Koichi YATSUDA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,557,661
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 11,495,490
- Issue date Nov 8, 2022
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a contact pad, method for manufacturing a...
- Patent number 11,171,050
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 11,120,999
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device, vacuum processing appar...
- Patent number 11,056,349
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of hard mask
- Patent number 11,004,684
- Issue date May 11, 2021
- Tokyo Electron Limited
- Mitsuaki Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 10,910,259
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming FinFET source/drain contact
- Patent number 10,840,359
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device, vacuum processing appar...
- Patent number 10,593,556
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,325,780
- Issue date Jun 18, 2019
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of hard mask, forming apparatus of hard mask and rec...
- Patent number 10,224,202
- Issue date Mar 5, 2019
- Tokyo Electron Limited
- Mitsuaki Iwashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 8,685,267
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method and storage medium
- Patent number 8,641,916
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming method of etching mask, control program and program storage...
- Patent number 8,198,183
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,114,781
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Eiichi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,871,908
- Issue date Jan 18, 2011
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 6,488,863
- Issue date Dec 3, 2002
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,156,151
- Issue date Dec 5, 2000
- Tokyo Electron Limited
- Mitsuaki Komino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20210118727
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20210020758
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20200381264
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Fabricating Semiconductor Device, Vacuum Processing Appar...
- Publication number 20200152475
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A CONTACT PAD, METHOD FOR MANUFACTURING A...
- Publication number 20200035553
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20190181039
- Publication date Jun 13, 2019
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF HARD MASK
- Publication number 20190157083
- Publication date May 23, 2019
- TOKYO ELECTRON LIMITED
- Mitsuaki Iwashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20190109205
- Publication date Apr 11, 2019
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20180158693
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE, VACUUM PROCESSING APPAR...
- Publication number 20180025917
- Publication date Jan 25, 2018
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF HARD MASK, FORMING APPARATUS OF HARD MASK AND REC...
- Publication number 20170287713
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Mitsuaki Iwashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150194441
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120190206
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20110318933
- Publication date Dec 29, 2011
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20110104901
- Publication date May 5, 2011
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCULAR RING-SHAPED MEMBER FOR PLASMA PROCESS AND PLASMA PROCESSIN...
- Publication number 20100300622
- Publication date Dec 2, 2010
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100220081
- Publication date Sep 2, 2010
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM
- Publication number 20100190350
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100144155
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METHOD OF ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE...
- Publication number 20090291560
- Publication date Nov 26, 2009
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method, manufacturing apparatus, control program and...
- Publication number 20090087990
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method, manufacturing apparatus, control program and...
- Publication number 20090087991
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Koichi YATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAG...
- Publication number 20090081565
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080003836
- Publication date Jan 3, 2008
- TOKYO ELECTRON LIMITED
- Eiichi NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20020084254
- Publication date Jul 4, 2002
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS

Koichi YATSUDA

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor device

Semiconductor device manufacturing method

Method for manufacturing a contact pad, method for manufacturing a...

Plasma etching method

Method of fabricating semiconductor device, vacuum processing appar...

Forming method of hard mask

Semiconductor device manufacturing method

Method of forming FinFET source/drain contact

Method of fabricating semiconductor device, vacuum processing appar...

Method of manufacturing semiconductor device

Forming method of hard mask, forming apparatus of hard mask and rec...

Substrate processing method

Plasma etching apparatus, plasma etching method and storage medium

Forming method of etching mask, control program and program storage...

Substrate processing method and substrate processing apparatus

Method of manufacturing semiconductor device

Plasma etching method

Plasma processing apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA ETCHING METHOD

Method of Fabricating Semiconductor Device, Vacuum Processing Appar...

METHOD FOR MANUFACTURING A CONTACT PAD, METHOD FOR MANUFACTURING A...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

FORMING METHOD OF HARD MASK

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF FABRICATING SEMICONDUCTOR DEVICE, VACUUM PROCESSING APPAR...

FORMING METHOD OF HARD MASK, FORMING APPARATUS OF HARD MASK AND REC...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

CIRCULAR RING-SHAPED MEMBER FOR PLASMA PROCESS AND PLASMA PROCESSIN...

PLASMA PROCESSING APPARATUS

PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

FORMING METHOD OF ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE...

Manufacturing method, manufacturing apparatus, control program and...

Manufacturing method, manufacturing apparatus, control program and...

METHOD FOR FORMING ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAG...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Plasma etching method