Katsuya TAKEMURA

Person

Jyoetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, patterning process, method for fo...
- Patent number 11,892,773
- Issue date Feb 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer of polyimide precursor, positive type photosensitive resin...
- Patent number 11,150,556
- Issue date Oct 19, 2021
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tetracarboxylic dianhydride, polyimide resin and method for produci...
- Patent number 10,919,918
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 10,815,572
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,816,900
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
- Patent number 10,457,779
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus, encapsula...
- Patent number 10,319,653
- Issue date Jun 11, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
- Patent number 10,216,085
- Issue date Feb 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,203,601
- Issue date Feb 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
- Patent number 10,197,914
- Issue date Feb 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus and encaps...
- Patent number 10,141,272
- Issue date Nov 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
- Patent number 10,114,287
- Issue date Oct 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone skeleton-containing polymer compound, chemically amplified...
- Patent number 10,087,288
- Issue date Oct 2, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor apparatus, stacked semiconductor apparatus, encapsula...
- Patent number 9,620,429
- Issue date Apr 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kyoko Soga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
- Patent number 9,557,645
- Issue date Jan 31, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 9,519,217
- Issue date Dec 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition, photo-curable dry...
- Patent number 9,494,863
- Issue date Nov 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, chemically amplified negative resist composition,...
- Patent number 9,400,428
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicone structure-bearing polymer, negative resist composition, ph...
- Patent number 9,377,689
- Issue date Jun 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone structure-bearing polymer, resin composition, and photo-cu...
- Patent number 9,366,961
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemically amplified negative resist composition, photo-curable dry...
- Patent number 9,158,191
- Issue date Oct 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- B32 - LAYERED PRODUCTS
Information Patent Grant
Silicone structure-bearing polymer, resin composition, and photo-cu...
- Patent number 9,091,919
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 9,063,421
- Issue date Jun 23, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Yasuda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Naphthalene derivative, resist bottom layer material, and patternin...
- Patent number 9,045,587
- Issue date Jun 2, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Chemically amplified positive resist composition and pattern formin...
- Patent number 9,017,905
- Issue date Apr 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and patterning pro...
- Patent number 8,980,525
- Issue date Mar 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Yasuda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20220317570
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
- Publication number 20220315676
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION,...
- Publication number 20220289911
- Publication date Sep 15, 2022
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FO...
- Publication number 20220091509
- Publication date Mar 24, 2022
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
- Publication number 20220043351
- Publication date Feb 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20220043348
- Publication date Feb 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...
- Publication number 20210317268
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...
- Publication number 20210317270
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20200326624
- Publication date Oct 15, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...
- Publication number 20200041903
- Publication date Feb 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...
- Publication number 20190169211
- Publication date Jun 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20190018320
- Publication date Jan 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN...
- Publication number 20180275513
- Publication date Sep 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20180120702
- Publication date May 3, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
- Publication number 20180024434
- Publication date Jan 25, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
- Publication number 20170298186
- Publication date Oct 19, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
- Publication number 20170255097
- Publication date Sep 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20170103932
- Publication date Apr 13, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20170077043
- Publication date Mar 16, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Chemically Amplified Positive Resist Composition and Pattern Formin...
- Publication number 20170038684
- Publication date Feb 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yoshinori Hirano
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...
- Publication number 20160358833
- Publication date Dec 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kyoko SOGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED...
- Publication number 20160200877
- Publication date Jul 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- B32 - LAYERED PRODUCTS
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...
- Publication number 20160097974
- Publication date Apr 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUC...
- Publication number 20160097973
- Publication date Apr 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PH...
- Publication number 20160033865
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
- Publication number 20150370166
- Publication date Dec 24, 2015
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20150355543
- Publication date Dec 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...
- Publication number 20150293447
- Publication date Oct 15, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20150056545
- Publication date Feb 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNIN...
- Publication number 20140363768
- Publication date Dec 11, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Katsuya TAKEMURA

Person

Patents Grantslast 30 patents

Positive photosensitive resin composition, positive photosensitive...

Photosensitive resin composition, patterning process, method for fo...

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Compound, polyimide resin and method of producing the same, photose...

Polymer, photosensitive resin composition, patterning method, metho...

Polymer of polyimide precursor, positive type photosensitive resin...

Tetracarboxylic dianhydride, polyimide resin and method for produci...

Chemically amplified positive resist composition and pattern formin...

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Tetracarboxylic acid diester compound, polyimide precursor polymer...

Semiconductor apparatus, stacked semiconductor apparatus, encapsula...

Tetracarboxylic acid diester compound, polyimide precursor polymer...

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Positive photosensitive resin composition, photo-curable dry film a...

Semiconductor apparatus, stacked semiconductor apparatus and encaps...

Silicone skeleton-containing polymer compound and method for produc...

Silicone skeleton-containing polymer compound, chemically amplified...

Semiconductor apparatus, stacked semiconductor apparatus, encapsula...

Positive photosensitive resin composition, photo-curable dry film a...

Chemically amplified positive resist composition and patterning pro...

Chemically amplified negative resist composition, photo-curable dry...

Polymer compound, chemically amplified negative resist composition,...

Silicone structure-bearing polymer, negative resist composition, ph...

Silicone structure-bearing polymer, resin composition, and photo-cu...

Chemically amplified negative resist composition, photo-curable dry...

Silicone structure-bearing polymer, resin composition, and photo-cu...

Chemically amplified positive resist composition and pattern formin...

Naphthalene derivative, resist bottom layer material, and patternin...

Chemically amplified positive resist composition and pattern formin...

Chemically amplified positive resist composition and patterning pro...

Patents Applicationslast 30 patents

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...

POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION,...

PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FO...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...

NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...

NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

Chemically Amplified Positive Resist Composition and Pattern Formin...

SEMICONDUCTOR APPARATUS, STACKED SEMICONDUCTOR APPARATUS, ENCAPSULA...

SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...

SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUC...

SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PH...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PRO...

SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...

POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNIN...