KAZUE TAKAHASHI

Person

KUDAMATSU-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,955,514
- Issue date Jun 7, 2011
- Hitachi High-Technologies Corporation
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,686,917
- Issue date Mar 30, 2010
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,608,162
- Issue date Oct 27, 2009
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,565,879
- Issue date Jul 28, 2009
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,376,479
- Issue date May 20, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,288,166
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,208,422
- Issue date Apr 24, 2007
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,169,254
- Issue date Jan 30, 2007
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,158,848
- Issue date Jan 2, 2007
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,058,467
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and a plasma processing method
- Patent number 7,048,869
- Issue date May 23, 2006
- Hitachi, Ltd.
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring methods in a plasma processing apparatus, monito...
- Patent number 6,967,109
- Issue date Nov 22, 2005
- Hitachi, Ltd.
- Tatehito Usui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,923,885
- Issue date Aug 2, 2005
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,899,789
- Issue date May 31, 2005
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 6,879,867
- Issue date Apr 12, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,867,144
- Issue date Mar 15, 2005
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 6,815,365
- Issue date Nov 9, 2004
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring methods in a plasma processing apparatus, monito...
- Patent number 6,759,253
- Issue date Jul 6, 2004
- Hitachi, Ltd.
- Tatehito Usui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,759,338
- Issue date Jul 6, 2004
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,755,932
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,676,805
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,649,021
- Issue date Nov 18, 2003
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,645,871
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote diagnostic system and method for semiconductor manufacturing...
- Patent number 6,618,692
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,170
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,171
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching end point judging method, etching end point judging device,...
- Patent number 6,596,551
- Issue date Jul 22, 2003
- Hitachi, Ltd.
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,558,100
- Issue date May 6, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,544,379
- Issue date Apr 8, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,537,012
- Issue date Mar 25, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20100140224
- Publication date Jun 10, 2010
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20090289035
- Publication date Nov 26, 2009
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and a plasma processing method
- Publication number 20090008363
- Publication date Jan 8, 2009
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080169065
- Publication date Jul 17, 2008
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20080023145
- Publication date Jan 31, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing System And Apparatus And A Sample Processing Method
- Publication number 20080011422
- Publication date Jan 17, 2008
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20070162172
- Publication date Jul 12, 2007
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060249254
- Publication date Nov 9, 2006
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and a plasma processing method
- Publication number 20060157449
- Publication date Jul 20, 2006
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20060142888
- Publication date Jun 29, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma treatment method
- Publication number 20060060300
- Publication date Mar 23, 2006
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process monitoring methods in a plasma processing apparatus, monito...
- Publication number 20060000800
- Publication date Jan 5, 2006
- Tatehito Usui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20050236109
- Publication date Oct 27, 2005
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20050090914
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus
- Publication number 20050064717
- Publication date Mar 24, 2005
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050039683
- Publication date Feb 24, 2005
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring methods in a plasma processing apparatus, monito...
- Publication number 20040235310
- Publication date Nov 25, 2004
- Tatehito Usui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040177925
- Publication date Sep 16, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus
- Publication number 20040149385
- Publication date Aug 5, 2004
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118517
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118518
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Dry etching method
- Publication number 20040058554
- Publication date Mar 25, 2004
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20040045675
- Publication date Mar 11, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040016508
- Publication date Jan 29, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040009617
- Publication date Jan 15, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20030203640
- Publication date Oct 30, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20030192647
- Publication date Oct 16, 2003
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment method
- Publication number 20030060054
- Publication date Mar 27, 2003
- Kazue Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etching end point judging device
- Publication number 20030036282
- Publication date Feb 20, 2003
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20030024646
- Publication date Feb 6, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS

KAZUE TAKAHASHI

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing system and apparatus and a sample processing method

Plasma processing apparatus and method

Plasma processing apparatus

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus

Plasma processing method

Plasma processing system and apparatus and a sample processing method

Process monitoring device for sample processing apparatus and contr...

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus and a plasma processing method

Process monitoring methods in a plasma processing apparatus, monito...

Plasma processing system and apparatus and a sample processing method

Method of holding substrate and substrate holding system

Process monitoring device for sample processing apparatus and contr...

Apparatus and method for plasma processing high-speed semiconductor...

Plasma etching apparatus and plasma etching method

Process monitoring methods in a plasma processing apparatus, monito...

Plasma processing apparatus and method

Plasma processing system and apparatus and a sample processing method

Method of holding substrate and substrate holding system

Apparatus and method for plasma processing high-speed semiconductor...

Method of holding substrate and substrate holding system

Remote diagnostic system and method for semiconductor manufacturing...

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Etching end point judging method, etching end point judging device,...

Vacuum processing apparatus and a vacuum processing system

Method of holding substrate and substrate holding system

Vacuum processing apparatus and a vacuum processing system

Patents Applicationslast 30 patents

Plasma Processing Apparatus And Plasma Processing Method

Plasma Processing Apparatus And Plasma Processing Method

Plasma processing apparatus and a plasma processing method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

Plasma Processing System And Apparatus And A Sample Processing Method

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and a plasma processing method

Process monitoring device for sample processing apparatus and contr...

Plasma treatment method

Process monitoring methods in a plasma processing apparatus, monito...

Plasma etching apparatus and plasma etching method

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus

Plasma processing method

Process monitoring methods in a plasma processing apparatus, monito...

Plasma processing system and apparatus and a sample processing method

Plasma processing apparatus

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Dry etching method

Plasma etching apparatus

Plasma etching apparatus and plasma etching method

Plasma etching apparatus and plasma etching method

Plasma etching apparatus

Method of holding substrate and substrate holding system

Plasma treatment method

Etching end point judging device

Plasma etching apparatus and plasma etching method