Keisuke Namiki

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film-thickness measuring method, method of detecting notch portion,...
- Patent number 12,183,642
- Issue date Dec 31, 2024
- Ebara Corporation
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 12,068,189
- Issue date Aug 20, 2024
- Ebara Corporation
- Satoru Yamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,969,858
- Issue date Apr 30, 2024
- Ebara Corporation
- Keisuke Namiki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,958,163
- Issue date Apr 16, 2024
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and method of controlling inclination of statio...
- Patent number 11,745,306
- Issue date Sep 5, 2023
- Ebara Corporation
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,731,235
- Issue date Aug 22, 2023
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,179,823
- Issue date Nov 23, 2021
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 11,088,011
- Issue date Aug 10, 2021
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D918161
- Issue date May 4, 2021
- Ebara Corporation
- Shingo Togashi
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D913977
- Issue date Mar 23, 2021
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus
- Patent number 10,702,972
- Issue date Jul 7, 2020
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing method, top ring, and substrate polishing appar...
- Patent number 10,464,185
- Issue date Nov 5, 2019
- Ebara Corporation
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 10,442,056
- Issue date Oct 15, 2019
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D859332
- Issue date Sep 10, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus, control method and recording medium
- Patent number 10,391,603
- Issue date Aug 27, 2019
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 10,213,896
- Issue date Feb 26, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D839224
- Issue date Jan 29, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing device and polishing method
- Patent number 9,999,956
- Issue date Jun 19, 2018
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D813180
- Issue date Mar 20, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D808349
- Issue date Jan 23, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holder, polishing apparatus, polishing method, and retain...
- Patent number 9,815,171
- Issue date Nov 14, 2017
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate retaining ring
- Patent number D799437
- Issue date Oct 10, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Retainer ring for substrate
- Patent number D794585
- Issue date Aug 15, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate retaining ring
- Patent number D793976
- Issue date Aug 8, 2017
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing method and polishing apparatus
- Patent number 9,676,076
- Issue date Jun 13, 2017
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holder, polishing apparatus, and polishing method
- Patent number 9,662,764
- Issue date May 30, 2017
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 9,573,241
- Issue date Feb 21, 2017
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 9,573,244
- Issue date Feb 21, 2017
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D770990
- Issue date Nov 8, 2016
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE...
- Publication number 20250018532
- Publication date Jan 16, 2025
- EBARA CORPORATION
- Keisuke NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20240189959
- Publication date Jun 13, 2024
- EBARA CORPORATION
- Keisuke NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
FILM-THICKNESS MEASURING METHOD, METHOD OF DETECTING NOTCH PORTION,...
- Publication number 20220344221
- Publication date Oct 27, 2022
- EBARA CORPORATION
- Osamu NABEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING RECIPE DETERMINATION DEVICE
- Publication number 20220168864
- Publication date Jun 2, 2022
- EBARA CORPORATION
- Yoshikazu Kato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGR...
- Publication number 20220093409
- Publication date Mar 24, 2022
- EBARA CORPORATION
- Keisuke Namiki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20220048157
- Publication date Feb 17, 2022
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20210335650
- Publication date Oct 28, 2021
- EBARA CORPORATION
- Satoru YAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING
- Publication number 20210138606
- Publication date May 13, 2021
- EBARA CORPORATION
- Keisuke NAMIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS
- Publication number 20200361056
- Publication date Nov 19, 2020
- EBARA CORPORATION
- Makoto Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200206867
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...
- Publication number 20200206868
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200023487
- Publication date Jan 23, 2020
- EBARA CORPORATION
- Keisuke Namiki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20180301367
- Publication date Oct 18, 2018
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20180117730
- Publication date May 3, 2018
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...
- Publication number 20170266779
- Publication date Sep 21, 2017
- EBARA CORPORATION
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM
- Publication number 20170173756
- Publication date Jun 22, 2017
- EBARA CORPORATION
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20170144267
- Publication date May 25, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...
- Publication number 20160243670
- Publication date Aug 25, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20160074989
- Publication date Mar 17, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING DEVICE AND POLISHING METHOD
- Publication number 20150273650
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20150273657
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...
- Publication number 20150133038
- Publication date May 14, 2015
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20140370794
- Publication date Dec 18, 2014
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS AND POLISHING APPARATUS
- Publication number 20140004779
- Publication date Jan 2, 2014
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING METHOD AND POLISHING APPARATUS
- Publication number 20130337722
- Publication date Dec 19, 2013
- KEISUKE NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20130324012
- Publication date Dec 5, 2013
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20130196573
- Publication date Aug 1, 2013
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE
- Publication number 20130136884
- Publication date May 30, 2013
- EBARA CORPORATION
- Hozumi YASUDA
- B32 - LAYERED PRODUCTS
Information Patent Application
Method and apparatus for dressing polishing pad, profile measuring...
- Publication number 20090137190
- Publication date May 28, 2009
- EBARA CORPORATION
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Plating method
- Publication number 20090095634
- Publication date Apr 16, 2009
- Natsuki Makino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Keisuke Namiki

Person

Patents Grantslast 30 patents

Film-thickness measuring method, method of detecting notch portion,...

Polishing apparatus

Elastic membrane, substrate holding device, and polishing apparatus

Substrate processing apparatus

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Polishing apparatus and method of controlling inclination of statio...

Polishing apparatus and polishing method

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane, substrate holding device, and polishing apparatus

Elastic membrane

Elastic membrane for semiconductor wafer polishing

Polishing apparatus

Substrate polishing method, top ring, and substrate polishing appar...

Substrate holding apparatus and polishing apparatus

Elastic membrane for semiconductor wafer polishing

Polishing apparatus, control method and recording medium

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing

Polishing device and polishing method

Elastic membrane for semiconductor wafer polishing apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Substrate holder, polishing apparatus, polishing method, and retain...

Substrate retaining ring

Retainer ring for substrate

Substrate retaining ring

Polishing method and polishing apparatus

Substrate holder, polishing apparatus, and polishing method

Polishing apparatus and polishing method

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Patents Applicationslast 30 patents

SUBSTRATE HOLDING DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE...

POLISHING PAD, POLISHING APPARATUS, AND POLISHING METHOD

FILM-THICKNESS MEASURING METHOD, METHOD OF DETECTING NOTCH PORTION,...

POLISHING RECIPE DETERMINATION DEVICE

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGR...

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...

SUBSTRATE PROCESSING APPARATUS

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...

POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...

POLISHING APPARATUS AND POLISHING METHOD

POLISHING DEVICE AND POLISHING METHOD

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...

POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS AND POLISHING APPARATUS

POLISHING METHOD AND POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD

ELASTIC MEMBRANE

Method and apparatus for dressing polishing pad, profile measuring...

Plating method