Kazumi Noda

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,018,015
- Issue date May 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 10,007,183
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,977,330
- Issue date May 22, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic film composition, process for forming organic film, pattern...
- Patent number 9,728,420
- Issue date Aug 8, 2017
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic film composition, method for forming organic film and patte...
- Patent number 9,372,404
- Issue date Jun 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,261,788
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Near-infrared absorptive layer-forming composition and multilayer film
- Patent number 9,069,245
- Issue date Jun 30, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G02 - OPTICS
Information Patent Grant
Resist underlayer film composition, method for producing polymer fo...
- Patent number 9,046,764
- Issue date Jun 2, 2015
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-infrared absorptive layer-forming composition and multilayer f...
- Patent number 8,722,307
- Issue date May 13, 2014
- International Business Machines Corporation
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Near-infrared absorbing dye, near-infrared absorptive film-forming...
- Patent number 8,323,536
- Issue date Dec 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Antireflective coating composition, antireflective coating, and pat...
- Patent number 8,313,890
- Issue date Nov 20, 2012
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist lower layer film-formed substrate
- Patent number 8,288,072
- Issue date Oct 16, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silsesquioxane compound mixture, hydrolyzable silane compound, maki...
- Patent number 8,153,836
- Issue date Apr 10, 2012
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Double patterning process
- Patent number 8,129,100
- Issue date Mar 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating composition, antireflective coating, and pat...
- Patent number 7,879,530
- Issue date Feb 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process using the same
- Patent number 7,745,094
- Issue date Jun 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflection film composition and patterning process using the same
- Patent number 7,687,228
- Issue date Mar 30, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist material and pattern formation method using the same
- Patent number 7,651,829
- Issue date Jan 26, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and patterning process
- Patent number 7,550,247
- Issue date Jun 23, 2009
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist composition and patterning process
- Patent number 7,510,816
- Issue date Mar 31, 2009
- Shin-Estu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nitrogen-containing organic compound, resist composition and patter...
- Patent number 7,276,324
- Issue date Oct 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nitrogen-containing organic compound, chemically amplified resist c...
- Patent number 7,261,995
- Issue date Aug 28, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photo-curable resin composition, patterning process, and substrate...
- Patent number 6,899,991
- Issue date May 31, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Lift-off resist compositions
- Patent number 6,558,867
- Issue date May 6, 2003
- Shin-Etsu Chemical Co., Ltd.
- Kazumi Noda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Purification of polysilane
- Patent number 5,905,139
- Issue date May 18, 1999
- Shin-Etsu Chemical Co., Ltd.
- Shigeru Mori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...
- Publication number 20210198472
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...
- Publication number 20190198341
- Publication date Jun 27, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERN...
- Publication number 20160336189
- Publication date Nov 17, 2016
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20160027653
- Publication date Jan 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20160018735
- Publication date Jan 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20130337649
- Publication date Dec 19, 2013
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...
- Publication number 20130302990
- Publication date Nov 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FO...
- Publication number 20130171569
- Publication date Jul 4, 2013
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION
- Publication number 20130157463
- Publication date Jun 20, 2013
- Shin-Etsu Chemical Co., Ltd.
- Dario L. Goldfarb
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER F...
- Publication number 20120301828
- Publication date Nov 29, 2012
- Seiichiro TACHIBANA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEAR-INFRARED ABSORBING DYE, NEAR-INFRARED ABSORPTIVE FILM-FORMING...
- Publication number 20120119171
- Publication date May 17, 2012
- Masaki OHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM
- Publication number 20110262862
- Publication date Oct 27, 2011
- Masaki OHASHI
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM
- Publication number 20110262863
- Publication date Oct 27, 2011
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PA...
- Publication number 20100151381
- Publication date Jun 17, 2010
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DOUBLE PATTERNING PROCESS
- Publication number 20090253084
- Publication date Oct 8, 2009
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PAT...
- Publication number 20090087799
- Publication date Apr 2, 2009
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKI...
- Publication number 20080311514
- Publication date Dec 18, 2008
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo NAKASHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist lower layer film composition and patterning process using th...
- Publication number 20080227037
- Publication date Sep 18, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflection film composition and patterning process using the same
- Publication number 20080220381
- Publication date Sep 11, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process using the same
- Publication number 20070190458
- Publication date Aug 16, 2007
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process using the same
- Publication number 20070190457
- Publication date Aug 16, 2007
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-containing resist composition and patterning process
- Publication number 20060073413
- Publication date Apr 6, 2006
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20060040206
- Publication date Feb 23, 2006
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nitrogen-containing organic compound, chemically amplified resist c...
- Publication number 20050238993
- Publication date Oct 27, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Nitrogen-containing organic compound, resist composition and patter...
- Publication number 20050106500
- Publication date May 19, 2005
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive polymer composition and pattern forming method...
- Publication number 20050079443
- Publication date Apr 14, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kazumi Noda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist material and pattern formation method using the same
- Publication number 20040241579
- Publication date Dec 2, 2004
- Shin-Etsu Chemical Co., Ltd.
- Yoshitaka Hamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-curable resin composition, patterning process, and substrate...
- Publication number 20030113662
- Publication date Jun 19, 2003
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Lift-off resist compositions
- Publication number 20010019808
- Publication date Sep 6, 2001
- Kazumi Noda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazumi Noda

Person

Patents Grantslast 30 patents

Composition for forming organic film, substrate for manufacturing s...

Compound for forming organic film, and organic film composition usi...

Compound for forming organic film, and organic film composition usi...

Organic film composition, process for forming organic film, pattern...

Organic film composition, method for forming organic film and patte...

Compound for forming organic film, and organic film composition usi...

Near-infrared absorptive layer-forming composition and multilayer film

Resist underlayer film composition, method for producing polymer fo...

Near-infrared absorptive layer-forming composition and multilayer f...

Near-infrared absorbing dye, near-infrared absorptive film-forming...

Antireflective coating composition, antireflective coating, and pat...

Resist lower layer film-formed substrate

Silsesquioxane compound mixture, hydrolyzable silane compound, maki...

Double patterning process

Antireflective coating composition, antireflective coating, and pat...

Resist composition and patterning process using the same

Antireflection film composition and patterning process using the same

Positive resist material and pattern formation method using the same

Resist composition and patterning process

Silicon-containing resist composition and patterning process

Nitrogen-containing organic compound, resist composition and patter...

Nitrogen-containing organic compound, chemically amplified resist c...

Photo-curable resin composition, patterning process, and substrate...

Lift-off resist compositions

Purification of polysilane

Patents Applicationslast 30 patents

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...

ORGANIC FILM COMPOSITION, PROCESS FOR FORMING ORGANIC FILM, PATTERN...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...

RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FO...

NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER F...

NEAR-INFRARED ABSORBING DYE, NEAR-INFRARED ABSORPTIVE FILM-FORMING...

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM

NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM

ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PA...

DOUBLE PATTERNING PROCESS

ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PAT...

SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKI...

Resist lower layer film composition and patterning process using th...

Antireflection film composition and patterning process using the same

Resist composition and patterning process using the same

Resist composition and patterning process using the same

Silicon-containing resist composition and patterning process

Resist composition and patterning process

Nitrogen-containing organic compound, chemically amplified resist c...

Nitrogen-containing organic compound, resist composition and patter...

Radiation-sensitive polymer composition and pattern forming method...

Positive resist material and pattern formation method using the same

Photo-curable resin composition, patterning process, and substrate...

Lift-off resist compositions