Kenneth T. Settlemyer

Person

Poughquag, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 9,472,402
- Issue date Oct 18, 2016
- GLOBALFOUNDRIES Inc.
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and structures for protecting one area while processing ano...
- Patent number 9,059,000
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CMOS devices with stressed channel regions, and methods for fabrica...
- Patent number 8,853,746
- Issue date Oct 7, 2014
- International Business Machines Corporation
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnosing in-line critical dimension control adjustments using opt...
- Patent number 8,577,489
- Issue date Nov 5, 2013
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction verification accounting for mask devia...
- Patent number 8,499,260
- Issue date Jul 30, 2013
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern enhancement by crystallographic etching
- Patent number 7,718,993
- Issue date May 18, 2010
- International Business Machines Corporation
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching to increase trench surface area
- Patent number 7,157,328
- Issue date Jan 2, 2007
- Infineon Technologies AG
- Helmut Horst Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for improved trench processing
- Patent number 6,967,136
- Issue date Nov 22, 2005
- International Business Machines Corporation
- Hiroyuki Akatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical thermal nitride mask (anti-collar) and processing thereof
- Patent number 6,797,582
- Issue date Sep 28, 2004
- International Business Machines Corporation
- Oleg Gluschenkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical hard mask
- Patent number 6,723,611
- Issue date Apr 20, 2004
- International Business Machines Corporation
- Hiroyuki Akatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for salicide trench capacitor plate electrode
- Patent number 6,664,161
- Issue date Dec 16, 2003
- International Business Machines Corporation
- Michael Patrick Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capillary dry process and apparatus
- Patent number 6,565,666
- Issue date May 20, 2003
- International Business Machines Corporation
- Russell H. Arndt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process flow for capacitance enhancement in a DRAM trench
- Patent number 6,555,430
- Issue date Apr 29, 2003
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of drying substrates
- Patent number 6,508,014
- Issue date Jan 21, 2003
- International Business Machines Corporation
- Russell H. Arndt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods and Structures for Protecting One Area While Processing Ano...
- Publication number 20150004802
- Publication date Jan 1, 2015
- International Business Machines Corporation
- Deok-kee Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and structures for protecting one area while processing ano...
- Publication number 20080261128
- Publication date Oct 23, 2008
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device Fabrication by Anisotropic Wet Etch
- Publication number 20080246059
- Publication date Oct 9, 2008
- International Business Machines Corporation
- Yujun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A BOTTLE TRENCH AND A BOTTLE TRENCH CAPACITOR
- Publication number 20080242021
- Publication date Oct 2, 2008
- Oh-Jung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN ENHANCEMENT BY CRYSTALLOGRAPHIC ETCHING
- Publication number 20080230868
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING SINGLE-CRYSTAL SEMICONDUCTOR SELECTIVE TO AMORPH...
- Publication number 20080111175
- Publication date May 15, 2008
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PARALLEL DATA PREPARATION AND PROCESSING O...
- Publication number 20080077891
- Publication date Mar 27, 2008
- International Business Machines Corporation
- Daria R. Dooling
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVED CMOS DEVICES WITH STRESSED CHANNEL REGIONS, AND METHODS FO...
- Publication number 20080001182
- Publication date Jan 3, 2008
- International Business Machines Corporation
- Xiangdong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corner clipping for field effect devices
- Publication number 20070167024
- Publication date Jul 19, 2007
- International Business Machines Corporation
- Yujun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device fabrication by anisotropic wet etch
- Publication number 20070166900
- Publication date Jul 19, 2007
- International Business Machines Corporation
- Yujun Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN ENHANCEMENT BY CRYSTALLOGRAPHIC ETCHING
- Publication number 20070072429
- Publication date Mar 29, 2007
- International Business Machines Corporation
- Thomas W. Dyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A BOTTLE TRENCH AND A BOTTLE TRENCH CAPACITOR
- Publication number 20060275974
- Publication date Dec 7, 2006
- Oh-Jung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective etching to increase trench surface area
- Publication number 20060172486
- Publication date Aug 3, 2006
- Helmut Horst Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT GATE WITH TERA CAP
- Publication number 20060128055
- Publication date Jun 15, 2006
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a bottle trench and a bottle trench capacitor
- Publication number 20060105526
- Publication date May 18, 2006
- International Business Machines Corporation
- Oh-Jung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR PROTECTING ONE AREA WHILE PROCESSING ANO...
- Publication number 20050255386
- Publication date Nov 17, 2005
- International Business Machines Corporation
- Deok-kee Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Filling high aspect ratio isolation structures with polysilazane ba...
- Publication number 20050179112
- Publication date Aug 18, 2005
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pull-back method of forming fins in FinFETs
- Publication number 20050121412
- Publication date Jun 9, 2005
- International Business Machines Corporation
- Jochen C. Beintner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR IMPROVED TRENCH PROCESSING
- Publication number 20050026382
- Publication date Feb 3, 2005
- International Business Machines Corporation
- Hiroyuki Akatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILLING HIGH ASPECT RATIO ISOLATION STRUCTURES WITH POLYSILAZANE BA...
- Publication number 20040248374
- Publication date Dec 9, 2004
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for reducing effects of halfpitch wafer spacing d...
- Publication number 20040129297
- Publication date Jul 8, 2004
- Kenneth T. Settlemyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned selective hemispherical grain deposition process and s...
- Publication number 20040063297
- Publication date Apr 1, 2004
- International Business Machines Corporation
- Kenneth T. Settlemyer,
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor method and structure for simultaneously forming a tre...
- Publication number 20040063277
- Publication date Apr 1, 2004
- International Business Machines Corporation
- Michael P. Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL HARD MASK
- Publication number 20040048441
- Publication date Mar 11, 2004
- International Business Machines Corporation
- Hiroyuki Akatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR SALICIDE TRENCH CAPACITOR PLATE ELECTRODE
- Publication number 20030207532
- Publication date Nov 6, 2003
- International Business Machines Corporation
- Michael Patrick Chudzik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical thermal nitride mask (anti-collar) and processing thereof
- Publication number 20030203587
- Publication date Oct 30, 2003
- Oleg Gluschenkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A 3-D MICROELECTRONIC STRUCTURE INCLUDING A VERTICAL THERMAL NITRID...
- Publication number 20030107111
- Publication date Jun 12, 2003
- International Business Machines Corporation
- Oleg Gluschenkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of drying substrates
- Publication number 20020112369
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Russell H. Arndt
- H01 - BASIC ELECTRIC ELEMENTS

