Ko Miyazaki

Person

Kodaira, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a semiconductor integrated circuit that inclu...
- Patent number 7,361,530
- Issue date Apr 22, 2008
- Renesas Technology Corporation
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor integrated circuit that inclu...
- Patent number 7,205,222
- Issue date Apr 17, 2007
- Renesas Technology Corp.
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 6,958,292
- Issue date Oct 25, 2005
- Renesas Technology Corp.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 6,936,406
- Issue date Aug 30, 2005
- Renesas Technology Corp.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 6,902,868
- Issue date Jun 7, 2005
- Renesas Technology Corp.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND M...
- Patent number 6,849,540
- Issue date Feb 1, 2005
- Renesas Technology Corp.
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of photomask and photomask
- Patent number 6,846,598
- Issue date Jan 25, 2005
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing integrated circuit
- Patent number 6,794,207
- Issue date Sep 21, 2004
- Renesas Technology Corp.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 6,665,858
- Issue date Dec 16, 2003
- Hitachi, Ltd.
- Ko Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of photomask and photomask
- Patent number 6,656,644
- Issue date Dec 2, 2003
- Hitachi Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design method for logic circuit, design support system for logic ci...
- Patent number 6,622,292
- Issue date Sep 16, 2003
- Hitachi, Ltd.
- Ko Miyazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Manufacturing use of photomasks with an opaque pattern comprising a...
- Patent number 6,596,656
- Issue date Jul 22, 2003
- Hitachi, Ltd.
- Toshihiko Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Graphic display apparatus
- Patent number 5,159,664
- Issue date Oct 27, 1992
- Hitachi Ltd.
- Tetsuya Yamamoto
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR CIRCUIT DEVICE, WIRING METHOD FOR SEMICONDUCTOR CIRCU...
- Publication number 20090039520
- Publication date Feb 12, 2009
- RENESAS TECHNOLOGY CORP.
- Teruya Tanaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of fabricating a semiconductor integrated circuit that inclu...
- Publication number 20070155052
- Publication date Jul 5, 2007
- RENESAS TECHNOLOGY CORP.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing semiconductor integrated circuit device and met...
- Publication number 20050112504
- Publication date May 26, 2005
- RENESAS TECHNOLOGY CORP.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of photomask and photomask
- Publication number 20040086789
- Publication date May 6, 2004
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing use of photomasks with an opaque pattern comprising a...
- Publication number 20030207521
- Publication date Nov 6, 2003
- Hitachi, Ltd.
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing integrated circuit
- Publication number 20030180670
- Publication date Sep 25, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing integrated circuit
- Publication number 20030148608
- Publication date Aug 7, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing integrated circuit
- Publication number 20030148549
- Publication date Aug 7, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing integrated circuit
- Publication number 20030148635
- Publication date Aug 7, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing semiconductor integrated circuit device and met...
- Publication number 20030109126
- Publication date Jun 12, 2003
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20020078430
- Publication date Jun 20, 2002
- Ko Miyazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20020052122
- Publication date May 2, 2002
- Toshihiko Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Fabrication method of semiconductor integrated circuit device
- Publication number 20020042007
- Publication date Apr 11, 2002
- Ko Miyazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design method for logic circuit, design support system for logic ci...
- Publication number 20020032894
- Publication date Mar 14, 2002
- Hitachi, Ltd.
- Ko Miyazaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Manufacturing method of photomask and photomask
- Publication number 20020006555
- Publication date Jan 17, 2002
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ko Miyazaki

Person

Patents Grantslast 30 patents

Method of fabricating a semiconductor integrated circuit that inclu...

Method of fabricating a semiconductor integrated circuit that inclu...

Method of manufacturing integrated circuit

Method of manufacturing integrated circuit

Method of manufacturing integrated circuit

METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND M...

Manufacturing method of photomask and photomask

Method of manufacturing integrated circuit

Manufacturing method of semiconductor device

Manufacturing method of photomask and photomask

Design method for logic circuit, design support system for logic ci...

Manufacturing use of photomasks with an opaque pattern comprising a...

Graphic display apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR CIRCUIT DEVICE, WIRING METHOD FOR SEMICONDUCTOR CIRCU...

Method of fabricating a semiconductor integrated circuit that inclu...

Method of producing semiconductor integrated circuit device and met...

Manufacturing method of photomask and photomask

Manufacturing use of photomasks with an opaque pattern comprising a...

Method of manufacturing integrated circuit

Method of manufacturing integrated circuit

Method of manufacturing integrated circuit

Method of manufacturing integrated circuit

Method of producing semiconductor integrated circuit device and met...

Manufacturing method of semiconductor device

Method of manufacturing a semiconductor device

Fabrication method of semiconductor integrated circuit device

Design method for logic circuit, design support system for logic ci...

Manufacturing method of photomask and photomask