Keisuke Nakazawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Spin coating method and manufacturing method of electronic component
- Patent number 9,793,111
- Issue date Oct 17, 2017
- TOSHIBA MEMORY CORPORATION
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device including air gap betw...
- Patent number 9,437,476
- Issue date Sep 6, 2016
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making openings in a semiconductor device with reduced re...
- Patent number 9,431,291
- Issue date Aug 30, 2016
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin coating apparatus and method
- Patent number 9,278,373
- Issue date Mar 8, 2016
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Manufacturing method of semiconductor device and manufacturing appa...
- Patent number 8,975,196
- Issue date Mar 10, 2015
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,835,279
- Issue date Sep 16, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 8,659,114
- Issue date Feb 25, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin coating method and spin coating apparatus
- Patent number 8,652,571
- Issue date Feb 18, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 8,642,409
- Issue date Feb 4, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,629,035
- Issue date Jan 14, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 8,592,939
- Issue date Nov 26, 2013
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and NAND-type flash m...
- Patent number 8,329,553
- Issue date Dec 11, 2012
- Kabushiki Kaisha Toshiba
- Shogo Matsuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and silicon oxide film fo...
- Patent number 8,080,463
- Issue date Dec 20, 2011
- Kabushiki Kaisha Toshiba
- Kazuaki Iwasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,781,341
- Issue date Aug 24, 2010
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device containing a PbxSr(1...
- Patent number 7,531,408
- Issue date May 12, 2009
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilazane perhydride solution and method of manufacturing a semi...
- Patent number 7,407,864
- Issue date Aug 5, 2008
- Kabushiki Kaisha Toshiba
- Atsuko Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,378,329
- Issue date May 27, 2008
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for heat treating thin film
- Patent number 7,259,094
- Issue date Aug 21, 2007
- Kabushiki Kaisha Toshiba
- Katsuaki Natori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device contains a PbxSr(1−x)[Zr, Ti]xRu(1−x)O3 film i...
- Patent number 7,233,040
- Issue date Jun 19, 2007
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing thereof
- Patent number 7,183,601
- Issue date Feb 27, 2007
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,105,400
- Issue date Sep 12, 2006
- Kabushiki Kaisha Toshiba
- Keitaro Imai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SPIN COATING METHOD AND MANUFACTURING METHOD OF ELECTRONIC COMPONENT
- Publication number 20170076941
- Publication date Mar 16, 2017
- Kabushiki Kaisha Toshiba
- Keisuke NAKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160276291
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Keisuke NAKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN COATING APPARATUS AND METHOD
- Publication number 20160158795
- Publication date Jun 9, 2016
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20160064272
- Publication date Mar 3, 2016
- Kabushiki Kaisha Toshiba
- Keisuke NAKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
- Publication number 20150263114
- Publication date Sep 17, 2015
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING APPA...
- Publication number 20140213038
- Publication date Jul 31, 2014
- Kabushiki Kaisha Toshiba
- Keisuke NAKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN COATING METHOD AND SPIN COATING APPARATUS
- Publication number 20140137796
- Publication date May 22, 2014
- Kabushiki Kaisha Toshiba
- Keisuke Nakazawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SPIN COATING APPARATUS AND METHOD
- Publication number 20140072709
- Publication date Mar 13, 2014
- Kabushiki Kaisha Toshiba
- Keisuke NAKAZAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130115766
- Publication date May 9, 2013
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130102124
- Publication date Apr 25, 2013
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20130043563
- Publication date Feb 21, 2013
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120286346
- Publication date Nov 15, 2012
- Keisuke NAKAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20120193596
- Publication date Aug 2, 2012
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACATURING METHOD AND SILICON OXIDE FILM F...
- Publication number 20120034754
- Publication date Feb 9, 2012
- Kabushiki Kaisha Toshiba
- Kazuaki Iwasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND NAND-TYPE FLASH M...
- Publication number 20100311220
- Publication date Dec 9, 2010
- Shogo MATSUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SILICON OXIDE FILM FO...
- Publication number 20100190317
- Publication date Jul 29, 2010
- Kazuaki IWASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN COATING METHOD AND SPIN COATING APPARATUS
- Publication number 20090226615
- Publication date Sep 10, 2009
- Keisuke Nakazawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYSILAZANE PERHYDRIDE SOLUTION AND METHOD OF MANUFACTURING A SEMI...
- Publication number 20090036629
- Publication date Feb 5, 2009
- Kabushiki Kaisha Toshiba
- Atsuko Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for handling polysilazane or polysilazane solution, polysila...
- Publication number 20080090988
- Publication date Apr 17, 2008
- Keisuke Nakazawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20070231948
- Publication date Oct 4, 2007
- KABUSHHIKI KAISHA TOSHIBA
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070212894
- Publication date Sep 13, 2007
- Keisuke Nakazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Polysilazane perhydride solution and method of manufacturing a semi...
- Publication number 20060205165
- Publication date Sep 14, 2006
- Atsuko Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20050277208
- Publication date Dec 15, 2005
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing thereof
- Publication number 20050224851
- Publication date Oct 13, 2005
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, apparatus and method for manufacturing the same
- Publication number 20050186767
- Publication date Aug 25, 2005
- Katsuaki Natori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050093042
- Publication date May 5, 2005
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20050070031
- Publication date Mar 31, 2005
- Keitaro Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20050070043
- Publication date Mar 31, 2005
- Koji Yamakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050051823
- Publication date Mar 10, 2005
- Keisuke Nakazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, apparatus and method for manufacturing the same
- Publication number 20040155278
- Publication date Aug 12, 2004
- Katsuaki Natori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Keisuke Nakazawa

