Kehan Tian

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor fabrication design rule loophole checking for design...
- Patent number 11,036,126
- Issue date Jun 15, 2021
- International Business Machines Corporation
- Chieh-Yu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor fabrication design rule loophole checking for design...
- Patent number 10,585,346
- Issue date Mar 10, 2020
- International Business Machines Corporation
- Chieh-Yu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor fabrication design rule loophole checking for design...
- Patent number 10,394,116
- Issue date Aug 27, 2019
- International Business Machines Corporation
- Chieh-Yu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and program product for designing source and mask for lithog...
- Patent number 9,857,676
- Issue date Jan 2, 2018
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dummy gate structure for electrical isolation of a fin DRAM
- Patent number 9,741,722
- Issue date Aug 22, 2017
- International Business Machines Corporation
- John E. Barth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source, target and mask optimization by incorporating contour based...
- Patent number 9,651,856
- Issue date May 16, 2017
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dummy gate structure for electrical isolation of a fin DRAM
- Patent number 9,564,445
- Issue date Feb 7, 2017
- International Business Machines Corporation
- John E. Barth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synthesizing low mask error enhancement factor lithography solutions
- Patent number 9,395,622
- Issue date Jul 19, 2016
- GLOBALFOUNDRIES Inc.
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source, target and mask optimization by incorporating countour base...
- Patent number 9,250,535
- Issue date Feb 2, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High density field effect transistor design including a broken gate...
- Patent number 9,117,051
- Issue date Aug 25, 2015
- International Business Machines Corporation
- Chieh-yu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask design method, program, and mask design system
- Patent number 8,959,462
- Issue date Feb 17, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source-mask optimization for a lithography process
- Patent number 8,954,898
- Issue date Feb 10, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Analyzing a patterning process using a model of yield
- Patent number 8,880,382
- Issue date Nov 4, 2014
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing lithographic mask for manufacturability in efficient manner
- Patent number 8,719,735
- Issue date May 6, 2014
- International Business Machines Corporation
- Masaharu Sakamoto
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Analyzing a patterning process using a model of yield
- Patent number 8,682,634
- Issue date Mar 25, 2014
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Constrained optimization of lithographic source intensities under c...
- Patent number 8,605,254
- Issue date Dec 10, 2013
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for projection lithography with immersed image-al...
- Patent number 8,537,444
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Dario Gil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining manufacturability of lithographic mask based on manufac...
- Patent number 8,539,390
- Issue date Sep 17, 2013
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for generating a plurality of optimized wavefronts for a mul...
- Patent number 8,495,528
- Issue date Jul 23, 2013
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront engineering of mask data for semiconductor device design
- Patent number 8,453,076
- Issue date May 28, 2013
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fracturing continuous photolithography masks
- Patent number 8,448,098
- Issue date May 21, 2013
- International Business Machines Corporation
- Ying Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing source and mask to control line width roughne...
- Patent number 8,372,565
- Issue date Feb 12, 2013
- International Business Machines Corporation
- Kehan Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to match exposure tools using a programmable illuminator
- Patent number 8,351,037
- Issue date Jan 8, 2013
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fracturing continuous photolithography masks
- Patent number 8,266,556
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Ying Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic provisional decomposition of lithographic patterns having d...
- Patent number 8,266,554
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fast estimation of lithographic binding patterns in an i...
- Patent number 8,234,603
- Issue date Jul 31, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calculating image intensity of mask by decomposing Manhattan polygo...
- Patent number 8,059,885
- Issue date Nov 15, 2011
- International Business Machines Corporation
- Jaione Tirapu-Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining manufacturability of lithographic mask by reducing targ...
- Patent number 8,056,023
- Issue date Nov 8, 2011
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining manufacturability of lithographic mask by selecting tar...
- Patent number 8,056,026
- Issue date Nov 8, 2011
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining manufacturability of lithographic mask using continuous...
