Claims
- 1. A positive working photosensitive composition which comprises:
- (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution;
- (b) a compound which generates an acid upon irradiation with active light or radiation;
- (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and
- (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more;
- wherein said resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more is selected from the group consisting of:
- (i) a copolymer prepared from a monomer having a basic group and a monomer having an alkali-soluble group;
- (ii) a copolymer prepared by polycondensation of an aromatic compound containing a basic group with an aldehyde or a ketone group; and
- (iii) a copolymer prepared by polycondensation of a phenolic compound with an aldehyde containing a basic group.
- 2. The positive working photosensitive composition of claim 1, wherein said component (c) is at least one compound selected from the group consisting of:
- (i) a compound having at least two acid-decomposable groups, wherein the two acid-decomposable groups exist at a distance of at least 10 bonding atoms excluding the acid-decomposable groups themselves; and
- (ii) a compound having at least three acid-decomposable groups, wherein the farthest two acid-decomposable groups among the at three acid-decomposable groups exist at a distance of at least 9 bonding atoms excluding the acid-decomposable groups themselves.
- 3. The positive working photosensitive composition of claim 2, wherein the molar ratio of said component (b) to basic nitrogen atom in said component (d) is from 1/2 to 100/1.
- 4. The positive working photosensitive composition of claim 1, wherein the molar ratio of said component (b) to basic nitrogen atom in said component (d) is from 1/2 to 100/1.
- 5. A positive-working photosensitive composition, comprising:
- (1) a compound which generates an acid upon irradiation with active light or radiation;
- (2) a resin containing a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and
- (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more;
- wherein said resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more is selected from the group consisting of:
- (i) a copolymer prepared from a monomer having a basic group and a monomer having an alkali-soluble group;
- (ii) a copolymer prepared by polycondensation of an aromatic compound containing a basic group with an aldehyde or a ketone group; and
- (iii) a copolymer prepared by polycondensation of a phenolic compound with an aldehyde containing a basic group.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-252351 |
Oct 1994 |
JPX |
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Parent Case Info
This is a File Wrapper Continuation-in-Part Application of application Ser. No. 08/525,157, filed Sep. 8, 1995 now abandoned.
Foreign Referenced Citations (6)
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Country |
0541112 |
May 1993 |
EPX |
06119998 |
Aug 1994 |
EPX |
4 75062 |
Mar 1992 |
JPX |
6273924 |
Sep 1994 |
JPX |
7128859 |
May 1995 |
JPX |
94 01805 |
Jan 1994 |
WOX |
Non-Patent Literature Citations (1)
Entry |
Patent Abstracts of Japan, Abstract of JP-A 63 149 640. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
525157 |
Sep 1995 |
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