Katsuyuki Hishiya

Person

Oshu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film formation apparatus
- Patent number 10,550,467
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Hiroaki Ikegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 10,519,550
- Issue date Dec 31, 2019
- Tokyo Electron Limited
- Hiroaki Ikegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus, film deposition method, and computer-rea...
- Patent number 9,932,674
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 9,702,043
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus, film deposition method and storage medium
- Patent number 9,453,280
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus
- Patent number 9,062,373
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate conveying container opening/closing device, lid opening/c...
- Patent number 9,048,273
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Katsuhiko Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method
- Patent number 8,414,242
- Issue date Apr 9, 2013
- Tokyo Electron Limited
- Katsuyuki Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system for process object and thermal processing method...
- Patent number 8,231,381
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Katsuyuki Hishiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Workpiece transfer mechanism, workpiece transfer method and workpie...
- Patent number 8,181,769
- Issue date May 22, 2012
- Tokyo Electron Limited
- Katsuyuki Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas-separating plate for reactor for manufacturing semiconductor
- Patent number D655260
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Side wall for reactor for manufacturing semiconductor
- Patent number D655258
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Top plate for reactor for manufacturing semiconductor
- Patent number D655257
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Top plate for reactor for manufacturing semiconductor
- Patent number D655259
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Gas-separating plate for reactor for manufacturing semiconductor
- Patent number D655261
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Side wall for reactor for manufacturing semiconductor
- Patent number D655262
- Issue date Mar 6, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Top plate for reactor for manufacturing semiconductor
- Patent number D654884
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Gas-separating plate for reactor for manufacturing semiconductor
- Patent number D654882
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Top plate for reactor for manufacturing semiconductor
- Patent number D654883
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Manabu Honma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Vertical type heat processing apparatus and vertical type heat proc...
- Patent number 7,922,485
- Issue date Apr 12, 2011
- Tokyo Electron Limited
- Hiromi Nitadori
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Vertical heat processing apparatus and heat processing method using...
- Patent number 7,896,648
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Hiromi Nitadori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Film Formation Apparatus
- Publication number 20170183777
- Publication date Jun 29, 2017
- TOKYO ELECTRON LIMITED
- Hiroaki IKEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS
- Publication number 20170183779
- Publication date Jun 29, 2017
- TOKYO ELECTRON LIMITED
- Hiroaki IKEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20130276705
- Publication date Oct 24, 2013
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...
- Publication number 20130149467
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD AND STORAGE MEDIUM
- Publication number 20130059415
- Publication date Mar 7, 2013
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS
- Publication number 20130042813
- Publication date Feb 21, 2013
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE CONVEYING CONTAINER OPENING/CLOSING DEVICE, LID OPENING/C...
- Publication number 20120315114
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Katsuhiko OYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20120094011
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Katsuyuki HISHIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20100098517
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Katsuyuki HISHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece transfer mechanism, workpiece transfer method and workpie...
- Publication number 20090101472
- Publication date Apr 23, 2009
- TOKYO ELECTRON LIMITED
- Katsuyuki Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing system for process object and thermal processing method...
- Publication number 20090092940
- Publication date Apr 9, 2009
- TOKYO ELECTRON LIMITED
- Katsuyuki Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical heat processing apparatus and heat processing method using...
- Publication number 20080199818
- Publication date Aug 21, 2008
- TOKYO ELECTRON LIMITED
- Hiromi Nitadori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical type heat processing apparatus and vertical type heat proc...
- Publication number 20080193888
- Publication date Aug 14, 2008
- TOKYO ELECTRON LIMITED
- Hiromi Nitadori
- H01 - BASIC ELECTRIC ELEMENTS

Katsuyuki Hishiya

Person

Patents Grantslast 30 patents

Film formation apparatus

Film formation apparatus

Film deposition apparatus, film deposition method, and computer-rea...

Substrate processing apparatus

Film deposition apparatus, film deposition method and storage medium

Film deposition apparatus

Substrate conveying container opening/closing device, lid opening/c...

Processing apparatus and processing method

Processing system for process object and thermal processing method...

Workpiece transfer mechanism, workpiece transfer method and workpie...

Gas-separating plate for reactor for manufacturing semiconductor

Side wall for reactor for manufacturing semiconductor

Top plate for reactor for manufacturing semiconductor

Top plate for reactor for manufacturing semiconductor

Gas-separating plate for reactor for manufacturing semiconductor

Side wall for reactor for manufacturing semiconductor

Top plate for reactor for manufacturing semiconductor

Gas-separating plate for reactor for manufacturing semiconductor

Top plate for reactor for manufacturing semiconductor

Vertical type heat processing apparatus and vertical type heat proc...

Vertical heat processing apparatus and heat processing method using...

Patents Applicationslast 30 patents

Film Formation Apparatus

FILM FORMATION APPARATUS

SUBSTRATE PROCESSING APPARATUS

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD AND STORAGE MEDIUM

FILM DEPOSITION APPARATUS

SUBSTRATE CONVEYING CONTAINER OPENING/CLOSING DEVICE, LID OPENING/C...

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

PROCESSING APPARATUS AND PROCESSING METHOD

Workpiece transfer mechanism, workpiece transfer method and workpie...

Processing system for process object and thermal processing method...

Vertical heat processing apparatus and heat processing method using...

Vertical type heat processing apparatus and vertical type heat proc...