- Patent number 8,028,254
- Issue date Sep 27, 2011
- International Business Machines Corporation
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...
- Publication number 20190294039
- Publication date Sep 26, 2019
- CHIEH-YU LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...
- Publication number 20190072845
- Publication date Mar 7, 2019
- International Business Machines Corporation
- CHIEH-YU LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...
- Publication number 20190072846
- Publication date Mar 7, 2019
- International Business Machines Corporation
- CHIEH-YU LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING CONTOUR BASED...
- Publication number 20160109795
- Publication date Apr 21, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND PROGRAM PRODUCT FOR DESIGNING SOURCE AND MASK FOR LITHOG...
- Publication number 20160103389
- Publication date Apr 14, 2016
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DUMMY GATE STRUCTURE FOR ELECTRICAL ISOLATION OF A FIN DRAM
- Publication number 20160027789
- Publication date Jan 28, 2016
- International Business Machines Corporation
- John E. Barth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNTHESIZING LOW MASK ERROR ENHANCEMENT FACTOR LITHOGRAPHY SOLUTIONS
- Publication number 20150234970
- Publication date Aug 20, 2015
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DUMMY GATE STRUCTURE FOR ELECTRICAL ISOLATION OF A FIN DRAM
- Publication number 20150206885
- Publication date Jul 23, 2015
- International Business Machines Corporation
- John E. Barth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY FIELD EFFECT TRANSISTOR DESIGN INCLUDING A BROKEN GATE...
- Publication number 20150111367
- Publication date Apr 23, 2015
- Samsung Electronics Co., Ltd.
- Chieh-yu Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASE...
- Publication number 20140268075
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE-MASK OPTIMIZATION FOR A LITHOGRAPHY PROCESS
- Publication number 20140282291
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK DESIGN METHOD, PROGRAM, AND MASK DESIGN SYSTEM
- Publication number 20130263063
- Publication date Oct 3, 2013
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Analyzing A Patterning Process Using A Model Of Yield
- Publication number 20130185046
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Saeed BAGHERI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD
- Publication number 20130185045
- Publication date Jul 18, 2013
- International Business Machines Corporation
- Saeed BAGHERI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-AL...
- Publication number 20130071774
- Publication date Mar 21, 2013
- International Business Machines Corporation
- Dario Gil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimizing lithographic mask for manufacturability in efficient manner
- Publication number 20130019211
- Publication date Jan 17, 2013
- Masaharu Sakamoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS
- Publication number 20120210281
- Publication date Aug 16, 2012
- International Business Machines Corporation
- YING LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining manufacturability of lithographic mask based on manufac...
- Publication number 20120196210
- Publication date Aug 2, 2012
- Tadanobu Inoue
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MUL...
- Publication number 20120077130
- Publication date Mar 29, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNE...
- Publication number 20120052418
- Publication date Mar 1, 2012
- International Business Machines Corporation
- Kehan Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC PROVISIONAL DECOMPOSITION OF LITHOGRAPHIC PATTERNS HAVING D...
- Publication number 20120047471
- Publication date Feb 23, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS
- Publication number 20120036487
- Publication date Feb 9, 2012
- International Business Machines Corporation
- YING LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FAST ESTIMATION OF LITHOGRAPHIC BINDING PATTERNS IN AN I...
- Publication number 20120017194
- Publication date Jan 19, 2012
- International Business Machines Corporation
- Saeed Bagheri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO MATCH EXPOSURE TOOLS USING A PROGRAMMABLE ILLUMINATOR
- Publication number 20120008134
- Publication date Jan 12, 2012
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wavefront engineering of mask data for semiconductor device design
- Publication number 20110231803
- Publication date Sep 22, 2011
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Constrained Optimization Of Lithographic Source Intensities Under C...
- Publication number 20110096313
- Publication date Apr 28, 2011
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Contrast Lithographic Masks
- Publication number 20100283982
- Publication date Nov 11, 2010
- International Business Machines Corporation
- Saeed Bagheri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK USING CONTINUOUS...
- Publication number 20100153903
- Publication date Jun 17, 2010
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK BY SELECTING TAR...
- Publication number 20100153902
- Publication date Jun 17, 2010
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining manufacturability of lithographic mask by reducing targ...
- Publication number 20100153901
- Publication date Jun 17, 2010
- Tadanobu Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Semiconductor fabrication design rule loophole checking for design...

