Sep 30, 1997
- Japan Synthetic Rubber Co., Ltd.
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAM...
- Publication number 20170127533
- Publication date May 4, 2017
- JSR Corporation
- JUN MUKAWA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COM...
- Publication number 20160375652
- Publication date Dec 29, 2016
- JSR Corporation
- TORAHIKO YAMAGUCHI
- B32 - LAYERED PRODUCTS
Information Patent Application
MICROFLUIDIC DEVICE, PROCESS FOR PRODUCING THE SAME, AND CHANNEL-FO...
- Publication number 20160136638
- Publication date May 19, 2016
- JSR Corporation
- Katsuhiko Hieda
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COM...
- Publication number 20160049324
- Publication date Feb 18, 2016
- JSR Corporation
- Torahiko YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING METHOD, TEMPORARY FIXING COMPOSITION AND SEMICON...
- Publication number 20130285217
- Publication date Oct 31, 2013
- JSR Corporation
- Torahiko YAMAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Positive Photosensitive Insulating Resin Composition And Cured Prod...
- Publication number 20080097032
- Publication date Apr 24, 2008
- JSR Corporation
- Atsushi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME
- Publication number 20070248905
- Publication date Oct 25, 2007
- JSR Corporation
- Masaru OHTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bilayer Laminated Film for Bump Formation and Method of Bump Formation
- Publication number 20070237890
- Publication date Oct 11, 2007
- JSR Corporation
- Hiroko Sakai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PROD...
- Publication number 20070166632
- Publication date Jul 19, 2007
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive insulating resin composition and cured product thereof
- Publication number 20070027231
- Publication date Feb 1, 2007
- JSR Corporation
- Hirohumi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heat curable resin composition having a low elastic modulus, heat c...
- Publication number 20060079609
- Publication date Apr 13, 2006
- JSR Corporation
- Takashi Nishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming bump on electrode pad with use of double-layered...
- Publication number 20050277245
- Publication date Dec 15, 2005
- Masaru Ohta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Two-layer film and method of forming pattern with the same
- Publication number 20040131963
- Publication date Jul 8, 2004
- Masaru Ohta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positively photosensitive insulating resin composition and cured ob...
- Publication number 20040126696
- Publication date Jul 1, 2004
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive insulating resin composition and cured product thereof
- Publication number 20040110084
- Publication date Jun 10, 2004
- JSR Corporation
- Katsumi Inomata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming photosensitive dielectric material, and tra...
- Publication number 20040094752
- Publication date May 20, 2004
- Nobuyuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

KATSUMI INOMATA

Person

Patents Grantslast 30 patents

Stack, method for treating substrate material, temporary fixing com...

Substrate treating method, temporary fixing composition and semicon...

Positive photosensitive insulating resin composition and cured prod...

Method for forming bump on electrode pad with use of double-layered...

Two-layer film and method of forming pattern with the same

Positively photosensitive insulating resin composition and cured ob...

Composition for forming photosensitive dielectric material, and tra...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition containing quinone diazide es...

Patents Applicationslast 30 patents

PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAM...

STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COM...

MICROFLUIDIC DEVICE, PROCESS FOR PRODUCING THE SAME, AND CHANNEL-FO...

STACK, METHOD FOR TREATING SUBSTRATE MATERIAL, TEMPORARY FIXING COM...

SUBSTRATE TREATING METHOD, TEMPORARY FIXING COMPOSITION AND SEMICON...

Positive Photosensitive Insulating Resin Composition And Cured Prod...

TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME

Bilayer Laminated Film for Bump Formation and Method of Bump Formation

POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PROD...

Photosensitive insulating resin composition and cured product thereof

Heat curable resin composition having a low elastic modulus, heat c...

Method for forming bump on electrode pad with use of double-layered...

Two-layer film and method of forming pattern with the same

Positively photosensitive insulating resin composition and cured ob...

Photosensitive insulating resin composition and cured product thereof

Composition for forming photosensitive dielectric material, and tra...