Kenji Tamaki

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Image forming apparatus, color misregistration correction method, a...
- Patent number 12,197,142
- Issue date Jan 14, 2025
- Konica Minolta, Inc.
- Shota Igo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diagnosis apparatus, plasma processing apparatus and diagnosis method
- Patent number 12,040,167
- Issue date Jul 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Manufacturing defect factor searching method and manufacturing defe...
- Patent number 11,592,807
- Issue date Feb 28, 2023
- Hitachi, Ltd.
- Kenji Tamaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 11,538,671
- Issue date Dec 27, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 11,410,836
- Issue date Aug 9, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and data analysis apparatus
- Patent number 10,510,519
- Issue date Dec 17, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, plasma processing method and plasma pr...
- Patent number 10,408,762
- Issue date Sep 10, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analysis method and semiconductor etching apparatus
- Patent number 10,262,842
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Setting operation control in parts mounting device by reducing a va...
- Patent number 9,897,999
- Issue date Feb 20, 2018
- Yamaha Hatsudoki Kabushiki Kaisha
- Ryoji Asakura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus and analyzing apparatus
- Patent number 9,464,936
- Issue date Oct 11, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,443,704
- Issue date Sep 13, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring diagnostic device and monitoring diagnostic method
- Patent number 9,378,183
- Issue date Jun 28, 2016
- Hitachi, Ltd.
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Data analysis method for plasma processing apparatus, plasma proces...
- Patent number 9,324,588
- Issue date Apr 26, 2016
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Analysis method, analysis device, and etching processing system
- Patent number 9,091,595
- Issue date Jul 28, 2015
- Hitachi High-Technologies Corporation
- Ryoji Asakura
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus abnormality diagnosis method and system
- Patent number 8,676,553
- Issue date Mar 18, 2014
- Hitachi, Ltd.
- Toshiharu Miwa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus abnormality monitoring method and system
- Patent number 8,566,070
- Issue date Oct 22, 2013
- Hitachi, Ltd.
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus anomaly monitoring method and system
- Patent number 8,515,719
- Issue date Aug 20, 2013
- Hitachi, Ltd.
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for determining parameter of product design and its supporti...
- Patent number 7,289,859
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Quality control system for manufacturing industrial products
- Patent number 7,209,846
- Issue date Apr 24, 2007
- Hitachi, Ltd.
- Kenji Tamaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etching system and etching method
- Patent number 6,916,396
- Issue date Jul 12, 2005
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing method
- Patent number 6,881,352
- Issue date Apr 19, 2005
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and its apparatus for manufacturing semiconductor device
- Patent number 6,869,807
- Issue date Mar 22, 2005
- Hitachi, Ltd.
- Yasuhiro Yoshitake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 6,733,618
- Issue date May 11, 2004
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Production planning system
- Patent number 6,226,561
- Issue date May 1, 2001
- Hitachi, Ltd.
- Kenji Tamaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical information processing method and apparatus including measu...
- Patent number 5,532,990
- Issue date Jul 2, 1996
- Canon Kabushiki Kaisha
- Osamu Koyama
- G11 - INFORMATION STORAGE
Information Patent Grant
Optical information processing apparatus in which the offset of a t...
- Patent number 5,517,475
- Issue date May 14, 1996
- Canon Kabushiki Kaisha
- Osamu Koyama
- G11 - INFORMATION STORAGE
Information Patent Grant
Optical information processing apparatus including a correction cir...
- Patent number 5,404,346
- Issue date Apr 4, 1995
- Canon Kabushiki Kaisha
- Osamu Koyama
- G11 - INFORMATION STORAGE
Information Patent Grant
Detector for moving velocity of light beam spot
- Patent number 5,359,581
- Issue date Oct 25, 1994
- Canon Kabushiki Kaisha
- Kenji Tamaki
- G11 - INFORMATION STORAGE
Information Patent Grant
Optical information processing apparatus for correcting linearity o...
- Patent number 5,347,503
- Issue date Sep 13, 1994
- Canon Kabushiki Kaisha
- Osamu Koyama
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
Deterioration Prediction System and Deterioration Prediction Method...
- Publication number 20240111281
- Publication date Apr 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Kenji TAMAKI
- G05 - CONTROLLING REGULATING
Information Patent Application
Image Forming Apparatus, Color Misregistration Correction Method, A...
- Publication number 20230375954
- Publication date Nov 23, 2023
- Konica Minolta, Inc.
- Shota IGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS DIAGNOSTIC APPARATUS, APPARATUS DIAGNOSTIC METHOD, PLASMA...
- Publication number 20220399182
- Publication date Dec 15, 2022
- Hitachi High-Tech Corporation
- Shota Umeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20220328286
- Publication date Oct 13, 2022
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD
- Publication number 20220157580
- Publication date May 19, 2022
- Hitachi High-Tech Corporation
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Manufacturing Defect Factor Searching Method and Manufacturing Defe...
- Publication number 20210318672
- Publication date Oct 14, 2021
- Hitachi, Ltd
- Kenji TAMAKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20200066500
- Publication date Feb 27, 2020
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20190189397
- Publication date Jun 20, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20190170653
- Publication date Jun 6, 2019
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS
- Publication number 20160379896
- Publication date Dec 29, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...
- Publication number 20160225681
- Publication date Aug 4, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160203957
- Publication date Jul 14, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Assembly for Prognostics of Solder Joint
- Publication number 20160146878
- Publication date May 26, 2016
- Hitachi, Ltd
- Lina Jaya DIGUNA
- G01 - MEASURING TESTING
Information Patent Application
TASK-DIRECTING SYSTEM AND TASK-DIRECTING METHOD
- Publication number 20160140515
- Publication date May 19, 2016
- Hitachi, Ltd
- Daisuke KATSUMATA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...
- Publication number 20160020123
- Publication date Jan 21, 2016
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM OF MANAGING REPLACEMENT TIMING INTERVAL OF MAINTE...
- Publication number 20150220875
- Publication date Aug 6, 2015
- Hitachi, Ltd
- Kenji Tamaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS
- Publication number 20150083328
- Publication date Mar 26, 2015
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
CALCULATION DEVICE, PARTS INSTALLATION DEVICE, AND PROGRAM
- Publication number 20150081079
- Publication date Mar 19, 2015
- HITACHI HIGH-TECH INSTRUMENTS CO., LTD.
- Ryoji Asakura
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS
- Publication number 20140262029
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM
- Publication number 20140022540
- Publication date Jan 23, 2014
- Ryoji ASAKURA
- G01 - MEASURING TESTING
Information Patent Application
PREDICTION SYSTEM AND PROGRAM FOR PARTS SHIPMENT QUANTITY
- Publication number 20130332233
- Publication date Dec 12, 2013
- Naoko Kishikawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MONITORING DIAGNOSTIC DEVICE AND MONITORING DIAGNOSTIC METHOD
- Publication number 20130132000
- Publication date May 23, 2013
- Kenji Tamaki
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS ABNORMALITY MONITORING METHOD AND SYSTEM
- Publication number 20120136629
- Publication date May 31, 2012
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS ANOMALY MONITORING METHOD AND SYSTEM
- Publication number 20110276828
- Publication date Nov 10, 2011
- Kenji Tamaki
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS ABNORMALITY DIAGNOSIS METHOD AND SYSTEM
- Publication number 20110264424
- Publication date Oct 27, 2011
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...
- Publication number 20090120580
- Publication date May 14, 2009
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20070193687
- Publication date Aug 23, 2007
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for determining parameter of product design and its supporti...
- Publication number 20070078553
- Publication date Apr 5, 2007
- Toshiharu Miwa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20060124243
- Publication date Jun 15, 2006
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Quality control system for manufacturing industrial products
- Publication number 20060047454
- Publication date Mar 2, 2006
- Kenji Tamaki
- G06 - COMPUTING CALCULATING COUNTING

