Kiyoshi Satoh

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas-introducing system and plasma CVD apparatus
- Patent number 7,718,004
- Issue date May 18, 2010
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus with lift pin structure
- Patent number 7,638,003
- Issue date Dec 29, 2009
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor-processing apparatus provided with self-cleaning device
- Patent number 7,534,469
- Issue date May 19, 2009
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus
- Patent number 7,520,244
- Issue date Apr 21, 2009
- ASM Japan K.K.
- Takayuki Yamagishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-carbon-doped silicon oxide film and damascene structure using same
- Patent number 7,271,093
- Issue date Sep 18, 2007
- ASM Japan K.K.
- Chou San Nelson Loke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming silicon carbide films
- Patent number 7,238,393
- Issue date Jul 3, 2007
- ASM Japan K.K.
- Kamal Kishore Goundar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing silicon carbide film
- Patent number 6,991,959
- Issue date Jan 31, 2006
- ASM Japan K.K.
- Kamal Kishore Goundar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing silicon carbide film
- Patent number 6,919,270
- Issue date Jul 19, 2005
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming integrated dielectric layers
- Patent number 6,815,332
- Issue date Nov 9, 2004
- ASM Japan K.K.
- Nelson Loke Chou San
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning a CVD reaction chamber using an active oxygen sp...
- Patent number 6,767,836
- Issue date Jul 27, 2004
- ASM Japan K.K.
- Nelson Loke Chou San
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor substrate-supporting apparatus
- Patent number 6,761,771
- Issue date Jul 13, 2004
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor-processing device provided with a remote plasma sourc...
- Patent number 6,736,147
- Issue date May 18, 2004
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing apparatus with substrate-supporting mechanism
- Patent number 6,435,798
- Issue date Aug 20, 2002
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for forming thin film
- Patent number 6,235,112
- Issue date May 22, 2001
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate-supporting device for semiconductor processing
- Patent number 6,113,704
- Issue date Sep 5, 2000
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor for plasma CVD equipment and process for producing the same
- Patent number 6,063,203
- Issue date May 16, 2000
- ASM Japan K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF SELF-CLEANING OF CARBON-BASED FILM
- Publication number 20090090382
- Publication date Apr 9, 2009
- ASM JAPAN K.K.
- Yoshinori Morisada
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING WITH A REMOTE PLASMA SOURCE FOR SELF-CLEANING
- Publication number 20070227554
- Publication date Oct 4, 2007
- ASM JAPAN K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing apparatus with lift pin structure
- Publication number 20070160507
- Publication date Jul 12, 2007
- ASM JAPAN K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor-processing apparatus provided with self-cleaning device
- Publication number 20060228473
- Publication date Oct 12, 2006
- ASM JAPAN K.K.
- Kiyoshi Satoh
- B08 - CLEANING
Information Patent Application
Gas-introducing system and plasma CVD apparatus
- Publication number 20060090700
- Publication date May 4, 2006
- ASM JAPAN K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low-carbon-doped silicon oxide film and damascene structure using same
- Publication number 20050260850
- Publication date Nov 24, 2005
- ASM JAPAN K.K.
- Chou San Nelson Loke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method of CVD chamber cleaning
- Publication number 20050178333
- Publication date Aug 18, 2005
- ASM JAPAN K.K.
- Chou San Nelson Loke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin-film forming apparatus having an automatic cleaning function f...
- Publication number 20050139578
- Publication date Jun 30, 2005
- ASM JAPAN K.K.
- Hideaki Fukuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Source gas flow control and CVD using same
- Publication number 20050098906
- Publication date May 12, 2005
- ASM JAPAN K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment apparatus
- Publication number 20040194709
- Publication date Oct 7, 2004
- ASM JAPAN K.K.
- Takayuki Yamagishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming silicon carbide films
- Publication number 20040161535
- Publication date Aug 19, 2004
- Kamal Kishore Goundar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing with a remote plasma source for self-cleaning
- Publication number 20040144400
- Publication date Jul 29, 2004
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing device provided with a remote plasma sourc...
- Publication number 20040144489
- Publication date Jul 29, 2004
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing silicon carbide film
- Publication number 20040115876
- Publication date Jun 17, 2004
- ASM JAPAN K.K.
- Kamal Kishore Goundar
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for forming integrated dielectric layers
- Publication number 20040087179
- Publication date May 6, 2004
- ASM JAPAN K.K.
- Nelson Loke Chou San
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing silicon carbide film
- Publication number 20040076767
- Publication date Apr 22, 2004
- ASM JAPAN K.K.
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming a film on a semiconductor substrate
- Publication number 20040043626
- Publication date Mar 4, 2004
- Nelson Loke Chou San
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor substrate-supporting apparatus
- Publication number 20020162630
- Publication date Nov 7, 2002
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor-processing device provided with a remote plasma sourc...
- Publication number 20020011210
- Publication date Jan 31, 2002
- Kiyoshi Satoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kiyoshi Satoh

Person

Patents Grantslast 30 patents

Gas-introducing system and plasma CVD apparatus

Semiconductor processing apparatus with lift pin structure

Semiconductor-processing apparatus provided with self-cleaning device

Plasma treatment apparatus

Low-carbon-doped silicon oxide film and damascene structure using same

Method of forming silicon carbide films

Method of manufacturing silicon carbide film

Method of manufacturing silicon carbide film

Method for forming integrated dielectric layers

Method of cleaning a CVD reaction chamber using an active oxygen sp...

Semiconductor substrate-supporting apparatus

Semiconductor-processing device provided with a remote plasma sourc...

Semiconductor processing apparatus with substrate-supporting mechanism

Apparatus and method for forming thin film

Substrate-supporting device for semiconductor processing

Susceptor for plasma CVD equipment and process for producing the same

Patents Applicationslast 30 patents

METHOD OF SELF-CLEANING OF CARBON-BASED FILM

SEMICONDUCTOR PROCESSING WITH A REMOTE PLASMA SOURCE FOR SELF-CLEANING

Semiconductor processing apparatus with lift pin structure

Semiconductor-processing apparatus provided with self-cleaning device

Gas-introducing system and plasma CVD apparatus

Low-carbon-doped silicon oxide film and damascene structure using same

System and method of CVD chamber cleaning

Thin-film forming apparatus having an automatic cleaning function f...

Source gas flow control and CVD using same

Plasma treatment apparatus

Method of forming silicon carbide films

Semiconductor processing with a remote plasma source for self-cleaning

Semiconductor processing device provided with a remote plasma sourc...

Method of manufacturing silicon carbide film

Method for forming integrated dielectric layers

Method of manufacturing silicon carbide film

Method of forming a film on a semiconductor substrate

Semiconductor substrate-supporting apparatus

Semiconductor-processing device provided with a remote plasma sourc...