Kei YAMAMOTO

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,288
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Masafumi Kojima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 10,962,884
- Issue date Mar 30, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
- Patent number 10,852,637
- Issue date Dec 1, 2020
- FUJIFILM Corporation
- Naoki Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,761,426
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,663,864
- Issue date May 26, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, resist pattern, and process for producing e...
- Patent number 10,578,968
- Issue date Mar 3, 2020
- FUJIFILM Corporation
- Kei Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, ac...
- Patent number 10,261,417
- Issue date Apr 16, 2019
- FUJIFILM Corporation
- Akiyoshi Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, composition for forming protective film, me...
- Patent number 10,175,578
- Issue date Jan 8, 2019
- Fujifilm Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, resist pattern, and method for manufacturin...
- Patent number 10,114,292
- Issue date Oct 30, 2018
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, and, electronic device producing method and...
- Patent number 9,885,956
- Issue date Feb 6, 2018
- FUJIFILM Corporation
- Tsukasa Yamanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 9,841,679
- Issue date Dec 12, 2017
- FUJIFILM Corporation
- Masafumi Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern, actinic-ray- or radiation-sensitive resi...
- Patent number 9,551,931
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Junichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, composition used therein, method for manufa...
- Patent number 9,429,840
- Issue date Aug 30, 2016
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,383,645
- Issue date Jul 5, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,244,344
- Issue date Jan 26, 2016
- FUJIFILM Corporation
- Kosuke Koshijima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,235,117
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Junichi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,213,237
- Issue date Dec 15, 2015
- FUJIFILM Corporation
- Junichi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 9,012,123
- Issue date Apr 21, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 8,975,002
- Issue date Mar 10, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 8,951,890
- Issue date Feb 10, 2015
- FUJIFILM Corporation
- Kei Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,790,860
- Issue date Jul 29, 2014
- FUJIFILM Corporation
- Kosuke Koshijima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 8,541,159
- Issue date Sep 24, 2013
- FUJIFILM Corporation
- Kei Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 8,080,361
- Issue date Dec 20, 2011
- FUJIFILM Corporation
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,771,912
- Issue date Aug 10, 2010
- FUJIFILM Corporation
- Kei Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,674,567
- Issue date Mar 9, 2010
- FUJIFILM Corporation
- Kei Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,632,623
- Issue date Dec 15, 2009
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280915
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280362
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Naohiro TANGO
- G01 - MEASURING TESTING
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20240248397
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240231235
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR INSPECTING RESIST COMPOSITION, METHOD FOR PRODUCING RESI...
- Publication number 20240201599
- Publication date Jun 20, 2024
- FUJIFILM CORPORATION
- Michihiro Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPP...
- Publication number 20230221644
- Publication date Jul 13, 2023
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230161249
- Publication date May 25, 2023
- FUJIFILM CORPORATION
- Minoru Uemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...
- Publication number 20220283499
- Publication date Sep 8, 2022
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20220107561
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Keiyu OU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210364917
- Publication date Nov 25, 2021
- FUJIFILM CORPORATION
- Minoru UEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210356862
- Publication date Nov 18, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210318616
- Publication date Oct 14, 2021
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210294217
- Publication date Sep 23, 2021
- FUJIFILM CORPORATION
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
- Publication number 20210286263
- Publication date Sep 16, 2021
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210088905
- Publication date Mar 25, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING THE SAME, RE...
- Publication number 20210011378
- Publication date Jan 14, 2021
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217503
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217499
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Shuji HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180181003
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180180996
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20180081277
- Publication date Mar 22, 2018
- FUJIFILM CORPORATION
- Naoki INOUE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170349686
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD US...
- Publication number 20170351179
- Publication date Dec 7, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD
- Publication number 20170285482
- Publication date Oct 5, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...
- Publication number 20170199460
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Naohiro TANGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING E...
- Publication number 20170199461
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...
- Publication number 20170184974
- Publication date Jun 29, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, R...
- Publication number 20170184970
- Publication date Jun 29, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, ME...
- Publication number 20170176862
- Publication date Jun 22, 2017
- FUJIFILM CORPORATION
- Naoki INOUE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Kei YAMAMOTO

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing el...

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, resist pattern, and process for producing e...

Active-light-sensitive or radiation-sensitive resin composition, ac...

Pattern forming method, composition for forming protective film, me...

Pattern forming method, resist pattern, and method for manufacturin...

Pattern forming method, and, electronic device producing method and...

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Method of forming pattern, actinic-ray- or radiation-sensitive resi...

Pattern forming method, composition used therein, method for manufa...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Positive photosensitive composition and method of forming pattern u...

Positive resist composition and pattern forming method using the same

Positive resist composition for immersion exposure and pattern form...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Positive resist composition for immersion exposure and pattern form...

Positive photosensitive composition and method of forming pattern u...

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern formation method using the...

Patents Applicationslast 30 patents

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

METHOD FOR INSPECTING RESIST COMPOSITION, METHOD FOR PRODUCING RESI...

METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPP...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...

TREATMENT LIQUID AND PATTERN FORMING METHOD

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING THE SAME, RE...

TREATMENT LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD US...

ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...

PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING E...

PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURIN...

PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, R...

PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, ME...