Koji Asakawa

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, polymer, pattern forming material, pattern forming method...
- Patent number 12,228,860
- Issue date Feb 18, 2025
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer material, composition, and method of manufacturing semicond...
- Patent number 12,018,107
- Issue date Jun 25, 2024
- Kioxia Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, polymer, pattern forming material, and manufacturing meth...
- Patent number 11,820,840
- Issue date Nov 21, 2023
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, polymer, pattern forming material, pattern forming method...
- Patent number 11,796,915
- Issue date Oct 24, 2023
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer for pattern forming material
- Patent number 11,639,402
- Issue date May 2, 2023
- Kioxia Corporation
- Norikatsu Sasao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Template, method for manufacturing template, and pattern formation...
- Patent number 11,548,208
- Issue date Jan 10, 2023
- Kioxia Corporation
- Koji Asakawa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern formation method and method of manufacturing semiconductor...
- Patent number 11,521,855
- Issue date Dec 6, 2022
- Kioxia Corporation
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern, method of manufacturing semiconductor de...
- Patent number 11,410,848
- Issue date Aug 9, 2022
- Kioxia Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern and method of manufacturing semiconductor...
- Patent number 11,393,671
- Issue date Jul 19, 2022
- Kioxia Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 11,378,885
- Issue date Jul 5, 2022
- Kioxia Corporation
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material and pattern forming method
- Patent number 11,320,736
- Issue date May 3, 2022
- Kioxia Corporation
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming material, composition for pattern formation, patter...
- Patent number 11,192,971
- Issue date Dec 7, 2021
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polymer material, composition, and method of manufacturing semicond...
- Patent number 11,192,972
- Issue date Dec 7, 2021
- TOSHIBA MEMORY CORPORATION
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, method of forming pat...
- Patent number 11,177,129
- Issue date Nov 16, 2021
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Template, method for manufacturing template, and pattern formation...
- Patent number 11,167,469
- Issue date Nov 9, 2021
- TOSHIBA MEMORY CORPORATION
- Koji Asakawa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern formation method, block copolymer, and pattern formation ma...
- Patent number 11,161,999
- Issue date Nov 2, 2021
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation method and pattern formation material
- Patent number 10,877,374
- Issue date Dec 29, 2020
- TOSHIBA MEMORY CORPORATION
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material, pattern forming method, and method for ma...
- Patent number 10,672,621
- Issue date Jun 2, 2020
- TOSHIBA MEMORY CORPORATION
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method
- Patent number 10,553,443
- Issue date Feb 4, 2020
- TOSHIBA MEMORY CORPORATION
- Tomoaki Sawabe
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern formation method
- Patent number 10,534,260
- Issue date Jan 14, 2020
- TOSHIBA MEMORY CORPORATION
- Tomoaki Sawabe
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Pattern antenna
- Patent number 10,141,637
- Issue date Nov 27, 2018
- MegaChips Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device
- Patent number 10,032,788
- Issue date Jul 24, 2018
- TOSHIBA MEMORY CORPORATION
- Shigeki Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hair removal tool
- Patent number 10,016,041
- Issue date Jul 10, 2018
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Takafumi Ohba
- A45 - HAND OR TRAVELLING ARTICLES
Information Patent Grant
Pattern antenna
- Patent number 9,905,915
- Issue date Feb 27, 2018
- MegaChips Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern antenna
- Patent number 9,780,454
- Issue date Oct 3, 2017
- MegaChips Corporation
- Koji Asakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method for manufacturing the same
- Patent number 9,685,321
- Issue date Jun 20, 2017
- Kabushiki Kaisha Toshiba
- Masaya Terai
- G11 - INFORMATION STORAGE
Information Patent Grant
Pattern forming method
- Patent number 9,659,816
- Issue date May 23, 2017
- Kabushiki Kaisha Toshiba
- Atsushi Hieno
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for manufacturing memory device and method for manufacturing...
- Patent number 9,608,203
- Issue date Mar 28, 2017
- Kabushiki Kaisha Toshiba
- Atsushi Hieno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile semiconductor memory device
- Patent number 9,548,373
- Issue date Jan 17, 2017
- Kabushiki Kaisha Toshiba
- Shigeki Hattori
- G11 - INFORMATION STORAGE
Information Patent Grant
Organic molecular memory
- Patent number 9,543,536
- Issue date Jan 10, 2017
- Kabushiki Kaisha Toshiba
- Yusuke Tanaka
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD...
- Publication number 20240004298
- Publication date Jan 4, 2024
- KIOXIA Corporation
- Norikatsu SASAO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METH...
- Publication number 20230220130
- Publication date Jul 13, 2023
- KIOXIA Corporation
- Norikatsu SASAO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING INDIUM-CONTAINING ORGANIC POLYMER FILM, PA...
- Publication number 20230086850
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Koji ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER...
- Publication number 20230089206
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Norikatsu SASAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20220221792
- Publication date Jul 14, 2022
- KIOXIA Corporation
- Ryosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD...
- Publication number 20220091510
- Publication date Mar 24, 2022
- KIOXIA Corporation
- Norikatsu SASAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20220049036
- Publication date Feb 17, 2022
- Toshiba Memory Corporation
- Koji ASAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND PATTERN FORMATION...
- Publication number 20220024114
- Publication date Jan 27, 2022
- Toshiba Memory Corporation
- Koji ASAKAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF FORMING PATTERN, METHOD OF MANUFACTURING SEMICONDUCTOR DE...
- Publication number 20210296116
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Koji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20210296117
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Ryosuke YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
- Publication number 20210141310
- Publication date May 13, 2021
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20210082693
- Publication date Mar 18, 2021
- KIOXIA Corporation
- Koji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METH...
- Publication number 20210070898
- Publication date Mar 11, 2021
- KIOXIA Corporation
- Norikatsu SASAO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD, BLOCK COPOLYMER, AND PATTERN FORMATION MA...
- Publication number 20210040345
- Publication date Feb 11, 2021
- Toshiba Memory Corporation
- Norikatsu SASAO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20200291156
- Publication date Sep 17, 2020
- Toshiba Memory Corporation
- Koji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTER...
- Publication number 20200291155
- Publication date Sep 17, 2020
- Toshiba Memory Corporation
- Norikatsu SASAO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF FORMING PAT...
- Publication number 20200294795
- Publication date Sep 17, 2020
- Toshiba Memory Corporation
- Norikatsu SASAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
- Publication number 20200123299
- Publication date Apr 23, 2020
- Toshiba Memory Corporation
- Koji ASAKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD FOR MA...
- Publication number 20200006076
- Publication date Jan 2, 2020
- Toshiba Memory Corporation
- Norikatsu Sasao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20190218321
- Publication date Jul 18, 2019
- Toshiba Memory Corporation
- Ryosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD, BLOCK COPOLYMER, AND PATTERN FORMATION MA...
- Publication number 20190169461
- Publication date Jun 6, 2019
- Toshiba Memory Corporation
- Norikatsu Sasao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMATION METHOD
- Publication number 20190121232
- Publication date Apr 25, 2019
- Toshiba Memory Corporation
- Tomoaki SAWABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND PATTERN FORMATION MATERIAL
- Publication number 20190084829
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Norikatsu SASAO
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
- Publication number 20190086804
- Publication date Mar 21, 2019
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
- Publication number 20190086805
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND PATTERN FORMATION MATERIAL
- Publication number 20190086803
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Koji Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND PATTERN FORMATION...
- Publication number 20190077068
- Publication date Mar 14, 2019
- Toshiba Memory Corporation
- Koji Asakawa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
- Publication number 20180265616
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Koji ASAKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD
- Publication number 20180138048
- Publication date May 17, 2018
- Toshiba Memory Corporation
- Tomoaki SAWABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN ANTENNA
- Publication number 20180138588
- Publication date May 17, 2018
- MegaChips Corporation
- Koji ASAKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Koji Asakawa

