Kazuya Uenishi

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition
- Patent number 7,179,578
- Issue date Feb 20, 2007
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive composition
- Patent number 7,179,579
- Issue date Feb 20, 2007
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Thin film analyzing method
- Patent number 7,078,687
- Issue date Jul 18, 2006
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G01 - MEASURING TESTING
Information Patent Grant
Positive photoresist composition
- Patent number 6,962,766
- Issue date Nov 8, 2005
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intermediate layer material composition for multilayer resist proce...
- Patent number 6,897,004
- Issue date May 24, 2005
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,887,645
- Issue date May 3, 2005
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Intermediate layer composition for three-layer resist process and p...
- Patent number 6,884,571
- Issue date Apr 26, 2005
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 6,803,173
- Issue date Oct 12, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working resist composition
- Patent number 6,673,512
- Issue date Jan 6, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,511,783
- Issue date Jan 28, 2003
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 6,489,080
- Issue date Dec 3, 2002
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working electron beam or X-ray resist composition
- Patent number 6,265,135
- Issue date Jul 24, 2001
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive composition
- Patent number 6,200,729
- Issue date Mar 13, 2001
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition for far-ultraviolet exposure
- Patent number 6,150,068
- Issue date Nov 21, 2000
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive composition
- Patent number 6,013,411
- Issue date Jan 11, 2000
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive composition
- Patent number 6,010,820
- Issue date Jan 4, 2000
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive composition
- Patent number 5,981,140
- Issue date Nov 9, 1999
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Waterless planographic printing plate and method of plate making us...
- Patent number 5,955,238
- Issue date Sep 21, 1999
- Fuji Photo Film Co., Ltd.
- Hiroaki Yokoya
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Positive working photosensitive composition
- Patent number 5,891,603
- Issue date Apr 6, 1999
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive composition
- Patent number 5,837,420
- Issue date Nov 17, 1998
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive image forming composition
- Patent number 5,731,123
- Issue date Mar 24, 1998
- Fuji Photo Film Co., Ltd.
- Koichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photosensitive composition
- Patent number 5,683,856
- Issue date Nov 4, 1997
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition comprising a novolak resin ma...
- Patent number 5,576,139
- Issue date Nov 19, 1996
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition
- Patent number 5,565,300
- Issue date Oct 15, 1996
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Postive photoresist composition
- Patent number 5,529,881
- Issue date Jun 25, 1996
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micropattern-forming material having a low molecular weight novolak...
- Patent number 5,380,618
- Issue date Jan 10, 1995
- Fuji Photo Film Co., Ltd.
- Tadayoshi Kokubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type 1,2-naphthoquinonediazide photoresist composition con...
- Patent number 5,360,692
- Issue date Nov 1, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative type photoresist composition
- Patent number 5,340,697
- Issue date Aug 23, 1994
- Fuji Photo Film Co., Ltd.
- Hiroshi Yoshimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive quinone diazide photoresist composition containing select...
- Patent number 5,324,619
- Issue date Jun 28, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition comprising polyaromatic hydro...
- Patent number 5,290,658
- Issue date Mar 1, 1994
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Thin film analyzing method
- Publication number 20040232330
- Publication date Nov 25, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G01 - MEASURING TESTING
Information Patent Application
Intermediate layer material composition for multilayer resist proce...
- Publication number 20040053162
- Publication date Mar 18, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive composition
- Publication number 20040033437
- Publication date Feb 19, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Intermediate layer composition for three-layer resist process and p...
- Publication number 20030207208
- Publication date Nov 6, 2003
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030170562
- Publication date Sep 11, 2003
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20030054286
- Publication date Mar 20, 2003
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive photoresist composition
- Publication number 20030031950
- Publication date Feb 13, 2003
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20020061462
- Publication date May 23, 2002
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive resist composition
- Publication number 20020058206
- Publication date May 16, 2002
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION
- Publication number 20020015916
- Publication date Feb 7, 2002
- KAZUYA UENISHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Kazuya Uenishi

Person

Patents Grantslast 30 patents

Positive resist composition

Radiation-sensitive composition

Thin film analyzing method

Positive photoresist composition

Intermediate layer material composition for multilayer resist proce...

Negative resist composition

Intermediate layer composition for three-layer resist process and p...

Positive resist composition

Negative-working resist composition

Negative resist composition

Positive resist composition

Positive-working electron beam or X-ray resist composition

Positive photosensitive composition

Photosensitive resin composition for far-ultraviolet exposure

Positive working photosensitive composition

Positive photosensitive composition

Positive photosensitive composition

Waterless planographic printing plate and method of plate making us...

Positive working photosensitive composition

Positive working photosensitive composition

Positive image forming composition

Positive-working photosensitive composition

Positive type photoresist composition comprising a novolak resin ma...

Positive photoresist composition

Postive photoresist composition

Micropattern-forming material having a low molecular weight novolak...

Positive type 1,2-naphthoquinonediazide photoresist composition con...

Negative type photoresist composition

Positive quinone diazide photoresist composition containing select...

Positive type photoresist composition comprising polyaromatic hydro...

Patents Applicationslast 30 patents

Thin film analyzing method

Intermediate layer material composition for multilayer resist proce...

Radiation-sensitive composition

Intermediate layer composition for three-layer resist process and p...

Positive resist composition

Positive resist composition

Positive photoresist composition

Negative resist composition

Positive resist composition

POSITIVE RESIST COMPOSITION