Kuen-Yu Tsai

Person

Taipei, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Photodiode comprising fluropolymer compound
- Patent number 11,903,304
- Issue date Feb 13, 2024
- RAYNERGY TEK INCORPORATION
- Yi-Ming Chang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Methods for non-resist nanolithography
- Patent number 11,855,190
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor package and manufacturing process thereof
- Patent number 11,742,276
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Huan Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for non-resist nanolithography
- Patent number 11,532,729
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor package and manufacturing process thereof
- Patent number 11,315,860
- Issue date Apr 26, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Huan Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for non-resist nanolithography
- Patent number 10,665,696
- Issue date May 26, 2020
- Taiwan Semiconductor Manufacturing Company
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam patterning without resist
- Patent number 10,615,036
- Issue date Apr 7, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for non-resist nanolithography
- Patent number 9,972,702
- Issue date May 15, 2018
- Taiwan Semiconductor Manufacturing Company
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam patterning without resist
- Patent number 9,934,969
- Issue date Apr 3, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Projection patterning with exposure mask
- Patent number 9,570,301
- Issue date Feb 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for calibrating a manufacturing process model
- Patent number 9,541,500
- Issue date Jan 10, 2017
- ASML Netherlands B.V.
- Kuen-Yu Tsai
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for establishing parametric model
- Patent number 9,418,049
- Issue date Aug 16, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuen-Yu Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining proximity effect parameters for non-rectangular semicon...
- Patent number 9,087,173
- Issue date Jul 21, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for compensating effect of patterning process and apparatus...
- Patent number 8,578,303
- Issue date Nov 5, 2013
- NATIONAL TAIWAN UNIVERSITY
- Kuen-Yu Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for compensating proximity effects of particle beam lithogra...
- Patent number 8,539,392
- Issue date Sep 17, 2013
- NATIONAL TAIWAN UNIVERSITY
- Kuen-Yu Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for designing patterning system based on patte...
- Patent number 8,490,033
- Issue date Jul 16, 2013
- NATIONAL TAIWAN UNIVERSITY
- Kuen-Yu Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for improving accuracy of parasitics extraction considering...
- Patent number 8,438,505
- Issue date May 7, 2013
- Taiwan Semicondcutor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE OF THE PHOTODIODE
- Publication number 20230129045
- Publication date Apr 27, 2023
- RAYNERGY TEK INCORPORATION
- YI-MING CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Non-Resist Nanolithography
- Publication number 20230112658
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE OF THE PHOTODIODE
- Publication number 20230057435
- Publication date Feb 23, 2023
- RAYNERGY TEK INCORPORATION
- YI-MING CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC SEMICONDUCTOR DEVICE
- Publication number 20220376181
- Publication date Nov 24, 2022
- RAYNERGY TEK INCORPORATION
- YI-MING CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND MANUFACTURING PROCESS THEREOF
- Publication number 20220246511
- Publication date Aug 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Huan Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTODIODE
- Publication number 20220199907
- Publication date Jun 23, 2022
- RAYNERGY TEK INCORPORATION
- YI-MING CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PACKAGE AND MANUFACTURING PROCESS THEREOF
- Publication number 20210118789
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Huan Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Non-Resist Nanolithography
- Publication number 20200287025
- Publication date Sep 10, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Non-Resist Nanolithography
- Publication number 20180248020
- Publication date Aug 30, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle-Beam Patterning Without Resist
- Publication number 20180218903
- Publication date Aug 2, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Projection Patterning With Exposure Mask
- Publication number 20150348775
- Publication date Dec 3, 2015
- National Taiwan University
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Non-Resist Nanolithography
- Publication number 20150340469
- Publication date Nov 26, 2015
- National Taiwan University
- Miin-Jang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determining Proximity Effect Parameters for Non Rectangular Semicon...
- Publication number 20150324515
- Publication date Nov 12, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged-Particle-Beam Patterning Without Resist
- Publication number 20150221514
- Publication date Aug 6, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER MIRROR STRUCTURE
- Publication number 20150212427
- Publication date Jul 30, 2015
- National Taiwan University
- Jia-Han Li
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR ESTABLISHING PARAMETRIC MODEL
- Publication number 20140200866
- Publication date Jul 17, 2014
- National Taiwan University
- Kuen-Yu TSAI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND COMPUTER-AIDED DESIGN SYSTEM OF MANUFACTURING AN OPTICAL...
- Publication number 20130297061
- Publication date Nov 7, 2013
- National Taiwan University
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Calibrating a Manufacturing Process Model
- Publication number 20130073070
- Publication date Mar 21, 2013
- ASML NETHERLANDS B.V.
- Kuen-Yu TSAI
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGNING PATTERNING SYSTEM BASED ON PATTE...
- Publication number 20130024823
- Publication date Jan 24, 2013
- National Taiwan University
- Kuen-Yu Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR COMPENSATING PROXIMITY EFFECTS OF PARTICLE BEAM LITHOGRA...
- Publication number 20120221983
- Publication date Aug 30, 2012
- National Taiwan University
- Kuen-Yu Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR IMPROVING ACCURACY OF PARASITICS EXTRACTION CONSIDERING...
- Publication number 20120185807
- Publication date Jul 19, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR ESTIMATING CHANGE OF STATUS OF PARTICLE BEAMS
- Publication number 20120112065
- Publication date May 10, 2012
- National Taiwan University
- Kuen-Yu TSAI
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR ESTIMATING CHANGE OF STATUS OF PARTICLE BEAMS
- Publication number 20120112086
- Publication date May 10, 2012
- National Taiwan University
- Kuen-Yu TSAI
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ADJUSTING STATUS OF PARTICLE BEAMS FOR PATTERNING A SUBS...
- Publication number 20120112091
- Publication date May 10, 2012
- National Taiwan University
- Kuen-Yu TSAI
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING PROXIMITY EFFECT PARAMETERS FOR NON-RECTANGULAR SEMICON...
- Publication number 20110178778
- Publication date Jul 21, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G06 - COMPUTING CALCULATING COUNTING