Semiconductor fabrication design rule loophole checking for design...

Semiconductor fabrication design rule loophole checking for design...

Method and program product for designing source and mask for lithog...

Dummy gate structure for electrical isolation of a fin DRAM

Source, target and mask optimization by incorporating contour based...

Dummy gate structure for electrical isolation of a fin DRAM

Synthesizing low mask error enhancement factor lithography solutions

Source, target and mask optimization by incorporating countour base...

High density field effect transistor design including a broken gate...

Mask design method, program, and mask design system

Source-mask optimization for a lithography process

Analyzing a patterning process using a model of yield

Optimizing lithographic mask for manufacturability in efficient manner

Analyzing a patterning process using a model of yield

Constrained optimization of lithographic source intensities under c...

System and method for projection lithography with immersed image-al...

Determining manufacturability of lithographic mask based on manufac...

Method for generating a plurality of optimized wavefronts for a mul...

Wavefront engineering of mask data for semiconductor device design

Fracturing continuous photolithography masks

Method for optimizing source and mask to control line width roughne...

Method to match exposure tools using a programmable illuminator

Fracturing continuous photolithography masks

Dynamic provisional decomposition of lithographic patterns having d...

Method for fast estimation of lithographic binding patterns in an i...

Calculating image intensity of mask by decomposing Manhattan polygo...

Determining manufacturability of lithographic mask by reducing targ...

Determining manufacturability of lithographic mask by selecting tar...

Determining manufacturability of lithographic mask using continuous...

Patents Applicationslast 30 patents

SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...

SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...

SEMICONDUCTOR FABRICATION DESIGN RULE LOOPHOLE CHECKING FOR DESIGN...

SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING CONTOUR BASED...

METHOD AND PROGRAM PRODUCT FOR DESIGNING SOURCE AND MASK FOR LITHOG...

DUMMY GATE STRUCTURE FOR ELECTRICAL ISOLATION OF A FIN DRAM

SYNTHESIZING LOW MASK ERROR ENHANCEMENT FACTOR LITHOGRAPHY SOLUTIONS

DUMMY GATE STRUCTURE FOR ELECTRICAL ISOLATION OF A FIN DRAM

HIGH DENSITY FIELD EFFECT TRANSISTOR DESIGN INCLUDING A BROKEN GATE...

SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASE...

SOURCE-MASK OPTIMIZATION FOR A LITHOGRAPHY PROCESS

MASK DESIGN METHOD, PROGRAM, AND MASK DESIGN SYSTEM

Analyzing A Patterning Process Using A Model Of Yield

ANALYZING A PATTERNING PROCESS USING A MODEL OF YIELD

SYSTEM AND METHOD FOR PROJECTION LITHOGRAPHY WITH IMMERSED IMAGE-AL...

Optimizing lithographic mask for manufacturability in efficient manner

FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS

Determining manufacturability of lithographic mask based on manufac...

METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MUL...

METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNE...

DYNAMIC PROVISIONAL DECOMPOSITION OF LITHOGRAPHIC PATTERNS HAVING D...

FRACTURING CONTINUOUS PHOTOLITHOGRAPHY MASKS

METHOD FOR FAST ESTIMATION OF LITHOGRAPHIC BINDING PATTERNS IN AN I...

METHOD TO MATCH EXPOSURE TOOLS USING A PROGRAMMABLE ILLUMINATOR

Wavefront engineering of mask data for semiconductor device design

Constrained Optimization Of Lithographic Source Intensities Under C...

High Contrast Lithographic Masks

DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK USING CONTINUOUS...

DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK BY SELECTING TAR...

Determining manufacturability of lithographic mask by reducing targ...