Keechan Kim

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lower plasma-exclusion-zone rings for a bevel etcher
- Patent number 10,832,923
- Issue date Nov 10, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper plasma-exclusion-zone rings for a bevel etcher
- Patent number 10,811,282
- Issue date Oct 20, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 10,748,747
- Issue date Aug 18, 2020
- Lam Research Corporation
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of bevel etch film profile using plasma exclusion zone ring...
- Patent number 10,629,458
- Issue date Apr 21, 2020
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 9,799,496
- Issue date Oct 24, 2017
- Lam Research Corporation
- Keechan Kim
- B08 - CLEANING
Information Patent Grant
Edge exclusion control with adjustable plasma exclusion zone ring
- Patent number 9,184,030
- Issue date Nov 10, 2015
- Lam Research Corporation
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting plasma unconfinement
- Patent number 8,852,384
- Issue date Oct 7, 2014
- Lam Research Corporation
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Grant
Control of bevel etch film profile using plasma exclusion zone ring...
- Patent number 8,398,778
- Issue date Mar 19, 2013
- Lam Research Corporation
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for detecting plasma unconfinement
- Patent number 8,257,503
- Issue date Sep 4, 2012
- Lam Research Corporation
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Grant
Bevel clean device
- Patent number 8,137,501
- Issue date Mar 20, 2012
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER
- Publication number 20210351018
- Publication date Nov 11, 2021
- LAM RESEARCH CORPORATION
- Keechan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Edge Exclusion Control With Adjustable Plasma Exclusion Zone Ring
- Publication number 20180025893
- Publication date Jan 25, 2018
- LAM RESEARCH CORPORATION
- Keechan Kim
- B08 - CLEANING
Information Patent Application
LOWER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER
- Publication number 20170301566
- Publication date Oct 19, 2017
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER
- Publication number 20170301565
- Publication date Oct 19, 2017
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...
- Publication number 20170256393
- Publication date Sep 7, 2017
- LAM RESEARCH CORPORATION
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE EXCLUSION CONTROL WITH ADJUSTABLE PLASMA EXCLUSION ZONE RING
- Publication number 20160042927
- Publication date Feb 11, 2016
- LAM RESEARCH CORPORATION
- Keechan Kim
- B08 - CLEANING
Information Patent Application
Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...
- Publication number 20150020848
- Publication date Jan 22, 2015
- LAM RESEARCH CORPORATION
- Keechan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE EXCLUSION CONTROL WITH ADJUSTABLE PLASMA EXCLUSION ZONE RING
- Publication number 20140020708
- Publication date Jan 23, 2014
- LAM RESEARCH CORPORATION
- Keechan Kim
- B08 - CLEANING
Information Patent Application
CONTROL OF BEVEL ETCH FILM PROFILE USING PLASMA EXCLUSION ZONE RING...
- Publication number 20130264015
- Publication date Oct 10, 2013
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Detecting Plasma Unconfinement
- Publication number 20120305189
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DETECTING PLASMA UNCONFINEMENT
- Publication number 20090272402
- Publication date Nov 5, 2009
- KeeChan Kim
- G01 - MEASURING TESTING
Information Patent Application
Control of bevel etch film profile using plasma exclusion zone ring...
- Publication number 20080227301
- Publication date Sep 18, 2008
- LAM RESEARCH CORPORATION
- Tong Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEVEL CLEAN DEVICE
- Publication number 20080190448
- Publication date Aug 14, 2008
- Lam Research Corporation
- Yunsang Kim
- H01 - BASIC ELECTRIC ELEMENTS

Keechan Kim

Person

Patents Grantslast 30 patents

Lower plasma-exclusion-zone rings for a bevel etcher

Upper plasma-exclusion-zone rings for a bevel etcher

Edge exclusion control with adjustable plasma exclusion zone ring

Control of bevel etch film profile using plasma exclusion zone ring...

Edge exclusion control with adjustable plasma exclusion zone ring

Edge exclusion control with adjustable plasma exclusion zone ring

Method and apparatus for detecting plasma unconfinement

Control of bevel etch film profile using plasma exclusion zone ring...

Method and apparatus for detecting plasma unconfinement

Bevel clean device

Patents Applicationslast 30 patents

LOWER PLASMA EXCLUSION ZONE RING FOR BEVEL ETCHER

Edge Exclusion Control With Adjustable Plasma Exclusion Zone Ring

LOWER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER

UPPER PLASMA-EXCLUSION-ZONE RINGS FOR A BEVEL ETCHER

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...

EDGE EXCLUSION CONTROL WITH ADJUSTABLE PLASMA EXCLUSION ZONE RING

Systems and Methods for In-Situ Wafer Edge and Backside Plasma Clea...

EDGE EXCLUSION CONTROL WITH ADJUSTABLE PLASMA EXCLUSION ZONE RING

CONTROL OF BEVEL ETCH FILM PROFILE USING PLASMA EXCLUSION ZONE RING...

Method and Apparatus for Detecting Plasma Unconfinement

METHOD AND APPARATUS FOR DETECTING PLASMA UNCONFINEMENT

Control of bevel etch film profile using plasma exclusion zone ring...

BEVEL CLEAN DEVICE