Kiyomi Koyama

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
LSI mask manufacturing system, LSI mask manufacturing method and LS...
- Patent number 7,047,094
- Issue date May 16, 2006
- Kabushiki Kaisha Toshiba
- Kiyomi Koyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Impregnated-type cathode substrate with large particle diameter low...
- Patent number 6,447,355
- Issue date Sep 10, 2002
- Kabushiki Kaisha Toshiba
- Eiichirou Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impregnated-type cathode substrate with large particle diameter low...
- Patent number 6,304,024
- Issue date Oct 16, 2001
- Kabushiki Kaisha Toshiba
- Eiichirou Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction system
- Patent number 6,077,310
- Issue date Jun 20, 2000
- Kabushiki Kaisha Toshiba
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating exposure data for lithographic apparatus
- Patent number 6,047,116
- Issue date Apr 4, 2000
- Kabushiki Kaisha Toshiba
- Eiji Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impregnated type cathode assembly, cathode substrate for use in the...
- Patent number 6,034,469
- Issue date Mar 7, 2000
- Kabushiki Kaisha Toshiba
- Eiichirou Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for designing Levenson photomask
- Patent number 6,004,701
- Issue date Dec 21, 1999
- Kabushiki Kaisha Toshiba
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method
- Patent number 5,879,844
- Issue date Mar 9, 1999
- Kabushiki Kaisha Toshiba
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and a system for designing a photomask for use in manufactur...
- Patent number 5,795,683
- Issue date Aug 18, 1998
- Kabushiki Kaisha Toshiba
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for designing photomasks
- Patent number 5,761,075
- Issue date Jun 2, 1998
- Kabushiki Kaisha Toshiba
- Kazuko Oi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for designing photomasks
- Patent number 5,541,025
- Issue date Jul 30, 1996
- Kabushiki Kaisha Toshiba
- Kazuko Oi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for designing phase-shifting masks with automatization capab...
- Patent number 5,538,815
- Issue date Jul 23, 1996
- Kabushiki Kaisha Toshiba
- Kazuko Oi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged-beam exposure system
- Patent number 4,914,304
- Issue date Apr 3, 1990
- Kabushiki Kaisha Toshiba
- Kiyomi Koyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam lithographic apparatus
- Patent number 4,538,232
- Issue date Aug 27, 1985
- Tokyo Shibaura Denki Kabushiki Kaisha
- Kiyomi Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam pattern generation system
- Patent number 4,531,191
- Issue date Jul 23, 1985
- Tokyo Shibaura Denki Kabushiki Kaisha
- Kiyomi Koyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LSI mask manufacturing system, LSI mask manufacturing method and LS...
- Publication number 20030188289
- Publication date Oct 2, 2003
- Kiyomi Koyama
- G06 - COMPUTING CALCULATING COUNTING

Kiyomi Koyama

Person

Patents Grantslast 30 patents

LSI mask manufacturing system, LSI mask manufacturing method and LS...

Impregnated-type cathode substrate with large particle diameter low...

Impregnated-type cathode substrate with large particle diameter low...

Optical proximity correction system

Method for generating exposure data for lithographic apparatus

Impregnated type cathode assembly, cathode substrate for use in the...

Method for designing Levenson photomask

Optical proximity correction method

Method and a system for designing a photomask for use in manufactur...

Apparatus for designing photomasks

Method and apparatus for designing photomasks

Method for designing phase-shifting masks with automatization capab...

Charged-beam exposure system

Electron-beam lithographic apparatus

Electron beam pattern generation system

Patents Applicationslast 30 patents

LSI mask manufacturing system, LSI mask manufacturing method and LS...