Kevin P. Fairbairn

Person

Santa Clara County, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Synchronization of bias supplies
- Patent number 12,176,184
- Issue date Dec 24, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization between an excitation source and a substrate bias s...
- Patent number 11,610,761
- Issue date Mar 21, 2023
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,437,221
- Issue date Sep 6, 2022
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,282,677
- Issue date Mar 22, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of modulating supplies in a plasma processing system
- Patent number 11,264,209
- Issue date Mar 1, 2022
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization between an excitation source and a substrate bias s...
- Patent number 10,896,807
- Issue date Jan 19, 2021
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Application of modulating supplies in a plasma processing system
- Patent number 10,811,227
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma processing systems that include plasma modulating...
- Patent number 10,811,228
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization with a bias supply in a plasma processing system
- Patent number 10,811,229
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System architecture for combined static and pass-by processing
- Patent number 10,752,987
- Issue date Aug 25, 2020
- Intevac, Inc.
- Patrick Leahey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial and temporal control of ion bias voltage for plasma processing
- Patent number 10,707,055
- Issue date Jul 7, 2020
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronized pulsing of plasma processing source and substrate bias
- Patent number 10,607,813
- Issue date Mar 31, 2020
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System architecture for combined static and pass-by processing
- Patent number 9,914,994
- Issue date Mar 13, 2018
- Intevac, Inc.
- Patrick Leahey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for transporting and processing substrates
- Patent number 9,524,896
- Issue date Dec 20, 2016
- Brooks Automation Inc.
- Terry Bluck
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for real time positioning of a substrate in a vac...
- Patent number 9,111,979
- Issue date Aug 18, 2015
- Kevin P Fairbairn
- G05 - CONTROLLING REGULATING
Information Patent Grant
High throughput load lock for solar wafers
- Patent number 8,998,553
- Issue date Apr 7, 2015
- Intevac, Inc.
- Vinay Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for commercial fabrication of patterned media
- Patent number 8,349,196
- Issue date Jan 8, 2013
- Intevac, Inc.
- Kevin P. Fairbairn
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatus and methods for transporting and processing substrates
- Patent number 8,303,764
- Issue date Nov 6, 2012
- Brooks Automation, Inc.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for transporting and processing substrates
- Patent number 8,293,066
- Issue date Oct 23, 2012
- Brooks Automation, Inc.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaporative system for solar cell fabrication
- Patent number 8,087,380
- Issue date Jan 3, 2012
- Intevac, Inc.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for transporting and processing substrates
- Patent number 7,901,539
- Issue date Mar 8, 2011
- Intevac, Inc.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tandem process chamber
- Patent number 7,655,092
- Issue date Feb 2, 2010
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Backside imaging through a doped layer
- Patent number 7,479,686
- Issue date Jan 20, 2009
- Intevac, Inc.
- Kenneth A Costello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,335,462
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,223,526
- Issue date May 29, 2007
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Backside thinning of image array devices
- Patent number 7,042,060
- Issue date May 9, 2006
- Intevac, Inc.
- Kenneth A Costello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside thinning of image array devices
- Patent number 7,005,637
- Issue date Feb 28, 2006
- Intevac, Inc.
- Kenneth A Costello
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS
- Publication number 20240079213
- Publication date Mar 7, 2024
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF BIAS SUPPLIES
- Publication number 20230395355
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS
- Publication number 20230268162
- Publication date Aug 24, 2023
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20230116058
- Publication date Apr 13, 2023
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20220285131
- Publication date Sep 8, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210241996
- Publication date Aug 5, 2021
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...
- Publication number 20210134562
- Publication date May 6, 2021
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM
- Publication number 20210074513
- Publication date Mar 11, 2021
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210005428
- Publication date Jan 7, 2021
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...
- Publication number 20200203128
- Publication date Jun 25, 2020
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNCHRONIZATION WITH A BIAS SUPPLY IN A PLASMA PROCESSING SYSTEM
- Publication number 20190172685
- Publication date Jun 6, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZED PULSING OF PLASMA PROCESSING SOURCE AND SUBSTRATE BIAS
- Publication number 20190157040
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPATIAL AND TEMPORAL CONTROL OF ION BIAS VOLTAGE FOR PLASMA PROCESSING
- Publication number 20190157043
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM
- Publication number 20190157041
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA PROCESSING SYSTEMS THAT INCLUDE PLASMA MODULATING...
- Publication number 20190157042
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM ARCHITECTURE FOR COMBINED STATIC AND PASS-BY PROCESSING
- Publication number 20180171463
- Publication date Jun 21, 2018
- INTEVAC, INC.
- Patrick Leahey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Real Time Positioning of a Substrate in a Vac...
- Publication number 20170004987
- Publication date Jan 5, 2017
- Kevin P. Fairbairn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Real Time Positioning of a Substrate in a Vac...
- Publication number 20140340509
- Publication date Nov 20, 2014
- Kevin P Fairbairn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM ARCHITECTURE FOR COMBINED STATIC AND PASS-BY PROCESSING
- Publication number 20130161183
- Publication date Jun 27, 2013
- INTEVAC, INC.
- Patrick Leahey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH THROUGHPUT LOAD LOCK FOR SOLAR WAFERS
- Publication number 20130149075
- Publication date Jun 13, 2013
- INTEVAC, INC.
- Vinay Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA
- Publication number 20130098761
- Publication date Apr 25, 2013
- INTEVAC, INC.
- Kevin P. Fairbairn
- G11 - INFORMATION STORAGE
Information Patent Application
SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA
- Publication number 20120090992
- Publication date Apr 19, 2012
- INTEVAC, INC.
- Kevin P. Fairbairn
- G11 - INFORMATION STORAGE
Information Patent Application
FULL-ENCLOSURE, CONTROLLED-FLOW MINI-ENVIRONMENT FOR THIN FILM CHAM...
- Publication number 20110303148
- Publication date Dec 15, 2011
- Jun XIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES
- Publication number 20110158773
- Publication date Jun 30, 2011
- INTEVAC, INC.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVAPORATIVE SYSTEM FOR SOLAR CELL FABRICATION
- Publication number 20110104847
- Publication date May 5, 2011
- INTEVAC, INC.
- Terry BLUCK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES
- Publication number 20090191030
- Publication date Jul 30, 2009
- INTEVAC, INC.
- Terry Bluck
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA
- Publication number 20090145879
- Publication date Jun 11, 2009
- INTEVAC, INC.
- Kevin P. Fairbairn
- G11 - INFORMATION STORAGE
Information Patent Application
APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES
- Publication number 20090078374
- Publication date Mar 26, 2009
- INTEVAC, INC.
- Terry Bluck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tandem process chamber
- Publication number 20080105202
- Publication date May 8, 2008
- APPLIED MATERIALS, INC.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kevin P. Fairbairn

