Kimihiro Higuchi

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processor and plasma processing method
- Patent number 9,728,381
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 9,437,402
- Issue date Sep 6, 2016
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 8,904,957
- Issue date Dec 9, 2014
- Tokyo Electron Limited
- Akihiro Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor and plasma processing method
- Patent number 8,387,562
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface processing method for mounting stage
- Patent number 8,343,372
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Tadashi Aoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,287,750
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma procesor and plasma processing method
- Patent number 8,056,503
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,799,238
- Issue date Sep 21, 2010
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,713,431
- Issue date May 11, 2010
- Tokyo Electron Limited
- Tomoaki Ukei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,541,283
- Issue date Jun 2, 2009
- Tokyo Electron Limited
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for bilayer photoresist dry development
- Patent number 7,465,673
- Issue date Dec 16, 2008
- Tokyo Electron Limited
- Yoshiki Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,335,278
- Issue date Feb 26, 2008
- Tokyo Electron AT Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,676,804
- Issue date Jan 13, 2004
- Tokyo Electron AT Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and devices for detecting the end point of plasma process
- Patent number 5,980,767
- Issue date Nov 9, 1999
- Tokyo Electron Limited
- Chishio Koshimizu
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing method, plasma processing apparatus, and plasma g...
- Patent number 5,783,492
- Issue date Jul 21, 1998
- Tokyo Electron Limited
- Kimihiro Higuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20150083332
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20150083333
- Publication date Mar 26, 2015
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20130174983
- Publication date Jul 11, 2013
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
- Publication number 20120006492
- Publication date Jan 12, 2012
- TOKYO ELECTRON LIMITED
- Akihiro KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...
- Publication number 20110240221
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Takashi Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20100112819
- Publication date May 6, 2010
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20090212017
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING METHOD FOR MOUNTING STAGE
- Publication number 20080237030
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Tadashi Aoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitive coupling plasma processing apparatus
- Publication number 20060081337
- Publication date Apr 20, 2006
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050274321
- Publication date Dec 15, 2005
- TOKYO ELECTRON LIMITED
- Tomoaki Ukei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20050172904
- Publication date Aug 11, 2005
- Tokyo Electron AT Limited and Japan Science and Technology Corporation
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20050142873
- Publication date Jun 30, 2005
- TOKYO ELECTRON LIMITED
- Toshihiko Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for bilayer photoresist dry development
- Publication number 20040185380
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Yoshiki Igarashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma procesor and plasma processing method
- Publication number 20040177927
- Publication date Sep 16, 2004
- Akihiro Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kimihiro Higuchi

Person

Patents Grantslast 30 patents

Plasma processor and plasma processing method

Plasma processor and plasma processing method

Plasma processor and plasma processing method

Plasma processor and plasma processing method

Surface processing method for mounting stage

Plasma processing method and plasma processing apparatus

Plasma procesor and plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing method

Plasma processing method and plasma processing apparatus

Method and apparatus for bilayer photoresist dry development

Plasma processing apparatus and plasma processing method

Method and apparatus for plasma processing

Method and devices for detecting the end point of plasma process

Plasma processing method, plasma processing apparatus, and plasma g...

Patents Applicationslast 30 patents

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSOR AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SURFACE PROCESSING METHOD FOR MOUNTING STAGE

Capacitive coupling plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Method and apparatus for bilayer photoresist dry development

Plasma procesor and plasma processing method