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Ken'etsu Yokogawa

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 10,665,448
    • Issue date May 26, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 10,418,224
    • Issue date Sep 17, 2019
    • Hitachi High-Technologies Corporation
    • Naoyuki Kofuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 9,960,014
    • Issue date May 1, 2018
    • Hitachi High-Technologies Corporation
    • Naoyuki Kofuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Heat treatment apparatus
    • Patent number 9,490,104
    • Issue date Nov 8, 2016
    • Hitachi High-Technologies Corporation
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Heat treatment apparatus that performs defect repair annealing
    • Patent number 9,271,341
    • Issue date Feb 23, 2016
    • Hitachi High-Technologies Corporation
    • Ken'etsu Yokogawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Heat treatment apparatus
    • Patent number 8,809,727
    • Issue date Aug 19, 2014
    • Hitachi High-Technologies Corporation
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Heat treatment apparatus
    • Patent number 8,569,647
    • Issue date Oct 29, 2013
    • Hitachi High-Technologies Corporation
    • Masatoshi Miyake
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 8,034,181
    • Issue date Oct 11, 2011
    • Hitachi High-Technologies Corporation
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus capable of adjusting temperature of sam...
    • Patent number 7,838,792
    • Issue date Nov 23, 2010
    • Hitachi High-Technologies Corporation
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 7,771,564
    • Issue date Aug 10, 2010
    • Hitachi High-Technologies Corporation
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and a plasma processing method
    • Patent number 7,048,869
    • Issue date May 23, 2006
    • Hitachi, Ltd.
    • Kazue Takahashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing system and method for manufacturing a semiconduct...
    • Patent number 6,551,445
    • Issue date Apr 22, 2003
    • Hitachi, Ltd.
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,033,481
    • Issue date Mar 7, 2000
    • Hitachi, Ltd.
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 5,891,252
    • Issue date Apr 6, 1999
    • Hitachi, Ltd.
    • Ken'etsu Yokogawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Microwave processing equipment
    • Patent number 5,291,145
    • Issue date Mar 1, 1994
    • Hitachi, Ltd.
    • Yusuke Yajima
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20180233329
    • Publication date Aug 16, 2018
    • Hitachi High-Technologies Corporation
    • Naoyuki KOFUJI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20170084430
    • Publication date Mar 23, 2017
    • Hitachi High-Technologies Corporation
    • Naoyuki Kofuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20140305915
    • Publication date Oct 16, 2014
    • Hitachi High-Technologies Corporation
    • Masatoshi MIYAKE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA HEAT TREATMENT APPARATUS
    • Publication number 20140202995
    • Publication date Jul 24, 2014
    • Hitachi High-Technologies Corporation
    • Masatoshi MIYAKE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20140102640
    • Publication date Apr 17, 2014
    • Hitachi High-Technologies Corporation
    • Ken'etsu YOKOGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20140008352
    • Publication date Jan 9, 2014
    • Hitachi High-Technologies Corporation
    • Takashi UEMURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD AND APPARATUS FOR PLASMA HEAT TREATMENT
    • Publication number 20130277354
    • Publication date Oct 24, 2013
    • Hitachi High-Technologies Corporation
    • Masatoshi Miyake
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20130112670
    • Publication date May 9, 2013
    • Hitachi High-Technologies Corporation
    • Ken'etsu YOKOGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING APPARATUS
    • Publication number 20130087285
    • Publication date Apr 11, 2013
    • Hitachi High-Technologies Corporation
    • Naoyuki Kofuji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20120285935
    • Publication date Nov 15, 2012
    • Hitachi High-Technologies Corporation
    • Masatoshi MIYAKE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20120055915
    • Publication date Mar 8, 2012
    • Hitachi High-Technologies Corporation
    • Ken'etsu Yokogawa
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    HEAT TREATMENT APPARATUS
    • Publication number 20110284506
    • Publication date Nov 24, 2011
    • Ken'etsu YOKOGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus and a plasma processing method
    • Publication number 20090008363
    • Publication date Jan 8, 2009
    • Kazue Takahashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20080203925
    • Publication date Aug 28, 2008
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus capable of adjusting temperature of sam...
    • Publication number 20080023448
    • Publication date Jan 31, 2008
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus and a plasma processing method
    • Publication number 20060157449
    • Publication date Jul 20, 2006
    • Kazue Takahashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching apparatus and a method of manufacturing a semiconductor...
    • Publication number 20060096706
    • Publication date May 11, 2006
    • Hitachi, Ltd.
    • Naoyuki Kofuji
    • H01 - BASIC ELECTRIC ELEMENTS