Kimiya Aoki

Person

Musashino, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for processing polysilazane film
- Patent number 8,122,850
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidizing method and oxidizing unit for object to be processed
- Patent number 7,926,445
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon oxide film
- Patent number 7,700,156
- Issue date Apr 20, 2010
- Tokyo Electron Limited
- Kimiya Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing polysilazane film
- Patent number 7,563,481
- Issue date Jul 21, 2009
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidizing method and oxidizing unit for object to be processed
- Patent number 7,304,003
- Issue date Dec 4, 2007
- Tokyo Electron Limited
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide film forming method
- Patent number 7,064,084
- Issue date Jun 20, 2006
- Tokyo Electron Limited
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of oxidizing work pieces and oxidation system
- Patent number 6,869,892
- Issue date Mar 22, 2005
- Tokyo Electron Limited
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten silicide film
- Patent number 6,245,673
- Issue date Jun 12, 2001
- Tokyo Electron Limited
- Kazuya Okubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20220139942
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Genji NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING POLYSILAZANE FILM
- Publication number 20090263292
- Publication date Oct 22, 2009
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidizing method and oxidizing unit for object to be processed
- Publication number 20080056967
- Publication date Mar 6, 2008
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for processing polysilazane film
- Publication number 20070231484
- Publication date Oct 4, 2007
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of oxidizing object to be processed and oxidation system
- Publication number 20060003542
- Publication date Jan 5, 2006
- Keisuke Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidizing method and oxidizing unit for object to be processed
- Publication number 20050272269
- Publication date Dec 8, 2005
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxidizing method and oxidizing unit for object to be processed
- Publication number 20050241578
- Publication date Nov 3, 2005
- Kimiya Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for forming silicon oxide film
- Publication number 20050056220
- Publication date Mar 17, 2005
- Kimiya Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxide film forming method
- Publication number 20040087180
- Publication date May 6, 2004
- Shingo Hishiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation apparatus and method of cleaning the same
- Publication number 20020020433
- Publication date Feb 21, 2002
- Asami Suemura
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

Kimiya Aoki

Person

Patents Grantslast 30 patents

Method and apparatus for processing polysilazane film

Oxidizing method and oxidizing unit for object to be processed

Method and apparatus for forming silicon oxide film

Method and apparatus for processing polysilazane film

Oxidizing method and oxidizing unit for object to be processed

Oxide film forming method

Method of oxidizing work pieces and oxidation system

Method of forming tungsten silicide film

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR PROCESSING POLYSILAZANE FILM

Oxidizing method and oxidizing unit for object to be processed

Method and apparatus for processing polysilazane film

Method of oxidizing object to be processed and oxidation system

Oxidizing method and oxidizing unit for object to be processed

Oxidizing method and oxidizing unit for object to be processed

Method and apparatus for forming silicon oxide film

Oxide film forming method

Oxidation apparatus and method of cleaning the same