Kenji Ohtoshi

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of measuring beam position of multi charged particle beam, a...
- Patent number 9,653,262
- Issue date May 16, 2017
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 9,472,372
- Issue date Oct 18, 2016
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotation angle measuring method of multi-charged particle beam imag...
- Patent number 9,466,461
- Issue date Oct 11, 2016
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 9,190,245
- Issue date Nov 17, 2015
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus and focusing method for charged particle beam
- Patent number 8,253,112
- Issue date Aug 28, 2012
- Nuflare Technology, Inc.
- Osamu Iizuka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Focusing method of charged particle beam and astigmatism adjusting...
- Patent number 8,188,443
- Issue date May 29, 2012
- Nuflare Technology, Inc.
- Kenji Ohtoshi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of acquiring offset deflection amount for shaped beam and li...
- Patent number 8,008,631
- Issue date Aug 30, 2011
- Nuflare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of calculating deflection aberration correcting voltage and...
- Patent number 7,679,068
- Issue date Mar 16, 2010
- Nuflare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING
Information Patent Grant
Deflector for equipment of electron beam lithography and equipment...
- Patent number 7,521,689
- Issue date Apr 21, 2009
- Nuflare Technology, Inc.
- Yoshimasa Sanmiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam drawing apparatus and charged beam drawing method
- Patent number 7,476,881
- Issue date Jan 13, 2009
- Nuflare Technology, Inc.
- Kiyoshi Hattori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ROTATION ANGLE MEASURING METHOD OF MULTI-CHARGED PARTICLE BEAM IMAG...
- Publication number 20160211111
- Publication date Jul 21, 2016
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, A...
- Publication number 20160086764
- Publication date Mar 24, 2016
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160020063
- Publication date Jan 21, 2016
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...
- Publication number 20150228455
- Publication date Aug 13, 2015
- NuFlare Technology, Inc.
- Tomoo MOTOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ACQUIRING OFFSET DEFLECTION AMOUNT FOR SHAPED BEAM AND LI...
- Publication number 20100001203
- Publication date Jan 7, 2010
- NuFlare Technology, Inc.
- Takahito Nakayama
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHY APPARATUS AND FOCUSING METHOD FOR CHARGED PARTICLE BEAM
- Publication number 20090314950
- Publication date Dec 24, 2009
- NuFlare Technology, Inc.
- Osamu IIZUKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
FOCUSING METHOD OF CHARGED PARTICLE BEAM AND ASTIGMATISM ADJUSTING...
- Publication number 20080217553
- Publication date Sep 11, 2008
- NuFlare Technology, Inc.
- Kenji Ohtoshi
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFLECTOR FOR EQUIPMENT OF ELECTRON BEAM LITHOGRAPHY AND EQUIPMENT...
- Publication number 20070181819
- Publication date Aug 9, 2007
- NuFlare Technology, Inc.
- Yoshimasa SANMIYA
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...
- Publication number 20070158576
- Publication date Jul 12, 2007
- NuFlare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING
Information Patent Application
CHARGED BEAM DRAWING APPARATUS AND CHARGED BEAM DRAWING METHOD
- Publication number 20070114461
- Publication date May 24, 2007
- Kiyoshi HATTORI
- B82 - NANO-TECHNOLOGY

Kenji Ohtoshi

Person

Patents Grantslast 30 patents

Method of measuring beam position of multi charged particle beam, a...

Charged particle beam writing apparatus and charged particle beam w...

Rotation angle measuring method of multi-charged particle beam imag...

Charged particle beam writing apparatus, and charged particle beam...

Lithography apparatus and focusing method for charged particle beam

Focusing method of charged particle beam and astigmatism adjusting...

Method of acquiring offset deflection amount for shaped beam and li...

Method of calculating deflection aberration correcting voltage and...

Deflector for equipment of electron beam lithography and equipment...

Charged beam drawing apparatus and charged beam drawing method

Patents Applicationslast 30 patents

ROTATION ANGLE MEASURING METHOD OF MULTI-CHARGED PARTICLE BEAM IMAG...

METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, A...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...

METHOD OF ACQUIRING OFFSET DEFLECTION AMOUNT FOR SHAPED BEAM AND LI...

LITHOGRAPHY APPARATUS AND FOCUSING METHOD FOR CHARGED PARTICLE BEAM

FOCUSING METHOD OF CHARGED PARTICLE BEAM AND ASTIGMATISM ADJUSTING...

DEFLECTOR FOR EQUIPMENT OF ELECTRON BEAM LITHOGRAPHY AND EQUIPMENT...

METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...

CHARGED BEAM DRAWING APPARATUS AND CHARGED BEAM DRAWING METHOD