Ken Lucchesi

Person

Newark, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for cleaning an edge ring pocket
- Patent number 11,935,730
- Issue date Mar 19, 2024
- Lam Research Corporation
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 11,195,706
- Issue date Dec 7, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active control of radial etch uniformity
- Patent number 10,916,409
- Issue date Feb 9, 2021
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,825,656
- Issue date Nov 3, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,615,003
- Issue date Apr 7, 2020
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi regime plasma wafer processing to increase directionality of...
- Patent number 10,304,662
- Issue date May 28, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving a pre-determined factor associate...
- Patent number 10,283,330
- Issue date May 7, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF return path
- Patent number 10,249,476
- Issue date Apr 2, 2019
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF delivery path
- Patent number 10,157,730
- Issue date Dec 18, 2018
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 10,115,568
- Issue date Oct 30, 2018
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for use within an impedance matching cir...
- Patent number 10,115,564
- Issue date Oct 30, 2018
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi regime plasma wafer processing to increase directionality of...
- Patent number 10,002,746
- Issue date Jun 19, 2018
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for controlling directionality of ions in an ed...
- Patent number 9,852,889
- Issue date Dec 26, 2017
- Lam Research Corporation
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for use within an impedance matching cir...
- Patent number 9,761,414
- Issue date Sep 12, 2017
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF delivery path
- Patent number 9,401,264
- Issue date Jul 26, 2016
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of impedance of RF return path
- Patent number 9,337,000
- Issue date May 10, 2016
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for detecting DC bias in a plasma proc...
- Patent number 8,872,525
- Issue date Oct 28, 2014
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...
- Publication number 20240404789
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD
- Publication number 20230298866
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD
- Publication number 20230223242
- Publication date Jul 13, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CLEANING AN EDGE RING POCKET
- Publication number 20220254616
- Publication date Aug 11, 2022
- LAM RESEARCH CORPORATION
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20200227238
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE CONTROL OF RADIAL ETCH UNIFORMITY
- Publication number 20190385822
- Publication date Dec 19, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...
- Publication number 20190244788
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi Regime Plasma Wafer Processing to Increase Directionality of...
- Publication number 20190080885
- Publication date Mar 14, 2019
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20190057839
- Publication date Feb 21, 2019
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Controlling Directionality Of Ions In An Ed...
- Publication number 20180082822
- Publication date Mar 22, 2018
- LAM RESEARCH CORPORATION
- Michael C. Kellogg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...
- Publication number 20180025891
- Publication date Jan 25, 2018
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR USE WITHIN AN IMPEDANCE MATCHING CIR...
- Publication number 20170372872
- Publication date Dec 28, 2017
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR USE WITHIN AN IMPEDANCE MATCHING CIR...
- Publication number 20170103870
- Publication date Apr 13, 2017
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF IMPEDANCE OF RF DELIVERY PATH
- Publication number 20160307738
- Publication date Oct 20, 2016
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Return Path
- Publication number 20160233058
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Delivery Path
- Publication number 20150091441
- Publication date Apr 2, 2015
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of Impedance of RF Return Path
- Publication number 20150091440
- Publication date Apr 2, 2015
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR DETECTING DC BIAS IN A PLASMA PROC...
- Publication number 20130127476
- Publication date May 23, 2013
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS

Ken Lucchesi

Person

Patents Grantslast 30 patents

Systems and methods for cleaning an edge ring pocket

Systems and methods for achieving a pre-determined factor associate...

Active control of radial etch uniformity

Systems and methods for controlling directionality of ions in an ed...

Systems and methods for controlling directionality of ions in an ed...

Multi regime plasma wafer processing to increase directionality of...

Systems and methods for achieving a pre-determined factor associate...

Control of impedance of RF return path

Control of impedance of RF delivery path

Systems and methods for controlling directionality of ions in an ed...

Uniformity control circuit for use within an impedance matching cir...

Multi regime plasma wafer processing to increase directionality of...

Systems and methods for controlling directionality of ions in an ed...

Uniformity control circuit for use within an impedance matching cir...

Control of impedance of RF delivery path

Control of impedance of RF return path

System, method and apparatus for detecting DC bias in a plasma proc...

Patents Applicationslast 30 patents

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...

PLASMA UNIFORMITY CONTROL USING A STATIC MAGNETIC FIELD

PLASMA UNIFORMITY CONTROL USING A PULSED MAGNETIC FIELD

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

SYSTEMS AND METHODS FOR CLEANING AN EDGE RING POCKET

Systems And Methods For Controlling Directionality Of Ions In An Ed...

ACTIVE CONTROL OF RADIAL ETCH UNIFORMITY

SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...

Multi Regime Plasma Wafer Processing to Increase Directionality of...

Systems And Methods For Controlling Directionality Of Ions In An Ed...

Systems And Methods For Controlling Directionality Of Ions In An Ed...

SYSTEMS AND METHODS FOR ACHIEVING A PRE-DETERMINED FACTOR ASSOCIATE...

UNIFORMITY CONTROL CIRCUIT FOR USE WITHIN AN IMPEDANCE MATCHING CIR...

UNIFORMITY CONTROL CIRCUIT FOR USE WITHIN AN IMPEDANCE MATCHING CIR...

CONTROL OF IMPEDANCE OF RF DELIVERY PATH

Control of Impedance of RF Return Path

Control of Impedance of RF Delivery Path

Control of Impedance of RF Return Path

SYSTEM, METHOD AND APPARATUS FOR DETECTING DC BIAS IN A PLASMA PROC...