Klaus Becker

Person

Kensington, NH, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cyclotron having continuously variable energy output
- Patent number 12,106,925
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drift tube electrode arrangement having direct current optics
- Patent number 12,096,548
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Wai-Ming Tam
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Shield for filament in an ion source
- Patent number 12,046,443
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced sputter targets for ion generation
- Patent number 11,542,594
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insertable target holder for solid dopant materials
- Patent number 11,404,254
- Issue date Aug 2, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Shreyansh Patel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced sputter targets for ion generation
- Patent number 11,008,649
- Issue date May 18, 2021
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source with multiple configurations
- Patent number 10,896,799
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,692,697
- Issue date Jun 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source crucible for solid feed materials
- Patent number 10,600,611
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source for enhanced ionization
- Patent number 10,290,461
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel R. Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for decelerated ion beam with no energy co...
- Patent number 10,147,584
- Issue date Dec 4, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source for multiple charged species
- Patent number 9,818,570
- Issue date Nov 14, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Alvarado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode, accelerator column and ion implantation apparatus includ...
- Patent number 9,807,864
- Issue date Oct 31, 2017
- Varian Semiconductor Equipment Associates Inc.
- Christopher Lupoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source for enhanced ionization
- Patent number 9,691,584
- Issue date Jun 27, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel R. Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current limiter for high voltage power supply used with ion implant...
- Patent number 8,766,209
- Issue date Jul 1, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Klaus Becker
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Conductive contamination resistant insulator
- Patent number 8,227,772
- Issue date Jul 24, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combination load lock for handling workpieces
- Patent number 7,828,504
- Issue date Nov 9, 2010
- Axcellis Technologies, Inc.
- Michel Pharand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-cost electrostatic clamp with fast de-clamp time
- Patent number 7,714,406
- Issue date May 11, 2010
- Axcelis Technologies, Inc.
- Marvin Raymond LaFontaine
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Ion source for use in an ion implanter
- Patent number 7,105,840
- Issue date Sep 12, 2006
- Axcelis Technologies, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam measurement systems and methods for ion implant dose and u...
- Patent number 6,992,309
- Issue date Jan 31, 2006
- Axcelis Technologies, Inc.
- Klaus Petry
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS
- Publication number 20240098871
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Wai-Ming Tam
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CYCLOTRON HAVING CONTINUOUSLY VARIABLE ENERGY OUTPUT
- Publication number 20230207247
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shield For Filament In An Ion Source
- Publication number 20230162941
- Publication date May 25, 2023
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Sputter Targets For Ion Generation
- Publication number 20210238732
- Publication date Aug 5, 2021
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Sputter Targets For Ion Generation
- Publication number 20200157675
- Publication date May 21, 2020
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Insertable Target Holder For Solid Dopant Materials
- Publication number 20200090916
- Publication date Mar 19, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Shreyansh Patel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source Crucible For Solid Feed Materials
- Publication number 20190180971
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source For Enhanced Ionization
- Publication number 20190122851
- Publication date Apr 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Daniel R. Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20190051493
- Publication date Feb 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...
- Publication number 20180269033
- Publication date Sep 20, 2018
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Source For Multiple Charged Species
- Publication number 20170117113
- Publication date Apr 27, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Daniel Alvarado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT LIMITER FOR HIGH VOLTAGE POWER SUPPLY USED WITH ION IMPLANT...
- Publication number 20130020940
- Publication date Jan 24, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Klaus Becker
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Conductive Contamination Resistant Insulator
- Publication number 20100108915
- Publication date May 6, 2010
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-COST ELECTROSTATIC CLAMP WITH FAST DE-CLAMP TIME
- Publication number 20080100984
- Publication date May 1, 2008
- Marvin Raymond LaFontaine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Combination load lock for handling workpieces
- Publication number 20070264105
- Publication date Nov 15, 2007
- Axcelis Technologies Inc.
- Michel Pharand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE FOR USE IN AN ION IMPLANTER
- Publication number 20060169921
- Publication date Aug 3, 2006
- Axcelis Technologies, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND U...
- Publication number 20060033045
- Publication date Feb 16, 2006
- Klaus Petry
- H01 - BASIC ELECTRIC ELEMENTS

Klaus Becker

Person

Patents Grantslast 30 patents

Cyclotron having continuously variable energy output

Drift tube electrode arrangement having direct current optics

Shield for filament in an ion source

Advanced sputter targets for ion generation

Insertable target holder for solid dopant materials

Advanced sputter targets for ion generation

Ion source with multiple configurations

Apparatus and techniques for decelerated ion beam with no energy co...

Ion source crucible for solid feed materials

Ion source for enhanced ionization

Apparatus and techniques for decelerated ion beam with no energy co...

Ion source for multiple charged species

Electrode, accelerator column and ion implantation apparatus includ...

Ion source for enhanced ionization

Current limiter for high voltage power supply used with ion implant...

Conductive contamination resistant insulator

Combination load lock for handling workpieces

Low-cost electrostatic clamp with fast de-clamp time

Ion source for use in an ion implanter

Ion beam measurement systems and methods for ion implant dose and u...

Patents Applicationslast 30 patents

DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS

CYCLOTRON HAVING CONTINUOUSLY VARIABLE ENERGY OUTPUT

Shield For Filament In An Ion Source

Advanced Sputter Targets For Ion Generation

Advanced Sputter Targets For Ion Generation

Insertable Target Holder For Solid Dopant Materials

Ion Source Crucible For Solid Feed Materials

Ion Source For Enhanced Ionization

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...

APPARATUS AND TECHNIQUES FOR DECELERATED ION BEAM WITH NO ENERGY CO...

Ion Source For Multiple Charged Species

CURRENT LIMITER FOR HIGH VOLTAGE POWER SUPPLY USED WITH ION IMPLANT...

Conductive Contamination Resistant Insulator

LOW-COST ELECTROSTATIC CLAMP WITH FAST DE-CLAMP TIME

Combination load lock for handling workpieces

ION SOURCE FOR USE IN AN ION IMPLANTER

ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND U...