Koji Maekawa

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Tungsten film-forming method, film-forming system and storage medium
- Patent number 11,802,334
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Takashi Sameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming system
- Patent number 11,401,609
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Koji Maekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and substrate processing system
- Patent number 11,171,004
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Takashi Sameshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten film-forming method, film-forming system and storage medium
- Patent number 10,954,593
- Issue date Mar 23, 2021
- Tokyo Electron Limited
- Takashi Sameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten film
- Patent number 10,886,170
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Koji Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten film forming method, film forming system and film forming...
- Patent number 10,784,110
- Issue date Sep 22, 2020
- Tokyo Electron Limited
- Takashi Sameshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a tungsten film having a low resistance
- Patent number 10,612,139
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Koji Maekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten film forming method and storage medium
- Patent number 10,400,330
- Issue date Sep 3, 2019
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming metal film
- Patent number 10,131,986
- Issue date Nov 20, 2018
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing stress in metal film and metal film forming method
- Patent number 10,026,616
- Issue date Jul 17, 2018
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten film
- Patent number 9,640,404
- Issue date May 2, 2017
- Tokyo Electron Limited
- Kenji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten film forming method, semiconductor device manufacturing me...
- Patent number 9,536,782
- Issue date Jan 3, 2017
- Tokyo Electron Limited
- Takanobu Hotta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber cleaning method in substrate processing apparatus,...
- Patent number 8,608,901
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Grant
Method for cleaning process chamber of substrate processing apparat...
- Patent number 7,695,763
- Issue date Apr 13, 2010
- Tokyo Electron Limited
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Grant
Cleaning method
- Patent number 7,691,208
- Issue date Apr 6, 2010
- Tokyo Electron Limited
- Koji Maekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20240155824
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Masahiro IKEJIRI
Information Patent Application
Tungsten Film-Forming Method, Film-Forming System and Storage Medium
- Publication number 20240003002
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Film-Forming Method, Film-Forming System and Storage Medium
- Publication number 20210164095
- Publication date Jun 3, 2021
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD, FILM FORMING SYSTEM, AND FILM FORMING APPARATUS
- Publication number 20210115560
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Katsumasa YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200095683
- Publication date Mar 26, 2020
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Method and Substrate Processing System
- Publication number 20200098573
- Publication date Mar 26, 2020
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20200071829
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Koji MAEKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Film-Forming Method, Film-Forming System and Storage Medium
- Publication number 20190256972
- Publication date Aug 22, 2019
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FILM FORMING METHOD, FILM FORMING SYSTEM AND FILM FORMING...
- Publication number 20190221434
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Takashi SAMESHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TUNGSTEN FILM
- Publication number 20180315649
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Koji Maekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN FILM FORMING METHOD
- Publication number 20180312972
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Koji MAEKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FILM FORMING METHOD AND STORAGE MEDIUM
- Publication number 20170283942
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Kenji SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REDUCING STRESS IN METAL FILM AND METAL FILM FORMING METHOD
- Publication number 20160351402
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Kenji SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Metal Film
- Publication number 20160348234
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Kenji SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOURCE SUPPLY APPARATUS, SOURCE SUPPLY METHOD AND STORAGE MEDIUM
- Publication number 20160281231
- Publication date Sep 29, 2016
- TOKYO ELECTRON LIMITED
- Masayuki MOROI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TUNGSTEN FILM
- Publication number 20160284553
- Publication date Sep 29, 2016
- TOKYO ELECTRON LIMITED
- Kenji SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tungsten Film Forming Method, Semiconductor Device Manufacturing Me...
- Publication number 20150279735
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Takanobu HOTTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD
- Publication number 20120048310
- Publication date Mar 1, 2012
- TOKYO ELECTRON LIMITED
- Koji MAEKAWA
- B08 - CLEANING
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20100307685
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Kinya Ota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD
- Publication number 20100180918
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Koji MAEKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND STORA...
- Publication number 20100168889
- Publication date Jul 1, 2010
- TOKYO ELECTRON LIMITED
- Koichi SEKIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20100154707
- Publication date Jun 24, 2010
- TOKYO ELECTRON LIMITED
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Application
CLEANING METHOD
- Publication number 20090133715
- Publication date May 28, 2009
- TOKYO ELECTRON LIMITED
- Koji Maekawa
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS THROUGH PLATE
- Publication number 20080134974
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Tetsuro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for cleaning process chamber of substrate processing apparat...
- Publication number 20070181145
- Publication date Aug 9, 2007
- TOKYO ELECTRON LIMITED
- Shuuichi Ishizuka
- B08 - CLEANING

Koji Maekawa

Person

Patents Grantslast 30 patents

Tungsten film-forming method, film-forming system and storage medium

Film forming method and film forming system

Film forming method and substrate processing system

Tungsten film-forming method, film-forming system and storage medium

Method of forming tungsten film

Tungsten film forming method, film forming system and film forming...

Method of forming a tungsten film having a low resistance

Tungsten film forming method and storage medium

Method of forming metal film

Method of reducing stress in metal film and metal film forming method

Method of forming tungsten film

Tungsten film forming method, semiconductor device manufacturing me...

Process chamber cleaning method in substrate processing apparatus,...

Method for cleaning process chamber of substrate processing apparat...

Cleaning method

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE

Tungsten Film-Forming Method, Film-Forming System and Storage Medium

Tungsten Film-Forming Method, Film-Forming System and Storage Medium

FILM FORMING METHOD, FILM FORMING SYSTEM, AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

Film Forming Method and Substrate Processing System

FILM FORMING METHOD AND FILM FORMING SYSTEM

Tungsten Film-Forming Method, Film-Forming System and Storage Medium

TUNGSTEN FILM FORMING METHOD, FILM FORMING SYSTEM AND FILM FORMING...

METHOD OF FORMING TUNGSTEN FILM

TUNGSTEN FILM FORMING METHOD

TUNGSTEN FILM FORMING METHOD AND STORAGE MEDIUM

METHOD OF REDUCING STRESS IN METAL FILM AND METAL FILM FORMING METHOD

Method of Forming Metal Film

SOURCE SUPPLY APPARATUS, SOURCE SUPPLY METHOD AND STORAGE MEDIUM

METHOD OF FORMING TUNGSTEN FILM

Tungsten Film Forming Method, Semiconductor Device Manufacturing Me...

CLEANING METHOD

MICROWAVE PLASMA PROCESSING APPARATUS

CLEANING METHOD

SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND STORA...

PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS,...

CLEANING METHOD

PLASMA PROCESSING APPARATUS AND GAS THROUGH PLATE

Method for cleaning process chamber of substrate processing apparat...