Kuen-Yu Tsai

Person

Patents Grantslast 30 patents

Photodiode comprising fluropolymer compound

Methods for non-resist nanolithography

Semiconductor package and manufacturing process thereof

Method for non-resist nanolithography

Semiconductor package and manufacturing process thereof

Method for non-resist nanolithography

Charged-particle-beam patterning without resist

Method for non-resist nanolithography

Charged-particle-beam patterning without resist

Projection patterning with exposure mask

Method for calibrating a manufacturing process model

Method and system for establishing parametric model

Determining proximity effect parameters for non-rectangular semicon...

Method for compensating effect of patterning process and apparatus...

Method for compensating proximity effects of particle beam lithogra...

Method and apparatus for designing patterning system based on patte...

Method for improving accuracy of parasitics extraction considering...

Patents Applicationslast 30 patents

STRUCTURE OF THE PHOTODIODE

Methods For Non-Resist Nanolithography

STRUCTURE OF THE PHOTODIODE

ORGANIC SEMICONDUCTOR DEVICE

SEMICONDUCTOR PACKAGE AND MANUFACTURING PROCESS THEREOF

PHOTODIODE

SEMICONDUCTOR PACKAGE AND MANUFACTURING PROCESS THEREOF

Method For Non-Resist Nanolithography

Method For Non-Resist Nanolithography

Charged-Particle-Beam Patterning Without Resist

Projection Patterning With Exposure Mask

Method For Non-Resist Nanolithography

Determining Proximity Effect Parameters for Non Rectangular Semicon...

Charged-Particle-Beam Patterning Without Resist

MULTILAYER MIRROR STRUCTURE

METHOD AND SYSTEM FOR ESTABLISHING PARAMETRIC MODEL

METHOD AND COMPUTER-AIDED DESIGN SYSTEM OF MANUFACTURING AN OPTICAL...

Method for Calibrating a Manufacturing Process Model

METHOD AND APPARATUS FOR DESIGNING PATTERNING SYSTEM BASED ON PATTE...

METHOD FOR COMPENSATING PROXIMITY EFFECTS OF PARTICLE BEAM LITHOGRA...

METHOD FOR IMPROVING ACCURACY OF PARASITICS EXTRACTION CONSIDERING...

APPARATUS AND METHOD FOR ESTIMATING CHANGE OF STATUS OF PARTICLE BEAMS

SYSTEM AND METHOD FOR ESTIMATING CHANGE OF STATUS OF PARTICLE BEAMS

METHOD FOR ADJUSTING STATUS OF PARTICLE BEAMS FOR PATTERNING A SUBS...

DETERMINING PROXIMITY EFFECT PARAMETERS FOR NON-RECTANGULAR SEMICON...