Kohichi Orito

Person

Oshu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 9,580,802
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus, substrate processing apparatus, film dep...
- Patent number 9,416,448
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate process apparatus, substrate process method, and computer...
- Patent number 8,746,170
- Issue date Jun 10, 2014
- Tokyo Electron Limited
- Kohichi Orito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus
- Patent number 8,721,790
- Issue date May 13, 2014
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removal of metal contaminant deposited on quartz member of vertical...
- Patent number 8,298,341
- Issue date Oct 30, 2012
- Tokyo Electron Limited
- Hitoshi Katoh
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20150184293
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...
- Publication number 20150184294
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...
- Publication number 20110159188
- Publication date Jun 30, 2011
- TOKYO ELECTRON LIMITED
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS
- Publication number 20110139074
- Publication date Jun 16, 2011
- TOKYO ELECTRON LIMITED
- HITOSHI KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESS APPARATUS, SUBSTRATE PROCESS METHOD, AND COMPUTER...
- Publication number 20110100489
- Publication date May 5, 2011
- TOKYO ELECTRON LIMITED
- Kohichi Orito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20110048326
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEP...
- Publication number 20100055297
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- HITOSHI KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVAL OF METAL CONTAMINANT DEPOSITED ON QUARTZ MEMBER OF VERTICAL...
- Publication number 20090293908
- Publication date Dec 3, 2009
- TOKYO ELECTRON LIMITED
- Hitoshi KATOH
- C03 - GLASS MINERAL OR SLAG WOOL

Kohichi Orito

Person

Patents Grantslast 30 patents

Film formation method and apparatus for semiconductor process

Film deposition apparatus, substrate processing apparatus, film dep...

Substrate process apparatus, substrate process method, and computer...

Film deposition apparatus

Removal of metal contaminant deposited on quartz member of vertical...

Patents Applicationslast 30 patents

FILM FORMATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...

FILM DEPOSITION APPARATUS

SUBSTRATE PROCESS APPARATUS, SUBSTRATE PROCESS METHOD, AND COMPUTER...

FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS

FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEP...

REMOVAL OF METAL CONTAMINANT DEPOSITED ON QUARTZ MEMBER OF VERTICAL...