Koji FUJISAKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sensor characteristic evaluation method and charged particle beam d...
- Patent number 10,737,937
- Issue date Aug 11, 2020
- Hitachi, Ltd.
- Toshiyuki Mine
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polishing agent, polishing agent set, and substrate polishing method
- Patent number 10,557,058
- Issue date Feb 11, 2020
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 10,557,059
- Issue date Feb 11, 2020
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Abrasive, abrasive set, and method for abrading substrate
- Patent number 10,196,542
- Issue date Feb 5, 2019
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 9,932,497
- Issue date Apr 3, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Silicon carbide semiconductor device and manufacturing method of th...
- Patent number 9,490,328
- Issue date Nov 8, 2016
- Hitachi, Ltd.
- Naoki Tega
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abrasive, abrasive set, and method for abrading substrate
- Patent number 9,346,977
- Issue date May 24, 2016
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 9,346,978
- Issue date May 24, 2016
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Polishing agent, polishing agent set and method for polishing base
- Patent number 9,163,162
- Issue date Oct 20, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming multilayer wiring construction
- Patent number 5,570,506
- Issue date Nov 5, 1996
- Hitachi, Ltd.
- Rie Tawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of forming a patterned polyimide film and articles includin...
- Patent number 5,208,066
- Issue date May 4, 1993
- Hitachi, Ltd.
- Koji Fujisaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Acid anhydride complex and process for producing same, and composit...
- Patent number 5,183,838
- Issue date Feb 2, 1993
- Hitachi, Ltd.
- Takao Miwa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for producing metal-polyimide composite article
- Patent number 5,133,989
- Issue date Jul 28, 1992
- Hitachi, Ltd.
- Shunichi Numata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low thermal expansion resin material and composite shaped article
- Patent number 4,792,476
- Issue date Dec 20, 1988
- Hitachi, Ltd.
- Shun-ichi Numata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming polyimide film by chemical vapor deposition
- Patent number 4,759,958
- Issue date Jul 26, 1988
- Hitachi, Ltd.
- Shunichi Numata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-containing polyamide-acid derivative and polyimide
- Patent number 4,760,126
- Issue date Jul 26, 1988
- Hitachi, Ltd.
- Shunichi Numata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin encapsulated semiconductor device
- Patent number 4,758,875
- Issue date Jul 19, 1988
- Hitachi, Ltd.
- Koji Fujisaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low thermal expansion resin material and composite shaped article
- Patent number 4,690,999
- Issue date Sep 1, 1987
- Hitachi, Ltd.
- Shun-ichi Numata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
WAFER PROCESSING METHOD AND WAFER PROCESSING SYSTEM
- Publication number 20250201570
- Publication date Jun 19, 2025
- He WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUEL BATTERY CELL AND MANUFACTURING METHOD THEREFOR
- Publication number 20240120520
- Publication date Apr 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshitaka SASAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR CHARACTERISTIC EVALUATION METHOD AND CHARGED PARTICLE BEAM D...
- Publication number 20190292046
- Publication date Sep 26, 2019
- Hitachi, Ltd
- Toshiyuki MINE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20170040379
- Publication date Feb 9, 2017
- HITACHI, LTD.
- Yoshitaka SASAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON CARBIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF TH...
- Publication number 20160141371
- Publication date May 19, 2016
- Hitachi, Ltd
- Naoki TEGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
- Publication number 20160040041
- Publication date Feb 11, 2016
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING BASE
- Publication number 20150232704
- Publication date Aug 20, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150140904
- Publication date May 21, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150139885
- Publication date May 21, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150132208
- Publication date May 14, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE GRAINS, SLURRY, POLISHING SOLUTION, AND MANUFACTURING METH...
- Publication number 20150129796
- Publication date May 14, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150098887
- Publication date Apr 9, 2015
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
- Publication number 20150024596
- Publication date Jan 22, 2015
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, POLISHING AGENT SET, AND SUBSTRATE POLISHING METHOD
- Publication number 20150017806
- Publication date Jan 15, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Koji FUJISAKI

Person

Patents Grantslast 30 patents

Sensor characteristic evaluation method and charged particle beam d...

Polishing agent, polishing agent set, and substrate polishing method

Slurry, polishing-solution set, polishing solution, substrate polis...

Abrasive, abrasive set, and method for abrading substrate

Slurry, polishing-solution set, polishing solution, substrate polis...

Silicon carbide semiconductor device and manufacturing method of th...

Abrasive, abrasive set, and method for abrading substrate

Slurry, polishing-solution set, polishing solution, substrate polis...

Polishing agent, polishing agent set and method for polishing base

Method for forming multilayer wiring construction

Process of forming a patterned polyimide film and articles includin...

Acid anhydride complex and process for producing same, and composit...

Process for producing metal-polyimide composite article

Low thermal expansion resin material and composite shaped article

Method for forming polyimide film by chemical vapor deposition

Fluorine-containing polyamide-acid derivative and polyimide

Resin encapsulated semiconductor device

Low thermal expansion resin material and composite shaped article

Patents Applicationslast 30 patents

WAFER PROCESSING METHOD AND WAFER PROCESSING SYSTEM

FUEL BATTERY CELL AND MANUFACTURING METHOD THEREFOR

SENSOR CHARACTERISTIC EVALUATION METHOD AND CHARGED PARTICLE BEAM D...

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME

SILICON CARBIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF TH...

ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE

POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING BASE

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

ABRASIVE GRAINS, SLURRY, POLISHING SOLUTION, AND MANUFACTURING METH...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE

POLISHING AGENT, POLISHING AGENT SET, AND SUBSTRATE POLISHING METHOD