Kenneth S. Collins

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous liner for use in a processing chamber
- Patent number 11,814,724
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,651,966
- Issue date May 16, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous liner for use in a processing chamber
- Patent number 11,499,223
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with electrode filaments extending from ceiling
- Patent number 11,424,104
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coated article and semiconductor chamber apparatus formed from yttr...
- Patent number 11,373,882
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode assembly for moving substrate
- Patent number 11,355,321
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode array in ceiling
- Patent number 11,114,284
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate assembly for high power plasma etch processes
- Patent number 11,043,360
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma deposition of carbon hardmask
- Patent number 11,043,375
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,043,387
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a bulk article and semiconductor chamber apparatu...
- Patent number 10,847,386
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Coated article and semiconductor chamber apparatus formed from yttr...
- Patent number 10,840,112
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of forming a coated article and semiconductor chamber appara...
- Patent number 10,840,113
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for electron beam etching process
- Patent number 10,790,153
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing reactor with a magnetic electron-blocking filter...
- Patent number 10,784,085
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for reducing particles in semiconductor proce...
- Patent number 10,770,269
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Etching methods
- Patent number 10,707,086
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bulk sintered solid solution ceramic which exhibits fracture toughn...
- Patent number 10,622,194
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,615,004
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition or treatment of diamond-like carbon in a plasma reactor
- Patent number 10,544,505
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20240011153
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT GAP PUMPING TO PREVENT GLOW DISCHARGE AND LIGHT-UP
- Publication number 20230197495
- Publication date Jun 22, 2023
- James David CARDUCCI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20230175123
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS
- Publication number 20230162996
- Publication date May 25, 2023
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...
- Publication number 20230162950
- Publication date May 25, 2023
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...
- Publication number 20230057145
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- DAISUKE SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...
- Publication number 20220293397
- Publication date Sep 15, 2022
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20220186366
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH MULTIPHASE ROTATING INDEPENDENT GAS CROSS-FLOW...
- Publication number 20220084795
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW
- Publication number 20220084794
- Publication date Mar 17, 2022
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210296131
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210287907
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210134599
- Publication date May 6, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...
- Publication number 20200395226
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS
- Publication number 20200035454
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ELECTRON BEAM ETCHING PROCESS
- Publication number 20200006036
- Publication date Jan 2, 2020
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20190393053
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distribution hub for plasma processing chamber
- Publication number 20190330748
- Publication date Oct 31, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190287765
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20190228970
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS
- Publication number 20190221437
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A BULK ARTICLE AND SEMICONDUCTOR CHAMBER APPARATU...
- Publication number 20190157114
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...
- Publication number 20190157113
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARA...
- Publication number 20190157115
- Publication date May 23, 2019
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS
- Publication number 20190115246
- Publication date Apr 18, 2019
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kenneth S. Collins

Person

Patents Grantslast 30 patents

Symmetric VHF source for a plasma reactor

Continuous liner for use in a processing chamber

Methods and apparatus for processing a substrate

Symmetric VHF source for a plasma reactor

Continuous liner for use in a processing chamber

Plasma reactor with electrode filaments extending from ceiling

Coated article and semiconductor chamber apparatus formed from yttr...

Plasma reactor with electrode assembly for moving substrate

Symmetric plasma process chamber

Plasma reactor with electrode array in ceiling

Ion-ion plasma atomic layer etch process

Gas distribution plate assembly for high power plasma etch processes

Plasma deposition of carbon hardmask

Symmetric VHF source for a plasma reactor

Methods and apparatus for processing a substrate

Method of forming a bulk article and semiconductor chamber apparatu...

Coated article and semiconductor chamber apparatus formed from yttr...

Method of forming a coated article and semiconductor chamber appara...

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Methods and apparatus for electron beam etching process

Plasma processing reactor with a magnetic electron-blocking filter...

Apparatus and methods for reducing particles in semiconductor proce...

Etching methods

Bulk sintered solid solution ceramic which exhibits fracture toughn...

Distributed electrode array for plasma processing

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Deposition or treatment of diamond-like carbon in a plasma reactor

Symmetric plasma process chamber

Patents Applicationslast 30 patents

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SUBSTRATE SUPPORT GAP PUMPING TO PREVENT GLOW DISCHARGE AND LIGHT-UP

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

ETCHING APPARATUS

PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...

PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...

SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...

SYMMETRIC PLASMA PROCESS CHAMBER

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

PLASMA CHAMBER WITH MULTIPHASE ROTATING INDEPENDENT GAS CROSS-FLOW...

PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...

SYMMETRIC PLASMA PROCESS CHAMBER

ION-ION PLASMA ATOMIC LAYER ETCH PROCESS

METHODS AND APPARATUS FOR ELECTRON BEAM ETCHING PROCESS

ETCHING APPARATUS

Gas distribution hub for plasma processing chamber

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

ETCHING APPARATUS AND METHODS

METHOD OF FORMING A BULK ARTICLE AND SEMICONDUCTOR CHAMBER APPARATU...

COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTR...

METHOD OF FORMING A COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARA...

METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS

Plasma Reactor Having Radial Struts for Substrate Support