Kenji SEKIGUCHI

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing device and etching liquid
- Patent number 12,203,021
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Koukichi Hiroshiro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,865,590
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Kyoko Ikeda
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,538,679
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Yuji Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, processing container cleaning method, an...
- Patent number 11,504,751
- Issue date Nov 22, 2022
- Tokyo Electron Limited
- Kyoko Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing device and etchin...
- Patent number 11,306,249
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,211,281
- Issue date Dec 28, 2021
- Tokyo Electron Limited
- Kenji Sekiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, recording medium and substrate process...
- Patent number 11,201,050
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,049,723
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Koukichi Hiroshiro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Substrate cleaning method, substrate cleaning system and memory medium
- Patent number 10,734,255
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Liquid processing method, liquid processing apparatus and storage m...
- Patent number 9,111,967
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Kenji Sekiguchi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,794,250
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Takehiko Orii
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 8,651,121
- Issue date Feb 18, 2014
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 8,475,668
- Issue date Jul 2, 2013
- Tokyo Electron Limited
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,337,659
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Takehiko Orii
- F26 - DRYING
Information Patent Grant
Substrate cleaning method, substrate cleaning apparatus, control pr...
- Patent number 8,197,606
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Tsukasa Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning method and computer readable storage medium
- Patent number 8,147,617
- Issue date Apr 3, 2012
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,137,478
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,056,257
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-fluid nozzle for cleaning substrate and substrate cleaning appa...
- Patent number 8,037,891
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Itaru Kanno
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate cleaning method, substrate cleaning equipment, computer p...
- Patent number 7,837,804
- Issue date Nov 23, 2010
- Tokyo Electron Limited
- Hiroki Ohno
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 7,806,989
- Issue date Oct 5, 2010
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning method, and medium...
- Patent number 7,803,230
- Issue date Sep 28, 2010
- Tokyo Electron Limited
- Masaru Amai
- B08 - CLEANING
Information Patent Grant
Resist film removing method
- Patent number 7,691,210
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Takehiko Orii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,364,626
- Issue date Apr 29, 2008
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Substrate cleaning tool and substrate cleaning apparatus
- Patent number 7,010,826
- Issue date Mar 14, 2006
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Substrate cleaning tool, having permeable cleaning head
- Patent number 6,554,010
- Issue date Apr 29, 2003
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Substrate washing method
- Patent number 6,432,212
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Scrubbing apparatus
- Patent number 6,385,805
- Issue date May 14, 2002
- Tokyo Electron Limited
- Nobuo Konishi
- B08 - CLEANING
Information Patent Grant
Substrate washing apparatus and method
- Patent number 6,175,983
- Issue date Jan 23, 2001
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Method of forming a coating film and coating apparatus
- Patent number 5,803,970
- Issue date Sep 8, 1998
- Tokyo Electron Limited
- Kiyohisa Tateyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240222157
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Song yun Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240128307
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Rintaro HIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20240087916
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...
- Publication number 20230223251
- Publication date Jul 13, 2023
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...
- Publication number 20230111710
- Publication date Apr 13, 2023
- TOKYO ELECTRON LIMITED
- Takeya INOUE
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20230063907
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- B08 - CLEANING
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20220403509
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220316059
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Koukichi HIROSHIRO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND ETCHING LIQUID
- Publication number 20220213382
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20220068642
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Koji KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...
- Publication number 20220001426
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Kyoko IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210305066
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Song yun Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210296123
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Yuji Katagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE AND ETCHIN...
- Publication number 20210032537
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Koukichi Hiroshiro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200219730
- Publication date Jul 9, 2020
- TOKYO ELECTRON LIMITED
- Koukichi Hiroshiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200185261
- Publication date Jun 11, 2020
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SUBSTRATE PROCESS...
- Publication number 20190355574
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Itaru Kanno
- F26 - DRYING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM
- Publication number 20170345685
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130145643
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20120260949
- Publication date Oct 18, 2012
- Kenji SEKIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20120125368
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20110089137
- Publication date Apr 21, 2011
- TOKYO ELECTRON LIMITED
- Hiroshi TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20100307543
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20100269865
- Publication date Oct 28, 2010
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...
- Publication number 20100206329
- Publication date Aug 19, 2010
- TOKYO ELECTRON LIMITED
- Tsukasa WATANABE
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20100108095
- Publication date May 6, 2010
- TOKYO ELECTRON LIMITED
- Nobuhiko MOURI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20090205684
- Publication date Aug 20, 2009
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Cleaning Method, Substrate Cleaning Equipment, Computer P...
- Publication number 20080251101
- Publication date Oct 16, 2008
- Hiroki Ohno
- B08 - CLEANING
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20080127508
- Publication date Jun 5, 2008
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Cleaning Method and Computer Readable Storage Medium
- Publication number 20080041420
- Publication date Feb 21, 2008
- Kenji Sekiguchi
- B08 - CLEANING

Kenji SEKIGUCHI

Person

Patents Grantslast 30 patents

Substrate processing device and etching liquid

Substrate cleaning method, processing container cleaning method, an...

Substrate processing method and substrate processing apparatus

Substrate cleaning method, processing container cleaning method, an...

Substrate processing method, substrate processing device and etchin...

Substrate processing apparatus and substrate processing method

Substrate processing method, recording medium and substrate process...

Substrate processing method and substrate processing apparatus

Substrate cleaning method, substrate cleaning system and memory medium

Liquid processing method, liquid processing apparatus and storage m...

Substrate processing method and substrate processing apparatus

Substrate processing apparatus, substrate processing method, and st...

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing method and substrate processing apparatus

Substrate cleaning method, substrate cleaning apparatus, control pr...

Substrate cleaning method and computer readable storage medium

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Two-fluid nozzle for cleaning substrate and substrate cleaning appa...

Substrate cleaning method, substrate cleaning equipment, computer p...

Substrate processing method and substrate processing apparatus

Substrate cleaning apparatus, substrate cleaning method, and medium...

Resist film removing method

Substrate processing apparatus and substrate processing method

Substrate cleaning tool and substrate cleaning apparatus

Substrate cleaning tool, having permeable cleaning head

Substrate washing method

Scrubbing apparatus

Substrate washing apparatus and method

Method of forming a coating film and coating apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...

PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING DEVICE AND ETCHING LIQUID

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE CLEANING METHOD, PROCESSING CONTAINER CLEANING METHOD, AN...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE AND ETCHIN...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SUBSTRATE PROCESS...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CLEANING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

Substrate Cleaning Method, Substrate Cleaning Equipment, Computer P...

Substrate processing apparatus and substrate processing method

Substrate Cleaning Method and Computer Readable Storage Medium