Kouji NISHIKAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound synthesis method, microarray, acid-transfer composition, a...
- Patent number 8,475,998
- Issue date Jul 2, 2013
- Samsung Electronics Co., Ltd.
- Hyojin Yun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for modifying first film and composition for forming acid tr...
- Patent number 8,252,511
- Issue date Aug 28, 2012
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative radiation-sensitive resin composition
- Patent number 8,178,279
- Issue date May 15, 2012
- JSR Corporation
- Kouji Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative radiation-sensitive resin composition
- Patent number 7,482,111
- Issue date Jan 27, 2009
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin film and cured film made therefrom
- Patent number 7,214,471
- Issue date May 8, 2007
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND SYNTHESIS METHOD, MICROARRAY, ACID-TRANSFER COMPOSITION, A...
- Publication number 20120196772
- Publication date Aug 2, 2012
- JSR Corporation
- Hyojin YUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20110086938
- Publication date Apr 14, 2011
- JSR Corporation
- Kouji Nishikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TR...
- Publication number 20110076619
- Publication date Mar 31, 2011
- JSR Corporation
- Kouji NISHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING...
- Publication number 20100190109
- Publication date Jul 29, 2010
- JSR Corporation
- Kouji NISHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A...
- Publication number 20090288855
- Publication date Nov 26, 2009
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATIN...
- Publication number 20070196765
- Publication date Aug 23, 2007
- JSR Corporation
- Kousuke MORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative radiation-sensitive resin composition
- Publication number 20070190450
- Publication date Aug 16, 2007
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positively radiation-sensitive resin composition
- Publication number 20070190465
- Publication date Aug 16, 2007
- JSR CORPORATION
- Kouji Nishikawa
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Positive-type radiation-sensitive resin composition for producing a...
- Publication number 20070031758
- Publication date Feb 8, 2007
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin film and cured film made therefrom
- Publication number 20060210912
- Publication date Sep 21, 2006
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kouji NISHIKAWA

Person

Patents Grantslast 30 patents

Compound synthesis method, microarray, acid-transfer composition, a...

Method for modifying first film and composition for forming acid tr...

Negative radiation-sensitive resin composition

Negative radiation-sensitive resin composition

Photosensitive resin film and cured film made therefrom

Patents Applicationslast 30 patents

COMPOUND SYNTHESIS METHOD, MICROARRAY, ACID-TRANSFER COMPOSITION, A...

NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION

METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TR...

ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING...

POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A...

RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATIN...

Negative radiation-sensitive resin composition

Positively radiation-sensitive resin composition

Positive-type radiation-sensitive resin composition for producing a...

Photosensitive resin film and cured film made therefrom