Kosuke Imafuku

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon focus ring
- Patent number 9,399,584
- Issue date Jul 26, 2016
- Tokyo Electron Limited
- Kosuke Imafuku
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Silicon component for plasma etching apparatus
- Patent number 9,290,391
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Kosuke Imafuku
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of refurbishing a quartz glass component
- Patent number 8,991,214
- Issue date Mar 31, 2015
- Techno Quartz Inc.
- Katsutoshi Hoshino
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method of recycling silicon component for plasma etching apparatus...
- Patent number 8,785,214
- Issue date Jul 22, 2014
- Tokyo Electron Limited
- Kosuke Imafuku
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Worktable device and plasma processing apparatus for semiconductor...
- Patent number 6,723,202
- Issue date Apr 20, 2004
- Tokyo Electron Limited
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method and apparatus
- Patent number 6,544,380
- Issue date Apr 8, 2003
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method and apparatus
- Patent number 6,391,147
- Issue date May 21, 2002
- Tokyo Electron Limited
- Kosuke Imafuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method and apparatus
- Patent number 6,264,788
- Issue date Jul 24, 2001
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment method utilizing an amplitude-modulated high frequ...
- Patent number 6,106,737
- Issue date Aug 22, 2000
- Tokyo Electron Limited
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,074,518
- Issue date Jun 13, 2000
- Tokyo Electron Limited
- Kosuke Imafuku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas diffusion plate for electrode of semiconductor wafer processing...
- Patent number D411516
- Issue date Jun 29, 1999
- Tokyo Electron Limited
- Kosuke Imafuku
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma processing method and plasma etching method
- Patent number 5,716,534
- Issue date Feb 10, 1998
- Tokyo Electron Limited
- Hiroshi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and method
- Patent number 5,698,062
- Issue date Dec 16, 1997
- Tokyo Electron Limited
- Takao Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SILICON FOCUS RING
- Publication number 20160152479
- Publication date Jun 2, 2016
- TOKYO ELECTRON LIMITED
- Kosuke Imafuku
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF RECYCLING SILICON COMPONENT FOR PLASMA ETCHING APPARATUS...
- Publication number 20110076221
- Publication date Mar 31, 2011
- TOKYO ELECTRON LIMITED
- Kosuke Imafuku
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF REFURBISHING A QUARTZ GLASS COMPONENT
- Publication number 20110023543
- Publication date Feb 3, 2011
- Techno Quartz Inc.
- Yasuhiro Umetsu
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTRODE PLATE, ELECTRODE SUPPORTI...
- Publication number 20080156441
- Publication date Jul 3, 2008
- TOKYO ELECTRON LIMITED
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, and electrode plate, electrode support...
- Publication number 20030155078
- Publication date Aug 21, 2003
- TOKYO ELECTRON LIMITED
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment method and apparatus
- Publication number 20020088547
- Publication date Jul 11, 2002
- TOKYO ELECTRON LIMITED
- Masayuki Tomoyasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Worktable device and plasma processing apparatus for semiconductor...
- Publication number 20020029745
- Publication date Mar 14, 2002
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treatment method and apparatus
- Publication number 20010013504
- Publication date Aug 16, 2001
- TOKYO ELECTRON LIMITED
- Kosuke Imafuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kosuke Imafuku

Person

Patents Grantslast 30 patents

Silicon focus ring

Silicon component for plasma etching apparatus

Method of refurbishing a quartz glass component

Method of recycling silicon component for plasma etching apparatus...

Worktable device and plasma processing apparatus for semiconductor...

Plasma treatment method and apparatus

Plasma treatment method and apparatus

Plasma treatment method and apparatus

Plasma treatment method utilizing an amplitude-modulated high frequ...

Plasma processing apparatus

Gas diffusion plate for electrode of semiconductor wafer processing...

Plasma processing method and plasma etching method

Plasma treatment apparatus and method

Patents Applicationslast 30 patents

SILICON FOCUS RING

METHOD OF RECYCLING SILICON COMPONENT FOR PLASMA ETCHING APPARATUS...

METHOD OF REFURBISHING A QUARTZ GLASS COMPONENT

PLASMA PROCESSING APPARATUS AND ELECTRODE PLATE, ELECTRODE SUPPORTI...

Plasma processing apparatus, and electrode plate, electrode support...

Plasma treatment method and apparatus

Worktable device and plasma processing apparatus for semiconductor...

Plasma treatment method and apparatus