Person

Patents Grantslast 30 patents

Spin coating method and manufacturing method of electronic component

Method of manufacturing semiconductor device including air gap betw...

Method of making openings in a semiconductor device with reduced re...

Spin coating apparatus and method

Manufacturing method of semiconductor device and manufacturing appa...

Method of manufacturing semiconductor device

Semiconductor device

Spin coating method and spin coating apparatus

Semiconductor device and method of manufacturing the same

Method of manufacturing semiconductor device

Semiconductor device and manufacturing method thereof

Method for manufacturing semiconductor device and NAND-type flash m...

Semiconductor device manufacturing method and silicon oxide film fo...

Method of manufacturing semiconductor device

Method of manufacturing a semiconductor device containing a PbxSr(1...

Polysilazane perhydride solution and method of manufacturing a semi...

Method for manufacturing semiconductor device

Apparatus and method for heat treating thin film

Semiconductor device contains a PbxSr(1−x)[Zr, Ti]xRu(1−x)O3 film i...

Semiconductor device and method for manufacturing thereof

Manufacturing method of semiconductor device

Patents Applicationslast 30 patents

SPIN COATING METHOD AND MANUFACTURING METHOD OF ELECTRONIC COMPONENT

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SPIN COATING APPARATUS AND METHOD

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING APPA...

SPIN COATING METHOD AND SPIN COATING APPARATUS

SPIN COATING APPARATUS AND METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE MANUFACATURING METHOD AND SILICON OXIDE FILM F...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND NAND-TYPE FLASH M...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SILICON OXIDE FILM FO...

SPIN COATING METHOD AND SPIN COATING APPARATUS

POLYSILAZANE PERHYDRIDE SOLUTION AND METHOD OF MANUFACTURING A SEMI...

Method for handling polysilazane or polysilazane solution, polysila...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Method of manufacturing semiconductor device

Polysilazane perhydride solution and method of manufacturing a semi...

Method for manufacturing semiconductor device

Semiconductor device and method for manufacturing thereof

Semiconductor device, apparatus and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Manufacturing method of semiconductor device

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device, apparatus and method for manufacturing the same