Kenji Tamaki

Person

Patents Grantslast 30 patents

Image forming apparatus, color misregistration correction method, a...

Diagnosis apparatus, plasma processing apparatus and diagnosis method

Manufacturing defect factor searching method and manufacturing defe...

Plasma processing apparatus and data analysis apparatus

Analysis method and semiconductor etching apparatus

Plasma processing apparatus and data analysis apparatus

Plasma processing apparatus, plasma processing method and plasma pr...

Analysis method and semiconductor etching apparatus

Setting operation control in parts mounting device by reducing a va...

Plasma processing apparatus and analyzing apparatus

Data analysis method for plasma processing apparatus, plasma proces...

Monitoring diagnostic device and monitoring diagnostic method

Data analysis method for plasma processing apparatus, plasma proces...

Analysis method, analysis device, and etching processing system

Apparatus abnormality diagnosis method and system

Apparatus abnormality monitoring method and system

Apparatus anomaly monitoring method and system

Disturbance-free, recipe-controlled plasma processing system and me...

Method for determining parameter of product design and its supporti...

Quality control system for manufacturing industrial products

Etching system and etching method

Disturbance-free, recipe-controlled plasma processing method

Method and its apparatus for manufacturing semiconductor device

Disturbance-free, recipe-controlled plasma processing system and me...

Production planning system

Optical information processing method and apparatus including measu...

Optical information processing apparatus in which the offset of a t...

Optical information processing apparatus including a correction cir...

Detector for moving velocity of light beam spot

Optical information processing apparatus for correcting linearity o...

Patents Applicationslast 30 patents

Deterioration Prediction System and Deterioration Prediction Method...

Image Forming Apparatus, Color Misregistration Correction Method, A...

APPARATUS DIAGNOSTIC APPARATUS, APPARATUS DIAGNOSTIC METHOD, PLASMA...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD

Manufacturing Defect Factor Searching Method and Manufacturing Defe...

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

PLASMA PROCESSING APPARATUS AND DATA ANALYSIS APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PLASMA PR...

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

Electronic Assembly for Prognostics of Solder Joint

TASK-DIRECTING SYSTEM AND TASK-DIRECTING METHOD

DATA ANALYSIS METHOD FOR PLASMA PROCESSING APPARATUS, PLASMA PROCES...

METHOD AND SYSTEM OF MANAGING REPLACEMENT TIMING INTERVAL OF MAINTE...

ANALYSIS METHOD AND SEMICONDUCTOR ETCHING APPARATUS

CALCULATION DEVICE, PARTS INSTALLATION DEVICE, AND PROGRAM

SEMICONDUCTOR ETCHING APPARATUS AND ANALYZING APPARATUS

ANALYSIS METHOD, ANALYSIS DEVICE, AND ETCHING PROCESSING SYSTEM

PREDICTION SYSTEM AND PROGRAM FOR PARTS SHIPMENT QUANTITY

MONITORING DIAGNOSTIC DEVICE AND MONITORING DIAGNOSTIC METHOD

APPARATUS ABNORMALITY MONITORING METHOD AND SYSTEM

APPARATUS ANOMALY MONITORING METHOD AND SYSTEM

APPARATUS ABNORMALITY DIAGNOSIS METHOD AND SYSTEM

Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...

Disturbance-free, recipe-controlled plasma processing system and me...

Method for determining parameter of product design and its supporti...

Disturbance-free, recipe-controlled plasma processing system and me...

Quality control system for manufacturing industrial products