Kouichiro Inazawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 7,169,440
- Issue date Jan 30, 2007
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 6,849,559
- Issue date Feb 1, 2005
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 6,753,263
- Issue date Jun 22, 2004
- Tokyo Electron Limited
- Youbun Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,737,350
- Issue date May 18, 2004
- Tokyo Electron Limited
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,642,149
- Issue date Nov 4, 2003
- Tokyo Electron Limited
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 6,602,435
- Issue date Aug 5, 2003
- Tokyo Electron Limited
- Masahiro Yamada
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma etching method
- Patent number 6,488,863
- Issue date Dec 3, 2002
- Tokyo Electron Limited
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant for use in a semiconductor processing method and system
- Patent number 6,465,359
- Issue date Oct 15, 2002
- Tokyo Electron Ltd.
- Masahiro Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing method and system using C.sub.5 F.sub.8
- Patent number 6,159,862
- Issue date Dec 12, 2000
- Tokyo Electron Ltd.
- Masahiro Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,089,181
- Issue date Jul 18, 2000
- Tokyo Electron Limited
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a substrate
- Patent number 5,721,090
- Issue date Feb 24, 1998
- Tokyo Electron Limited
- Shin Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030192856
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030194876
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma processing method
- Publication number 20030054647
- Publication date Mar 20, 2003
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20020084254
- Publication date Jul 4, 2002
- TOKYO ELECTRON LIMITED
- Koichi Yatsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT FOR USE IN A SEMICONDUCTOR PROCESSING METHOD AND SYSTEM
- Publication number 20020030174
- Publication date Mar 14, 2002
- MASAHIRO YAMADA
- H01 - BASIC ELECTRIC ELEMENTS

Kouichiro Inazawa

Person

Patents Grantslast 30 patents

Method for removing photoresist and etch residues

Method for removing photoresist and etch residues

Etching method

Method of manufacturing semiconductor device

Plasma processing method

Etching method

Plasma etching method

Etchant for use in a semiconductor processing method and system

Semiconductor processing method and system using C.sub.5 F.sub.8

Plasma processing apparatus

Method of etching a substrate

Patents Applicationslast 30 patents

Method for removing photoresist and etch residues

Method for removing photoresist and etch residues

Plasma processing method

Plasma etching method

ETCHANT FOR USE IN A SEMICONDUCTOR PROCESSING METHOD AND SYSTEM