Person

Patents Grantslast 30 patents

Compound, polymer, pattern forming material, pattern forming method...

Polymer material, composition, and method of manufacturing semicond...

Compound, polymer, pattern forming material, and manufacturing meth...

Compound, polymer, pattern forming material, pattern forming method...

Polymer for pattern forming material

Template, method for manufacturing template, and pattern formation...

Pattern formation method and method of manufacturing semiconductor...

Method of forming pattern, method of manufacturing semiconductor de...

Method of forming pattern and method of manufacturing semiconductor...

Pattern formation material and pattern formation method

Pattern forming material and pattern forming method

Pattern forming material, composition for pattern formation, patter...

Polymer material, composition, and method of manufacturing semicond...

Method of manufacturing semiconductor device, method of forming pat...

Template, method for manufacturing template, and pattern formation...

Pattern formation method, block copolymer, and pattern formation ma...

Pattern formation method and pattern formation material

Pattern forming material, pattern forming method, and method for ma...

Pattern formation method

Pattern formation method

Pattern antenna

Semiconductor memory device

Hair removal tool

Pattern antenna

Pattern antenna

Semiconductor memory device and method for manufacturing the same

Pattern forming method

Method for manufacturing memory device and method for manufacturing...

Nonvolatile semiconductor memory device

Organic molecular memory

Patents Applicationslast 30 patents

COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD...

COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METH...

METHOD FOR MANUFACTURING INDIUM-CONTAINING ORGANIC POLYMER FILM, PA...

METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER...

PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD

COMPOUND, POLYMER, PATTERN FORMING MATERIAL, PATTERN FORMING METHOD...

POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICOND...

TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND PATTERN FORMATION...

METHOD OF FORMING PATTERN, METHOD OF MANUFACTURING SEMICONDUCTOR DE...

PATTERN FORMATION METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR...

PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE

METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR...

COMPOUND, POLYMER, PATTERN FORMING MATERIAL, AND MANUFACTURING METH...

PATTERN FORMATION METHOD, BLOCK COPOLYMER, AND PATTERN FORMATION MA...

POLYMER MATERIAL, COMPOSITION, AND METHOD OF MANUFACTURING SEMICOND...

PATTERN FORMING MATERIAL, COMPOSITION FOR PATTERN FORMATION, PATTER...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF FORMING PAT...

PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD

PATTERN FORMING MATERIAL, PATTERN FORMING METHOD, AND METHOD FOR MA...

PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD

PATTERN FORMATION METHOD, BLOCK COPOLYMER, AND PATTERN FORMATION MA...

PATTERN FORMATION METHOD

PATTERN FORMATION METHOD AND PATTERN FORMATION MATERIAL

PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE

PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD

PATTERN FORMATION METHOD AND PATTERN FORMATION MATERIAL

TEMPLATE, METHOD FOR MANUFACTURING TEMPLATE, AND PATTERN FORMATION...

PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD

PATTERN FORMATION METHOD

PATTERN ANTENNA