Koichi Moriizumi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and process for pattern distortion detection for semicond...
- Patent number 6,343,370
- Issue date Jan 29, 2002
- Mitsubishi Denki Kabusiki Kaisha
- Hironobu Taoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for inhibiting pattern distortions to correct...
- Patent number 6,298,473
- Issue date Oct 2, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Yusaku Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
boundary processing of oblique overlapping graphics to achieve dime...
- Patent number 6,271,852
- Issue date Aug 7, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Kinya Kamiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing highly precise charged beam drawing data divide...
- Patent number 6,088,520
- Issue date Jul 11, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Hironobu Taoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern comparison inspection system and method employing gray leve...
- Patent number 6,069,971
- Issue date May 30, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Makoto Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam pattern data generating method and a charged beam patt...
- Patent number 5,812,412
- Issue date Sep 22, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Koichi Moriizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam drawing data production apparatus and charged...
- Patent number 5,796,408
- Issue date Aug 18, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Kinya Kamiyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure apparatus
- Patent number 5,153,441
- Issue date Oct 6, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Koichi Moriizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure method
- Patent number 5,086,398
- Issue date Feb 4, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Koichi Moriizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing drawing data for charged beam exposure system
- Patent number 5,008,830
- Issue date Apr 16, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Koichi Moriizumi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor memory cells having common contact hole
- Patent number 4,984,199
- Issue date Jan 8, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Masahiro Yoneda
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor memory device
- Patent number 4,887,137
- Issue date Dec 12, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Masahiro Yoneda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam pattern defect inspection apparatus
- Patent number 4,794,646
- Issue date Dec 27, 1988
- Mitsubishi Denki Kabushiki Kaisha
- Susumu Takeuchi
- G06 - COMPUTING CALCULATING COUNTING

Koichi Moriizumi

Person

Patents Grantslast 30 patents

Apparatus and process for pattern distortion detection for semicond...

Apparatus and method for inhibiting pattern distortions to correct...

boundary processing of oblique overlapping graphics to achieve dime...

Method of producing highly precise charged beam drawing data divide...

Pattern comparison inspection system and method employing gray leve...

Charged beam pattern data generating method and a charged beam patt...

Charged particle beam drawing data production apparatus and charged...

Electron-beam exposure apparatus

Electron beam exposure method

Method of preparing drawing data for charged beam exposure system

Semiconductor memory cells having common contact hole

Semiconductor memory device

Charged beam pattern defect inspection apparatus