Kenji Tanimoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system
- Patent number 12,068,128
- Issue date Aug 20, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of adjusting focus of electron micro...
- Patent number 11,670,479
- Issue date Jun 6, 2023
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device
- Patent number 11,626,266
- Issue date Apr 11, 2023
- HITACHI HIGH-TECH CORPORATION
- Keiichiro Hitomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 11,353,798
- Issue date Jun 7, 2022
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and method for measuring pattern
- Patent number 11,276,554
- Issue date Mar 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,251,018
- Issue date Feb 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,903,037
- Issue date Jan 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Keigo Kasuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 10,816,332
- Issue date Oct 27, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroya Ohta
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,636,618
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Kaori Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,629,408
- Issue date Apr 21, 2020
- Hitachi High-Technologies Corporation
- Toshimasa Kameda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, and method of manufacturing component...
- Patent number 10,170,273
- Issue date Jan 1, 2019
- Hitachi High-Technologies Corporation
- Takashi Ichimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and overlay misalignment measurement m...
- Patent number 9,224,575
- Issue date Dec 29, 2015
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus and method for stably obtaining cha...
- Patent number 8,536,540
- Issue date Sep 17, 2013
- Hitachi High-Technologies Corporation
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer inspection tool and semiconductor wafer inspect...
- Patent number 7,728,294
- Issue date Jun 1, 2010
- Hitachi High-Technologies Corporation
- Takashi Hiroi
- G01 - MEASURING TESTING
Information Patent Grant
Charge control apparatus and measurement apparatus equipped with th...
- Patent number 7,683,319
- Issue date Mar 23, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus and inspection method
- Patent number 7,652,248
- Issue date Jan 26, 2010
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,435,960
- Issue date Oct 14, 2008
- Hitachi High-Technologies Corporation
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,397,031
- Issue date Jul 8, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,241,996
- Issue date Jul 10, 2007
- Hitachi High-Technologies Corporation
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,098,455
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 6,583,413
- Issue date Jun 24, 2003
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240379318
- Publication date Nov 14, 2024
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20240371601
- Publication date Nov 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure for Particle Acceleration And Charged Particle Beam Appar...
- Publication number 20240242918
- Publication date Jul 18, 2024
- Hitachi High-Tech Corporation
- RYO SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON SOURCE, ELECTRON GUN, AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20230352262
- Publication date Nov 2, 2023
- HITACHI HIGH-TECH CORPORATION
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220359149
- Publication date Nov 10, 2022
- HITACHI HIGH-TECH CORPORATION
- Makoto SAKAKIBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20220351938
- Publication date Nov 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Yusuke NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20220260930
- Publication date Aug 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220130638
- Publication date Apr 28, 2022
- HITACHI HIGH-TECH CORPORATION
- Keiichiro HITOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON MICROSCOPE AND METHOD OF ADJUSTING FOCUS OF ELECTRON MICRO...
- Publication number 20210384006
- Publication date Dec 9, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Scanning Electron Microscope
- Publication number 20210272770
- Publication date Sep 2, 2021
- Hitachi High-Tech Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND METHOD FOR MEASURING PATTERN
- Publication number 20210043420
- Publication date Feb 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20200292308
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Hiroya OHTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20200278615
- Publication date Sep 3, 2020
- Hitachi High-Technologies Corporation
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20200090897
- Publication date Mar 19, 2020
- Hitachi High-Technologies Corporation
- Keigo KASUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20190221400
- Publication date Jul 18, 2019
- Hitachi High-Technologies Corporation
- Toshimasa KAMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20190066969
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kaori BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device, and Method of Manufacturing Component...
- Publication number 20180019096
- Publication date Jan 18, 2018
- Hitachi High-Technologies Corporation
- Takashi ICHIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Charged Particle Beam Device and Overlay Misalignment Measurement M...
- Publication number 20150287569
- Publication date Oct 8, 2015
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM APPARATUS AND LENS ARRAY
- Publication number 20130248731
- Publication date Sep 26, 2013
- Hitachi High-Technologies Corporation
- Sayaka TANIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHA...
- Publication number 20120126118
- Publication date May 24, 2012
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charge control apparatus and measurement apparatus equipped with th...
- Publication number 20090166557
- Publication date Jul 2, 2009
- Hiroshi Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer inspection tool and semiconductor wafer inspect...
- Publication number 20080067381
- Publication date Mar 20, 2008
- Hitachi High-Technologies Corporation
- Takashi Hiroi
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION AND MEASUREMENT APPARATUS
- Publication number 20080017797
- Publication date Jan 24, 2008
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus
- Publication number 20070241278
- Publication date Oct 18, 2007
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection Apparatus and Inspection Method
- Publication number 20070228276
- Publication date Oct 4, 2007
- HIROSHI MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20060243908
- Publication date Nov 2, 2006
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Charged particle beam apparatus
- Publication number 20060016990
- Publication date Jan 26, 2006
- Makoto Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20030201391
- Publication date Oct 30, 2003
- Hiroyuki Shinada
- G01 - MEASURING TESTING

Kenji Tanimoto

Person

Patents Grantslast 30 patents

Pattern measurement device and pattern measurement method

Charged particle beam system

Electron microscope and method of adjusting focus of electron micro...

Charged particle beam device

Pattern measurement device and pattern measurement method

Scanning electron microscope and method for measuring pattern

Scanning electron microscope

Charged particle beam device

Pattern measurement device and pattern measurement method

Charged particle beam apparatus

Charged particle beam device

Charged particle beam device, and method of manufacturing component...

Charged particle beam device and overlay misalignment measurement m...

Charged particle beam apparatus and method for stably obtaining cha...

Semiconductor wafer inspection tool and semiconductor wafer inspect...

Charge control apparatus and measurement apparatus equipped with th...

Inspection apparatus and inspection method

Charged particle beam apparatus

Method of inspecting a circuit pattern and inspecting instrument

Charged particle beam apparatus

Method of inspecting a circuit pattern and inspecting instrument

Method of inspecting a circuit pattern and inspecting instrument

Patents Applicationslast 30 patents

Pattern Measurement Device and Pattern Measurement Method

CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam System

Structure for Particle Acceleration And Charged Particle Beam Appar...

ELECTRON SOURCE, ELECTRON GUN, AND CHARGED PARTICLE BEAM DEVICE

CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam System

Pattern Measurement Device and Pattern Measurement Method

CHARGED PARTICLE BEAM DEVICE

ELECTRON MICROSCOPE AND METHOD OF ADJUSTING FOCUS OF ELECTRON MICRO...

Scanning Electron Microscope

SCANNING ELECTRON MICROSCOPE AND METHOD FOR MEASURING PATTERN

Pattern Measurement Device and Pattern Measurement Method

Pattern Measurement Device and Pattern Measurement Method

CHARGED PARTICLE BEAM DEVICE

Charged Particle Beam Device

CHARGED PARTICLE BEAM APPARATUS

Charged Particle Beam Device, and Method of Manufacturing Component...

Charged Particle Beam Device and Overlay Misalignment Measurement M...

ELECTRON BEAM APPARATUS AND LENS ARRAY

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHA...

Charge control apparatus and measurement apparatus equipped with th...

Semiconductor wafer inspection tool and semiconductor wafer inspect...

PATTERN INSPECTION AND MEASUREMENT APPARATUS

Charged particle beam apparatus

Inspection Apparatus and Inspection Method

Method of inspecting a circuit pattern and inspecting instrument

Charged particle beam apparatus

Method of inspecting a circuit pattern and inspecting instrument