Kirk J. Strozewski

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Round Rock, TX, US

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Patents Grantslast 30 patents

Information Patent Grant
Layout modification using multilayer-based constraints
- Patent number 7,284,231
- Issue date Oct 16, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Kevin D. Lucas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography correction method and device
- Patent number 6,783,904
- Issue date Aug 31, 2004
- FREESCALE SEMICONDUCTOR, INC.
- Kirk J. Strozewski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Immersion Lithography Technique And Product Using A Protection Laye...
- Publication number 20080171285
- Publication date Jul 17, 2008
- Freescales Semiconductor, Inc.
- Kyle Patterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Layout modification using multilayer-based constraints
- Publication number 20060136861
- Publication date Jun 22, 2006
- Kevin D. Lucas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography correction method and device
- Publication number 20030213613
- Publication date Nov 20, 2003
- Kirk J. Strozewski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY