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Plasma processing apparatus
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Issue date Jul 5, 2011
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Applied Materials, Inc.
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Hiroji Hanawa
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H01 - BASIC ELECTRIC ELEMENTS
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Etchant for silicon oxide and method
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Patent number 6,461,533
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Issue date Oct 8, 2002
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Applied Materials Inc.
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Yasuhiro Horiike
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C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Plasma process apparatus
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Patent number 5,717,294
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Issue date Feb 10, 1998
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Kabushiki Kaisha Toshiba
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Itsuko Sakai
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H01 - BASIC ELECTRIC ELEMENTS
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Filter manufacturing apparatus
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Patent number 5,707,501
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Issue date Jan 13, 1998
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Kabushiki Kaisha Toshiba
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Soichi Inoue
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Focused ion beam deposition using TMCTS
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Patent number 5,639,699
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Issue date Jun 17, 1997
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Kabushiki Kaisha Toshiba
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Hiroko Nakamura
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Projectin exposure apparatus
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Patent number 5,627,626
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Issue date May 6, 1997
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Kabushiki Kaisha Toshiba
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Soichi Inoue
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Projection exposure apparatus
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Patent number 5,621,498
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Issue date Apr 15, 1997
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Kabushiki Kaisha Toshiba
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Soichi Inoue
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of processing a magnetic thin film
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Patent number 5,607,599
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Issue date Mar 4, 1997
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Kabushiki Kaisha Toshiba
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Katsutaro Ichihara
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Plasma processing apparatus
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Patent number 5,474,643
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Issue date Dec 12, 1995
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Tokyo Electron Limited
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Junichi Arami
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H01 - BASIC ELECTRIC ELEMENTS