Person

Patents Grantslast 30 patents

Synchronization of bias supplies

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

Spatial monitoring and control of plasma processing environments

Synchronization between an excitation source and a substrate bias s...

Spatial monitoring and control of plasma processing environments

Spatial monitoring and control of plasma processing environments

Application of modulating supplies in a plasma processing system

Synchronization between an excitation source and a substrate bias s...

Application of modulating supplies in a plasma processing system

Control of plasma processing systems that include plasma modulating...

Synchronization with a bias supply in a plasma processing system

System architecture for combined static and pass-by processing

Spatial and temporal control of ion bias voltage for plasma processing

Synchronized pulsing of plasma processing source and substrate bias

System architecture for combined static and pass-by processing

Apparatus and methods for transporting and processing substrates

System and method for real time positioning of a substrate in a vac...

High throughput load lock for solar wafers

System and method for commercial fabrication of patterned media

Apparatus and methods for transporting and processing substrates

Apparatus and methods for transporting and processing substrates

Evaporative system for solar cell fabrication

Apparatus and methods for transporting and processing substrates

Tandem process chamber

Backside imaging through a doped layer

Method of depositing an amorphous carbon layer

Method of depositing an amorphous carbon layer

Backside thinning of image array devices

Backside thinning of image array devices

Patents Applicationslast 30 patents

SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SYNCHRONIZATION OF BIAS SUPPLIES

SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS

SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...

APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...

SYNCHRONIZATION WITH A BIAS SUPPLY IN A PLASMA PROCESSING SYSTEM

SYNCHRONIZED PULSING OF PLASMA PROCESSING SOURCE AND SUBSTRATE BIAS

SPATIAL AND TEMPORAL CONTROL OF ION BIAS VOLTAGE FOR PLASMA PROCESSING

APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM

CONTROL OF PLASMA PROCESSING SYSTEMS THAT INCLUDE PLASMA MODULATING...

SYSTEM ARCHITECTURE FOR COMBINED STATIC AND PASS-BY PROCESSING

System and Method for Real Time Positioning of a Substrate in a Vac...

System and Method for Real Time Positioning of a Substrate in a Vac...

SYSTEM ARCHITECTURE FOR COMBINED STATIC AND PASS-BY PROCESSING

HIGH THROUGHPUT LOAD LOCK FOR SOLAR WAFERS

SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA

SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA

FULL-ENCLOSURE, CONTROLLED-FLOW MINI-ENVIRONMENT FOR THIN FILM CHAM...

APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES

EVAPORATIVE SYSTEM FOR SOLAR CELL FABRICATION

APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES

SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA

APPARATUS AND METHODS FOR TRANSPORTING AND PROCESSING SUBSTRATES

Tandem process chamber