Kenneth T. Settlemyer

Person

Patents Grantslast 30 patents

Methods and structures for protecting one area while processing ano...

Methods and structures for protecting one area while processing ano...

CMOS devices with stressed channel regions, and methods for fabrica...

Diagnosing in-line critical dimension control adjustments using opt...

Optical proximity correction verification accounting for mask devia...

Pattern enhancement by crystallographic etching

Selective etching to increase trench surface area

Method and structure for improved trench processing

Vertical thermal nitride mask (anti-collar) and processing thereof

Vertical hard mask

Method and structure for salicide trench capacitor plate electrode

Capillary dry process and apparatus

Process flow for capacitance enhancement in a DRAM trench

Method of drying substrates

Patents Applicationslast 30 patents

Methods and Structures for Protecting One Area While Processing Ano...

Methods and structures for protecting one area while processing ano...

Device Fabrication by Anisotropic Wet Etch

METHOD OF FABRICATING A BOTTLE TRENCH AND A BOTTLE TRENCH CAPACITOR

PATTERN ENHANCEMENT BY CRYSTALLOGRAPHIC ETCHING

METHOD FOR ETCHING SINGLE-CRYSTAL SEMICONDUCTOR SELECTIVE TO AMORPH...

METHOD AND APPARATUS FOR PARALLEL DATA PREPARATION AND PROCESSING O...

IMPROVED CMOS DEVICES WITH STRESSED CHANNEL REGIONS, AND METHODS FO...

Corner clipping for field effect devices

Device fabrication by anisotropic wet etch

PATTERN ENHANCEMENT BY CRYSTALLOGRAPHIC ETCHING

METHOD OF FABRICATING A BOTTLE TRENCH AND A BOTTLE TRENCH CAPACITOR

Selective etching to increase trench surface area

REPLACEMENT GATE WITH TERA CAP

Method of fabricating a bottle trench and a bottle trench capacitor

METHODS AND STRUCTURES FOR PROTECTING ONE AREA WHILE PROCESSING ANO...

Filling high aspect ratio isolation structures with polysilazane ba...

Pull-back method of forming fins in FinFETs

METHOD AND STRUCTURE FOR IMPROVED TRENCH PROCESSING

FILLING HIGH ASPECT RATIO ISOLATION STRUCTURES WITH POLYSILAZANE BA...

Method and system for reducing effects of halfpitch wafer spacing d...

Self-aligned selective hemispherical grain deposition process and s...

Semiconductor method and structure for simultaneously forming a tre...

VERTICAL HARD MASK

METHOD AND STRUCTURE FOR SALICIDE TRENCH CAPACITOR PLATE ELECTRODE

Vertical thermal nitride mask (anti-collar) and processing thereof

A 3-D MICROELECTRONIC STRUCTURE INCLUDING A VERTICAL THERMAL NITRID...

Method of drying substrates