Kenji Nakagawa

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
IC bonding pad combined with mark or monitor
- Patent number 6,555,922
- Issue date Apr 29, 2003
- Fujitsu Limited
- Kenji Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical exposure method
- Patent number 6,420,094
- Issue date Jul 16, 2002
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making resist patterns
- Patent number 6,127,098
- Issue date Oct 3, 2000
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,093,511
- Issue date Jul 25, 2000
- Fujitsu Limited
- Hiroyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 6,045,976
- Issue date Apr 4, 2000
- Fujitsu, Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deep UV photolithography with reduced halation
- Patent number 5,863,709
- Issue date Jan 26, 1999
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask producing method
- Patent number 5,786,115
- Issue date Jul 28, 1998
- Fujitsu Limited
- Toshiaki Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask producing method
- Patent number 5,674,646
- Issue date Oct 7, 1997
- Fujitsu Ltd.
- Toshiaki Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine pattern lithography with positive use of interference
- Patent number 5,637,424
- Issue date Jun 10, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method using mask
- Patent number 5,624,791
- Issue date Apr 29, 1997
- Fujitsu Ltd.
- Toshiaki Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,607,821
- Issue date Mar 4, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with phase-shifters and a method of fabricating the same
- Patent number 5,514,498
- Issue date May 7, 1996
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, mask producing method and pattern forming method using mask
- Patent number 5,489,509
- Issue date Feb 6, 1996
- Fujitsu, Ltd.
- Toshiaki Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern exposing method using phase shift and mask used therefor
- Patent number 5,472,813
- Issue date Dec 5, 1995
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,465,220
- Issue date Nov 7, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fine pattern lithography with positive use of interference
- Patent number 5,415,952
- Issue date May 16, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern exposing method using phase shift and mask used therefor
- Patent number 5,364,716
- Issue date Nov 15, 1994
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection type photomask and reflection type photolithography meth...
- Patent number 5,338,647
- Issue date Aug 16, 1994
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with phase-shifters and a method of fabricating the same
- Patent number 5,276,551
- Issue date Jan 4, 1994
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection type photomask with phase shifter
- Patent number 5,190,836
- Issue date Mar 2, 1993
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating an X-ray exposure mask
- Patent number 5,082,695
- Issue date Jan 21, 1992
- 501 Fujitsu Limited
- Masao Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming a fine pattern having a high aspect ratio
- Patent number 5,004,927
- Issue date Apr 2, 1991
- Fujitsu Limited
- Kenji Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray exposure mask
- Patent number 4,939,052
- Issue date Jul 3, 1990
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Deformation free X-ray exposure mask for X-ray lithography
- Patent number 4,881,257
- Issue date Nov 14, 1989
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure method and apparatus
- Patent number 4,678,919
- Issue date Jul 7, 1987
- Fujitsu Limited
- Kenji Sugishima
- H01 - BASIC ELECTRIC ELEMENTS

Kenji Nakagawa

Person

Patents Grantslast 30 patents

IC bonding pad combined with mark or monitor

Optical exposure method

Method of making resist patterns

Method of manufacturing semiconductor device

Optical exposure method

Deep UV photolithography with reduced halation

Mask producing method

Mask producing method

Fine pattern lithography with positive use of interference

Pattern forming method using mask

Optical exposure method

Reticle with phase-shifters and a method of fabricating the same

Mask, mask producing method and pattern forming method using mask

Pattern exposing method using phase shift and mask used therefor

Optical exposure method

Fine pattern lithography with positive use of interference

Pattern exposing method using phase shift and mask used therefor

Reflection type photomask and reflection type photolithography meth...

Reticle with phase-shifters and a method of fabricating the same

Reflection type photomask with phase shifter

Method of fabricating an X-ray exposure mask

Process for forming a fine pattern having a high aspect ratio

X-ray exposure mask

Deformation free X-ray exposure mask for X-ray lithography

Electron beam exposure method and apparatus