Kazuki MOYAMA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,721,524
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,699,573
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method using transporting device facilitating...
- Patent number 11,613,432
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Kazuki Moyama
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Exhaust device for processing apparatus provided with multiple blades
- Patent number 11,315,770
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system and plasma processing method
- Patent number 11,107,663
- Issue date Aug 31, 2021
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power generation systems and methods for plasma stability and control
- Patent number 11,094,507
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modules, multi-stage systems, and related methods for radio frequen...
- Patent number 11,050,394
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Substrate processing method
- Patent number 11,043,389
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and temperature control method
- Patent number 11,041,241
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of sample table
- Patent number 10,896,842
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Wataru Yoshikawa
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and systems for controlling plasma performance
- Patent number 10,510,512
- Issue date Dec 17, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling adherence of microparticles to substrate to b...
- Patent number 9,892,951
- Issue date Feb 13, 2018
- Tokyo Electron Limited
- Takehiro Tanikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antenna, dielectric window, plasma processing apparatus and plasma...
- Patent number 9,595,425
- Issue date Mar 14, 2017
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, method for producing semiconductor device, a...
- Patent number 9,324,572
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 9,111,726
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric window for plasma treatment device, and plasma treatment...
- Patent number 9,048,070
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device and optical monitor device
- Patent number 8,974,628
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- G01 - MEASURING TESTING
Information Patent Grant
Solar cell wherein solar photovolatic thin film is directly formed...
- Patent number 8,841,545
- Issue date Sep 23, 2014
- Tohoku University
- Yoshihide Wakayama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for controlling film forming apparatus, film forming method,...
- Patent number 8,328,999
- Issue date Dec 11, 2012
- Tokyo Electron Limited
- Kazuki Moyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...
- Publication number 20240128057
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240047184
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20230282446
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND METHOD F...
- Publication number 20210398783
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210375592
- Publication date Dec 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Generation Systems and Methods for Plasma Stability and Control
- Publication number 20210343504
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...
- Publication number 20210319988
- Publication date Oct 14, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD
- Publication number 20210296102
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM AND PART REPLACEMENT METHOD
- Publication number 20210269258
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PART TRANSPORTING DEVICE AND PROCESSING SYSTEM
- Publication number 20210268670
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
TRANSFER METHOD AND TRANSFER APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
- Publication number 20210050240
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL
- Publication number 20210027992
- Publication date Jan 28, 2021
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...
- Publication number 20200395901
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Chelsea DuBose
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200373166
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200312623
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD
- Publication number 20190376185
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD
- Publication number 20190252157
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE
- Publication number 20190228950
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD
- Publication number 20190172689
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Kazuya NAGASEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SAMPLE TABLE
- Publication number 20180286740
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Wataru YOSHIKAWA
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Member for Plasma Processing Apparatus and Plasma Processing Apparatus
- Publication number 20170133204
- Publication date May 11, 2017
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ETCHING TRANSITION METAL FILM AND SUBSTRATE PROCESSING AP...
- Publication number 20170125261
- Publication date May 4, 2017
- TOKYO ELECTRON LIMITED
- Ryo MIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170011886
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ADHERENCE OF MICROPARTICLES TO SUBSTRATE TO B...
- Publication number 20150075566
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...
- Publication number 20140312767
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...
- Publication number 20140166205
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
- Publication number 20130302992
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE
- Publication number 20130180660
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- G01 - MEASURING TESTING
Information Patent Application
FILM-FORMING APPARATUS FOR FORMING A CATHODE ON AN ORGANIC LAYER FO...
- Publication number 20130062199
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Kazuki Moyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, A...
- Publication number 20130029494
- Publication date Jan 31, 2013
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Kazuki MOYAMA

Person

Patents Grantslast 30 patents

Power generation systems and methods for plasma stability and control

Plasma processing method

Processing system and method using transporting device facilitating...

Exhaust device for processing apparatus provided with multiple blades

Plasma processing system and plasma processing method

Power generation systems and methods for plasma stability and control

Modules, multi-stage systems, and related methods for radio frequen...

Substrate processing method

Plasma processing apparatus and temperature control method

Manufacturing method of sample table

Methods and systems for controlling plasma performance

Method of controlling adherence of microparticles to substrate to b...

Antenna, dielectric window, plasma processing apparatus and plasma...

Plasma etching method, method for producing semiconductor device, a...

Apparatus for plasma treatment and method for plasma treatment

Plasma processing apparatus

Dielectric window for plasma treatment device, and plasma treatment...

Plasma treatment device and optical monitor device

Solar cell wherein solar photovolatic thin film is directly formed...

Method for controlling film forming apparatus, film forming method,...

Patents Applicationslast 30 patents

CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...

PLASMA PROCESSING APPARATUS

APPARATUS FOR PLASMA PROCESSING

PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND METHOD F...

PLASMA PROCESSING METHOD

Power Generation Systems and Methods for Plasma Stability and Control

SUBSTRATE SUPPORT STAGE, PLASMA PROCESSING SYSTEM, AND METHOD OF MO...

EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD

PROCESSING SYSTEM AND PART REPLACEMENT METHOD

PART TRANSPORTING DEVICE AND PROCESSING SYSTEM

TRANSFER METHOD AND TRANSFER APPARATUS FOR SUBSTRATE PROCESSING SYSTEM

POWER GENERATION SYSTEMS AND METHODS FOR PLASMA STABILITY AND CONTROL

MODULES, MULTI-STAGE SYSTEMS, AND RELATED METHODS FOR RADIO FREQUEN...

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD

METHODS AND SYSTEMS FOR CONTROLLING PLASMA PERFORMANCE

EXHAUST DEVICE, PROCESSING APPARATUS, AND EXHAUSTING METHOD

MANUFACTURING METHOD OF SAMPLE TABLE

Member for Plasma Processing Apparatus and Plasma Processing Apparatus

METHOD OF ETCHING TRANSITION METAL FILM AND SUBSTRATE PROCESSING AP...

PLASMA PROCESSING APPARATUS

METHOD OF CONTROLLING ADHERENCE OF MICROPARTICLES TO SUBSTRATE TO B...

DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...

PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, P...

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

PLASMA TREATMENT DEVICE AND OPTICAL MONITOR DEVICE

FILM-FORMING APPARATUS FOR FORMING A CATHODE ON AN ORGANIC LAYER FO...

PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, A...