Kazutami Tago

Person

Hitachinaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam irradiation method and scanning electron microscope
- Patent number 9,640,366
- Issue date May 2, 2017
- Hitachi High-Technologies Corporation
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacture of semiconductor integrated circuit device an...
- Patent number 7,737,023
- Issue date Jun 15, 2010
- Renesas Technology Corporation
- Shouochi Uno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,442,651
- Issue date Oct 28, 2008
- Hitachi High-Technologies Corporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacture of semiconductor integrated circuit
- Patent number 7,419,902
- Issue date Sep 2, 2008
- Renesas Technology Corp.
- Shouochi Uno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number RE39895
- Issue date Oct 23, 2007
- Renesas Technology Corp.
- Takafumi Tokunaga
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Fabrication method of semiconductor integrated circuit device
- Patent number 6,787,446
- Issue date Sep 7, 2004
- Renesas Technology Corp.
- Hiroyuki Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 6,309,980
- Issue date Oct 30, 2001
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 6,074,958
- Issue date Jun 13, 2000
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 5,962,347
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method in which a...
- Patent number 5,895,586
- Issue date Apr 20, 1999
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number 5,874,013
- Issue date Feb 23, 1999
- Hitachi, Ltd.
- Takafumi Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electron Beam Irradiation Method and Scanning Electron Microscope
- Publication number 20130009057
- Publication date Jan 10, 2013
- Hitachi High-Technologies Corporation
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AN...
- Publication number 20090011592
- Publication date Jan 8, 2009
- Shouichi Uno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20070134922
- Publication date Jun 14, 2007
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication Method of Semiconductor Integrated Circuit Device
- Publication number 20070072408
- Publication date Mar 29, 2007
- Hiroyuki Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacture of semiconductor integrated circuit
- Publication number 20050186801
- Publication date Aug 25, 2005
- Shouochi Uno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method of semiconductor integrated circuit device
- Publication number 20050026424
- Publication date Feb 3, 2005
- RENESAS TECHNOLOGY CORP.
- Hiroyuki Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method of semiconductor integrated circuit device
- Publication number 20030045113
- Publication date Mar 6, 2003
- Hitachi, Ltd.
- Hiroyuki Enomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method of semiconductor integrated circuit device
- Publication number 20030032284
- Publication date Feb 13, 2003
- Hiroyuki Enomoto
- H01 - BASIC ELECTRIC ELEMENTS

Kazutami Tago

Person

Patents Grantslast 30 patents

Electron beam irradiation method and scanning electron microscope

Method of manufacture of semiconductor integrated circuit device an...

Plasma etching method

Method of manufacture of semiconductor integrated circuit

Semiconductor integrated circuit arrangement fabrication method

Fabrication method of semiconductor integrated circuit device

Semiconductor integrated circuit arrangement fabrication method

Semiconductor integrated circuit arrangement fabrication method

Semiconductor integrated circuit arrangement fabrication method

Plasma processing apparatus and plasma processing method in which a...

Semiconductor integrated circuit arrangement fabrication method

Patents Applicationslast 30 patents

Electron Beam Irradiation Method and Scanning Electron Microscope

METHOD OF MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AN...

Plasma etching method

Fabrication Method of Semiconductor Integrated Circuit Device

Method of manufacture of semiconductor integrated circuit

Fabrication method of semiconductor integrated circuit device

Fabrication method of semiconductor integrated circuit device

Fabrication method of semiconductor integrated circuit device