Kosuke OGASAWARA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,721,522
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 11,404,282
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,367,590
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for performing accurate end point detec...
- Patent number 8,580,077
- Issue date Nov 12, 2013
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 8,232,207
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, etching apparatus and storage medium
- Patent number 8,187,980
- Issue date May 29, 2012
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and post-processing method
- Patent number 7,871,532
- Issue date Jan 18, 2011
- Tokyo Electron Limited
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus for perfor...
- Patent number 7,662,646
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20220336224
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220301824
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20220148890
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210313148
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210020409
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20200303203
- Publication date Sep 24, 2020
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190326092
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20100167549
- Publication date Jul 1, 2010
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS FOR PERFORMING ACCURATE END POINT DETEC...
- Publication number 20100089532
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGR...
- Publication number 20080216957
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- B08 - CLEANING
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM
- Publication number 20080188086
- Publication date Aug 7, 2008
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20080070327
- Publication date Mar 20, 2008
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for manufacturing a semiconductor device, cont...
- Publication number 20070102399
- Publication date May 10, 2007
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and post-processing method
- Publication number 20060191877
- Publication date Aug 31, 2006
- TOKYO ELECTRON LIMITED
- Akitaka Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Kosuke OGASAWARA

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Method of etching film and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus for performing accurate end point detec...

Substrate processing method

Etching method, etching apparatus and storage medium

Plasma processing method and post-processing method

Plasma processing method and plasma processing apparatus for perfor...

Patents Applicationslast 30 patents

METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PROCESSING APPARATUS AND PROCESSING METHOD

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS FOR PERFORMING ACCURATE END POINT DETEC...

PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGR...

ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Method and apparatus for manufacturing a semiconductor device, cont...

Plasma processing method and post-processing method