DEFLECTOR FOR EQUIPMENT OF ELECTRON BEAM LITHOGRAPHY AND EQUIPMENT OF ELECTRON BEAM LITHOGRAPHY

Abstract

A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention and, together with the general description given above and the detailed description of the embodiments given below, serve to explain the principles of the invention;

FIG. 1 is a schematic conceptual illustration of an equipment of electron beam lithography to which an embodiment of deflector for an equipment of electron beam lithography according to the present invention is applied;

FIG. 2 is a schematic top view of equipment of electron beam lithography according to the embodiment of the present invention;

FIG. 3 is a schematic illustration of the structure of the molding substrate according to the embodiment of the present invention;

FIG. 4 is a schematic illustration of the structure of the molding substrate according to the embodiment of the present invention;

FIG. 5 is a schematic top view of the deflector for an equipment of electron beam lithography according to the embodiment of the present invention; and

FIG. 6 is a schematic top view of the deflector for an equipment of electron beam lithography according to the embodiment of the present invention.

Claims

1. A deflector for an equipment of electron beam lithography, the deflector comprising: a plurality of control electrodes arranged symmetrically relative to a center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively;a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes; anda plurality of earth electrodes arranged respectively at the plurality of molding substrates.

2. The deflector according to claim 1, wherein each of the earth electrodes is formed on the surface of each of the molding substrates, facing to each of the control electrodes.

3. The deflector according to claim 1, further comprising a signal wire arranged on each of the molding substrates configured to supply a control signal to each of the control electrodes.

4. The deflector according to claim 3, wherein the signal wire is arranged on opposite side of the surface of each of the molding substrates, the surface facing to each of the control electrodes.

5. The deflector according to claim 3, wherein the signal wire is arranged in the inside of each of the molding substrates.

6. The deflector according to claim 1, wherein each of the molding substrates is a flexible printed circuit board.

7. The deflector according to claim 1, wherein each of the control electrodes has a trapezoidal prism shape.

8. A deflector for an equipment of electron beam lithography, the deflector comprising: a plurality of control electrodes arranged symmetrically relative to a center axis of an irradiated electron beam configured to control the electron beam by applying voltages respectively; andan integrally formed earth electrode arranged in the outer peripheral region of the plurality of control electrodes and between the adjacent control electrodes.

9. The deflector according to claim 8, wherein each of the control electrodes is a trapezoidal prism shape cutting out from the outer peripheral side partly.

10. An equipment of electron beam lithography, the equipment comprising: an electron gun configured to irradiate an electron beam;a stage configured to attach a mask; anda deflector installed between the electron gun and the stage configured to control the electron beam irradiated from the electron gun for mask processing, having a plurality of control electrodes arranged symmetrically relative to a center axis of the electron beam, the electrodes configured to control the electron beam by applying voltages respectively, having a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes; and having earth electrodes arranged respectively at the plurality of molding substrates.

11. The equipment according to claim 10, wherein each of the earth electrodes is formed on the surface of each of the molding substrate, facing to the each of control electrode.

12. The equipment according to claim 10, further comprising a signal wire arranged on each of the molding substrates configured to supply a control signal to each of the control electrodes.

13. The equipment according to claim 12, wherein the signal wire is arranged on opposite side of the surface of each of the molding substrates, the surface facing to each of the control electrodes.

14. The equipment according to claim 12, wherein the signal wire is arranged in the inside of each of the molding substrates.

15. The equipment according to claim 10, wherein each of the molding substrates is a flexible printed circuit board.

16. The equipment according to claim 10, wherein each of the control electrodes has a trapezoidal prism shape.

17. An equipment of electron beam lithography, the equipment comprising: an electron gun configured to irradiate an electron beam;a stage configured to attach a mask; anda deflector installed between the electron gun and the stage configured to control the electron beam irradiated from the electron gun for mask processing, having a plurality of control electrodes arranged symmetrically relative to a center axis of an irradiated electron beam configured to control the electron beam by applying voltages respectively and having an integrally formed earth electrode arranged in the outer peripheral region of the plurality of control electrodes and between the adjacent control electrodes.

18. The equipment according to claim 17, wherein each of the control electrodes is a trapezoidal prism shape cutting out from the outer peripheral side partly.